In a semiconductor storage device including a plurality of memory cells formed at a laminated substrate including a support layer, an insulating layer on the support layer, and a semiconductor layer on the insulating layer, the plurality of memory cells each include a floating gate transistor and a selection transistor. The floating gate transistor includes a first source region, a first drain region, a first body region, a first body contact region, a floating gate insulating film, and a floating gate electrode, and the selection transistor includes a second source region, a second drain region, a second body region, a second body contact region insulated from the first body contact region, a selection gate insulating film, and a selection gate electrode.

In an embodiment a noon-volatile memory device includes a memory plane including at least one memory area including an array of memory cells having two rows and N columns, wherein each memory cell comprises a state transistor having a control gate and a floating gate selectable by a vertical selection transistor buried in a substrate and including a buried selection gate, and wherein each column of memory cells includes a pair of twin memory cells, two selection transistors of the pair of twin memory cells having a common selection gate and a processor configured to store in the memory area information including a succession of N bits so that, with exception of the last bit of the succession, a current bit of the succession is stored in two memory cells located on the same row and on two adjacent columns and a current bit and the following bit are respectively stored in two twin cells.

A non-volatile memory device includes an upper semiconductor layer including a first metal pad and vertically stacked on a lower semiconductor layer. The upper semiconductor layer includes a first memory group spaced apart from a second memory group in a first horizontal direction by a separation region, and the lower semiconductor layer includes a second metal and a bypass circuit underlying at least a portion of the separation region and configured to selectively connect a first bit line of the first memory group with a second bit line of the second memory group. The upper semiconductor layer is vertically connected to the lower semiconductor layer by the first metal pad and the second metal pad.

Various embodiments of the present application are directed towards an integrated memory chip with an enhanced device-region layout for reduced leakage current and an enlarged word-line etch process window (e.g., enhanced word-line etch resiliency). In some embodiments, the integrated memory chip comprises a substrate, a control gate, a word line, and an isolation structure. The substrate comprises a first source/drain region. The control gate and the word line are on the substrate. The word line is between and borders the first source/drain region and the control gate and is elongated along a length of the word line. The isolation structure extends into the substrate and has a first isolation-structure sidewall. The first isolation-structure sidewall extends laterally along the length of the word line and underlies the word line.

A semiconductor memory comprising: a comparison readout circuit comprising a first port configured to receive an electric signal of a read memory unit and a second port configured to receive a reference electric signal, the comparison readout circuit being configured to compare the electric signal of the read memory unit with the reference electric signal to obtain storage information of the memory unit; and a first/second column decoder connected to a first/second memory array and the comparison readout circuit and configured to select a bitline corresponding to the read memory unit when a memory array selection signal enables the first/second memory array, and output the electric signal of the memory unit to the first port by means of the bitline, and further configured to connect a first bitline of the first/second memory array to the second port when the memory array selection signal does not enable the first/second memory array.

A spiking neural network device comprises at least one NAND cell string including a first NAND cell string that includes a string select transistor and a plurality of nonvolatile memory cells between a bit line and a ground select line, a string control circuit configured to generate a string selection signal to turn on the string select transistor in response to an input spike, a word line decoder configured to generate a word line selection signal for selecting a word line of a plurality of word lines for each of the plurality of nonvolatile memory cells in response to the input spike, a plurality of sensing circuits connected to the bit line, respectively corresponding to the plurality of word lines, each sensing circuit configured to generate an output spike according to a current transmitted through the bit line when a corresponding word line is selected, a plurality of switch transistors, each configured to connect one of the plurality of sensing circuits to the bit line according to a switch selection signal, and a switch decoder configured to generate a switch selection signal in synchronization with the word line selection signal for a selected word line.

Dual-precision analog memory cells and arrays are provided. In some embodiments, a memory cell, comprises a non-volatile memory element having an input terminal and at least one output terminal; and a volatile memory element having a plurality of input terminals and an output terminal, wherein the output terminal of the volatile memory element is coupled to the input terminal of the non-volatile memory element, and wherein the volatile memory element comprises: a first transistor coupled between a first supply and a common node, and a second transistor coupled between a second supply and the common node; wherein the common node is coupled to the output terminal of the volatile memory element; and wherein gates of the first and second transistors are coupled to respective ones of the plurality of input terminals of the volatile memory element.

An EEPROM memory integrated circuit includes memory cells arranged in a memory plane. Each memory cell includes an access transistor in series with a state transistor. Each access transistor is coupled, via its source region, to the corresponding source line and each state transistor is coupled, via its drain region, to the corresponding bit line. The floating gate of each state transistor rests on a dielectric layer having a first part with a first thickness, and a second part with a second thickness that is less than the first thickness. The second part is located on the source side of the state transistor.

A selective non-volatile memory programming method for a selected memory cell in a memory array is described so as to reduce or avoid program disturbance on an unselected memory cell. This selective programming method comprises: applying a programming pulse to a selected memory cell to be programmed and an unselected memory cell, wherein the programming pulse allows a change of the unselected memory cell within a range specified; boosting a region of the unselected memory cell; and setting a threshold time of the programming pulse, wherein the threshold time is defined when an absolute magnitude of a voltage difference between a floating gate of the unselected memory cell and the boosted region of the unselected memory cell reaches a threshold value defined.

A drain programmed read-only memory includes a diffusion region that spans a width of a bitcell and forms a drain of a first transistor and a second transistor. A bit line lead in a metal layer adjacent the diffusion region extends across the width of the bitcell. A first via extends from an upper half of the bit line lead and couples to a drain of the first transistor. Similarly, a second via extends from a lower half of the bit line and couples to a drain of the second transistor.