A memory device includes bit lines, and a cell array including strings, each of which includes memory cells, a select cell coupled to a respective one of the bit lines, and a dummy cell between the select cell and the memory cells. The memory device also includes a select line coupled to the select cells, a dummy word line coupled to the dummy cells, word lines each coupled to a respective row of the memory cells, and a controller coupled to the cell array. The controller is configured to drive a voltage on the dummy word line from a first level to a second level lower than the first level. The controller is also configured to drive a voltage on the select line from the first level to the second level, such that the voltage on the select line reaches the second level after the voltage on the dummy word line reaches the second level. The controller is further configured to, after the voltage on the select line reaches the second level, drive a voltage on a selected word line of the word lines from the second level to a third level higher than the first level to program the memory cells coupled to the selected word line.

Sensing devices might include a first voltage node configured to receive a first voltage level, a second voltage node configured to receive a second voltage level lower than the first voltage level, a p-type field-effect transistor (pFET) selectively connected to a data line, and a sense node selectively connected to the pFET. The pFET might be connected between the first voltage node and the data line, between the second voltage node and the data line, and between the first voltage node and the data line. Memories might have controllers configured to cause the memories to determine whether a memory cell has an intended threshold voltage using similar sensing devices.

Numerous embodiments of analog neural memory arrays are disclosed. In one embodiment, a system comprises a first array of non-volatile memory cells, wherein the cells are arranged in rows and columns and the non-volatile memory cells in one or more of the columns stores W+ values, and wherein one of the columns in the first array is a dummy column; and a second array of non-volatile memory cells, wherein the cells are arranged in rows and columns and the non-volatile memory cells in one or more of the columns stores W− values, and wherein one of the columns in the second array is a dummy column; wherein pairs of cells from the first array and the second array store a differential weight, W, according to the formula W=(W+)−(W−).

A memory device and method of erasing same that includes a substrate of semiconductor material and a plurality of memory cells formed on the substrate and arranged in an array of rows and columns. Each of the memory cells includes spaced apart source and drain regions in the substrate, with a channel region in the substrate extending there between, a floating gate disposed over and insulated from a first portion of the channel region which is adjacent the source region, a select gate disposed over and insulated from a second portion of the channel region which is adjacent the drain region, and a program-erase gate disposed over and insulated from the source region. The program-erase gate lines alone or in combination with the select gate lines, or the source lines, are arranged in the column direction so that each memory cell can be individually programmed, read and erased.

A semiconductor memory device includes a substrate, a plurality of memory cells and at least one strap cell between the plurality of memory cells disposed along a first direction, a plurality of bit line (BL) contacts electrically connected to a plurality of drain doped regions of the plurality of memory cells, respectively, and at least one source line contact electrically connected to a diffusion region of the strap cell. The at least one source line contact is aligned with the plurality of BL contacts in the first direction.

A memory device includes a plurality of arrays coupled in parallel with each other. A first array of the plurality of arrays includes a first switch and a plurality of first memory cells that are arranged in a first column, a second switch and a plurality of second memory cells that are arranged in a second column, and at least one data line coupled to the plurality of first memory cells and the plurality of second memory cells. The second switch is configured to output a data signal from the at least one data line to a sense amplifier.

The application relates to a data reading circuit of an embedded flash memory cell. The data reading circuit a switch circuit, a current clamp circuit, a current mirror circuit, a reference current source, a precharge circuit and a comparison circuit; the switch circuit includes a transmission gate, one end of the transmission gate is connected with a drain of the embedded flash memory cell, and the other end of the transmission gate is connected with a detection end of the current clamp circuit; a response end of the current clamp circuit is connected with a data node; the current mirror circuit is connected with the reference current source and the data node; an output end of the precharge circuit is connected with the data node; one input end of the comparison circuit is connected with the data node, and the other input end is connected with reference voltage.

Aspects of the disclosure provide an erase method for a memory device. In the method, during a time period, a first positive voltage is applied to a body portion of a memory cell string of the memory device. The memory cell string includes memory cell transistors and select transistors connected in series. A second positive voltage is applied to a bit line signal of the memory cell string. A third positive voltage is applied to a first top select gate signal to turn on a first top select transistor of the select transistors so that the memory cell transistors are coupled to the bit line signal through the first top select transistor. A ground level voltage or a fourth positive voltage is applied to a word line signal of the memory cell transistors. Both the third and fourth positive voltages are less than the second positive voltage.

A method of forming a memory cell includes forming a first polysilicon block over an upper surface of a semiconductor substrate and having top surface and a side surface meeting at a sharp edge, forming an oxide layer with a first portion over the upper surface, a second portion directly on the side surface, and a third portion directly on the sharp edge, performing an etch that thins the oxide layer in a non-uniform manner such that the third portion is thinner than the first and second portions, performing an oxide deposition that thickens the first, second and third portions of the oxide layer, wherein after the oxide deposition, the third portion is thinner than the first and second portions, and forming a second polysilicon block having one portion directly on the first portion of the oxide layer and another portion directly on the third portion of the oxide layer.

A semiconductor device includes a channel region between a source region and a drain region, a gate over the channel region, a dielectric layer over the gate, a capacitive field plate over the dielectric layer, and a word line electrically coupled to the capacitive field plate.