Patent classifications
G03F7/0955
Photosensitive resin constituent for flexographic printing plate and flexographic printing plate
A photosensitive resin constituent for a flexographic printing plate includes at least a support, a photosensitive resin composition layer, and a particle layer. The photosensitive resin composition layer contains a photosensitive resin composition containing a binder, a monomer, and a polymerization initiator. The particle layer contains a resin composition containing a binder having a crosslinkable group and a particle having a pore structure, and the particle having a pore structure has an average particle size of 1 μm or more and 10 μm or less, and a specific surface area of 350 m.sup.2/g or more and 1000 m.sup.2/g or less.
METHOD FOR PRODUCING A PLANAR POLYMER STACK
The invention relates to a method for manufacturing a flat polymeric stack, said stack comprising one or more first and one second layer of (co)polymer (20, 30) stacked one on the other, the first underlying (co)polymer layer (20) not having undergone any prior treatment allowing its crosslinking, at least one of the (co)polymer layers initially being in a liquid or viscous state, said method being characterized in that the upper layer (30), known as the top coat (TC), is deposited on the first layer (20) in the form of a prepolymer composition (pre-TC), comprising one or more monomer(s) and/or dimer(s) and/or oligomer(s) and/or polymer(s) in solution, and in that it is then subjected to a heat treatment capable of causing a crosslinking reaction of the molecular chains within said layer (30, TC).
METHOD FOR PRODUCING A PLANAR POLYMER STACK
The invention relates to a method for manufacturing a flat polymeric stack, said stack comprising one or more first and one second layer of (co)polymer (20, 30) stacked one on the other, the first underlying (co)polymer layer (20) not having undergone any prior treatment allowing its crosslinking, at least one of the (co)polymer layers initially being in a liquid or viscous state, said method being characterized in that the upper layer (30), known as the top coat (TC), is deposited on the first layer (20) in the form of a prepolymer composition (pre-TC), comprising one or more monomer(s) and/or dimer(s) and/or oligomer(s) and/or polymer(s) in solution, and in that it is then subjected to a stimulus capable of causing a crosslinking reaction of the molecular chains within said layer (30, TC).
RELIEF PRECURSOR HAVING LOW CUPPING AND FLUTING
A digitally imageable, photopolymerizable relief precursor at least comprising, arranged one above another in the order stated, (A) a dimensionally stable carrier; (AH) optionally, an adhesion-promoting layer; (B) a relief-forming layer, at least comprising a crosslinkable elastomeric binder, a first ethylenically unsaturated monomer, and a photoinitiator; (C) at least one interlayer, at least comprising a first, non-radically crosslinkable elastic polymer; (D) a laser-ablatable mask layer, at least comprising a second, non-radically crosslinkable elastic polymer, a UVA light-absorbing material, and an IR light-absorbing material; and optionally (E) a removable cover layer; characterized in that the layer (C) and optionally the layer (D) comprise at least one second ethylenically unsaturated monomer.
Transfer film, electrode protective film for electrostatic capacitance-type input device, laminate, and electrostatic capacitance-type input device
A transfer film includes a temporary support, a first transparent resin layer, and a second transparent resin layer in this order, the second transparent resin layer includes metal oxide particles and an organic component, and, in a case in which an area of a profile of a thickness-direction distribution of a ratio of metal atoms constituting the metal oxide particles to carbon atoms constituting the organic component in the second transparent resin layer is represented by A, and a peak height of the profile is represented by P, Expression (1) is satisfied.
0.01 (nm).sup.1P/A0.08 (nm).sup.1Expression (1)
BOTTOM-UP CONFORMAL COATING AND PHOTOPATTERNING ON PAG-IMMOBILIZED SURFACES
Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with monomers to enhance solubility to generate PAG-containing polymers. The PAG-containing monomers can be coated onto a surface, where the immobilized PAGs can then be used to pattern materials coated on top of the immobilized PAGs, allowing direct patterning without the use of a photoresist, thereby reducing process steps and cost. The disclosed materials and processes can be used to produce conformal coatings of controlled thicknesses.
HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE AND MEANS FOR PRODUCING SAME
The invention relates to a recording element which is suitable for producing high-resolution flexographic printing plates by means of digital information transmission and which can be imaged by means of actinic laser radiation, containing or consisting of the following layers: (A) a carrier film, (B) a photopolymerizable layer/relief layer which can be crosslinked by means of actinic radiation, (C) optionally an intermediate layer which is transparent to actinic radiation as a separating element, and (D) a template layer which is capable of recording and comprises a monomer diazonium compound or (Da) an imaged template layer. The invention likewise relates to a semi-finished product, to a method for producing the recording element, and to a method for producing flexographic printing plates.
Component Carrier With a Photoimageable Dielectric Layer and a Structured Conductive Layer Being Used as a Mask for Selectively Exposing the Photoimageable Dielectric Layer With Electromagnetic Radiation
A component carrier with a layer stack having at least one component carrier material and a photoimageable dielectric layer structure formed on top of the layer stack. The photoimageable dielectric layer structure has at least one recess extending vertically through the photoimageable dielectric layer structure. The at least one recess is formed by partially removing the photoimageable dielectric layer structure in regions which are defined by a spatial pattern of an electrically conductive layer structure formed on the photoimageable dielectric layer structure. The spatial pattern defines openings formed within the electrically conductive layer structure. A method for manufacturing such a component carrier is also described.
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
A resist underlayer composition and a method of forming patterns, the composition including a polymer including at least one of a first moiety represented by Chemical Formula 1-1 and a second moiety represented by Chemical Formula 1-2; a thermal acid generator including a salt composed of an anion of an acid and a cation of a base, the base having pKa of greater than or equal to about 7; and a solvent,
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Photosensitive resin printing plate precursor and method of manufacturing printing plate
A photosensitive resin printing plate precursor includes at least a substrate and a photosensitive resin layer, the photosensitive resin layer containing: (A) a partially saponified polyvinyl acetate, (B) a polyamide having basic nitrogen, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiator; the photosensitive resin layer including at least an underlayer and a printing surface layer; the substrate, the underlayer, and the printing surface layer being included in this order; and the photosensitive resin layer containing, as the partially saponified polyvinyl acetate (A), those (A1) having an average polymerization degree of 1,200 to 2,600 in the printing surface layer and those (A2) having an average polymerization degree of 400 to 800 in the underlayer.