A memory device is provided. The memory device includes a first transistor and a second transistor connected in series with the first transistor. The second transistor is programmable between a first state and a second state. A bit line connected to the second transistor. A sense amplifier connected to the bit line. The sense amplifier is operative to sense data from the bit line. A feedback circuit connected to the sense amplifier, wherein the feedback circuit is operative to control a bit line current of the bit-line.

For erasing four-terminal semiconductor Non-Volatile Memory (NVM) devices, we apply a high positive voltage bias to the control gate with source, substrate and drain electrodes tied to the ground voltage for moving out stored charges in the charge storage material to the control gate. For improving erasing efficiency and NVM device endurance life by lowering applied voltage biases and reducing the applied voltage time durations, we engineer the lateral impurity profile of the control gate near dielectric interface such that tunneling occurs on the small lateral region of the control gate near the dielectric interface. We also apply the non-uniform thickness of coupling dielectric between the control gate and the storage material for the NVM device such that the tunneling for the erase operation occurs within the small thin dielectric areas, where the electrical field in thin dielectric is the strongest for tunneling erase operation.

In a semiconductor storage device including a plurality of memory cells formed at a laminated substrate including a support layer, an insulating layer on the support layer, and a semiconductor layer on the insulating layer, the plurality of memory cells each include a floating gate transistor and a selection transistor. The floating gate transistor includes a first source region, a first drain region, a first body region, a first body contact region, a floating gate insulating film, and a floating gate electrode, and the selection transistor includes a second source region, a second drain region, a second body region, a second body contact region insulated from the first body contact region, a selection gate insulating film, and a selection gate electrode.

Memory devices are disclosed. In an embodiment of the disclosed technology, a memory device may include a substrate including an active region, and a first floating gate, a second floating gate, a third floating gate and a fourth floating gate formed on the substrate, arranged to partially overlap with the active region. The first floating gate and the third floating gate are arranged in a first direction at one side of the active region and asymmetrical about a center of the active region, and the second floating gate and the fourth floating gate are arranged in the first direction at another side of the active region and asymmetrical about the center of the active region.

A memory device is provided. The memory device includes a first transistor and a second transistor connected in series with the first transistor. The second transistor is programmable between a first state and a second state. A bit line connected to the second transistor. A sense amplifier connected to the bit line. The sense amplifier is operative to sense data from the bit line. A feedback circuit connected to the sense amplifier, wherein the feedback circuit is operative to control a bit line current of the bit-line.

A non-volatile memory has: a first and a second transistor having their gates connected together; a resistor having a first and a second terminal, with the first terminal connected to the source of the first transistor; a read voltage feed circuit configured to feed a read voltage for turning on at least one of the first and second transistors to between the gate of the first transistor and the second terminal of the resistor and to between the gate and the source of the second transistor; and a signal output circuit configured to output, in a read operation in which the read voltage feed circuit feeds the read voltage, a signal associated with a first or second value based on the drain currents of the first and second transistors.

The present disclosure generally relates to circuit architectures for programming and accessing resistive change elements. The circuit architectures can program and access resistive change elements using neutral voltage conditions. The present disclosure also relates to methods for programming and accessing resistive change elements using neutral voltage conditions. The present disclosure additionally relates to sense amplifiers configurable into initializing configurations for initializing the sense amplifiers and comparing configurations for comparing voltages received by the sense amplifiers. The sense amplifiers can be included in the circuit architectures of the present disclosure.

The invention relates to a two-bit memory cell structure, and an array architecture and a circuit structure thereof in an in-memory computing chip. The double-bit storage unit comprises three transistors which are connected in series, a selection transistor in the middle is used as a switch, and two charge storage transistors are symmetrically arranged on the two sides of the double-bit storage unit. A storage array formed by the double-bit storage unit is used for storing the weight of the neural network, and multiplication and accumulation operation of the neural network is carried out in a two-step current detection mode. According to the invention, leakage current can be effectively controlled, higher weight storage density and higher reliability are realized, and neural network operation with more practical significance is further realized.

A non-volatile memory cell includes a first well of a first conductivity type and a second well of a second conductivity type in a body adjacent to each other; a first conduction region, a second conduction region and a third conduction region in the first well, the first, second and third conduction regions being of the second conductivity type; a control gate region, of the first or second conductivity type, in the second well; a selection gate over the first well forming, together with the first and second conduction regions, a selection transistor; and a floating gate region. The floating gate region has a programming portion overlying the first well and a capacitive portion overlying the second well. The floating gate region forms, together with the second and third conduction regions, a storage transistor and, together with the control gate region, a capacitive element.

A variety of applications can include devices or methods that provide read processing of data in memory cells of a memory device without predetermined read levels for the memory cells identified. A read process is provided to vary a selected access line gate voltage over time, creating a time-variate sequence where memory cell turn-on correlates with programmed threshold voltage. Total string current of data lines of a group of strings of memory cells of the memory device can be monitored during a read operation of selected memory cells of the strings to which a ramp voltage with positive slope is applied to an access line coupled to the selected memory cells. Selected values of the change of the total current with respect to time, from the monitoring of the total current, are determined. Read points to capture data are based on the determined selected values. Additional devices, systems, and methods are discussed.