G01R31/2865

INSPECTION JIG AND BOARD INSPECTION APPARATUS INCLUDING THE SAME
20230117705 · 2023-04-20 ·

An inspection jig includes a first board, a probe unit including a probe, a second board located in parallel with the first board and electrically connected to the probe, an electrical connection portion electrically connecting the first board and the second board, and a board holding portion holding the second board in parallel with the first board in the thickness direction and holding the probe unit. The board holding portion includes a probe-side holding plate located on the probe unit side of the second board and a holding plate support portion that positions the probe-side holding plate at a position where the probe-side holding plate is in parallel with the first board in the thickness direction. The board holding portion holds the second board so that the first board and the second board are electrically connected via the electrical connection portion being sandwiched between the first board and second board.

TEST APPARATUS FOR SEMICONDUCTOR PACKAGE
20230065997 · 2023-03-02 ·

An apparatus for testing a package-on-package type semiconductor package includes an upper test socket on which an upper package is mounted, the upper test socket being mounted on a pusher and connected to the lower package; a lower test socket mounted on a tester and connected to the lower package; and an adsorption pad coupled to the pusher and configured to adsorb and pressurize the lower package using a vacuum pressure, wherein the adsorption pad comprises a body part having a vacuum pressure passage formed therein; and an adsorption part having an adsorption hole corresponding to the vacuum pressure passage, and the body part is attached on a central portion of an upper surface of the adsorption part and an outer oil overflow-preventing part configured to trap silicon oil eluted from the body part is formed at an outer periphery the adsorption part.

INSPECTION JIG
20220316980 · 2022-10-06 · ·

An inspection jig is used for inspection for an inspection target device including a flexible substrate having a flexible base material with external connection terminals formed thereon. The inspection jig is composed of an inspection device and an attraction part. The inspection device has inspection terminals, and the inspection terminals have vacuum attraction holes. The attraction part has an attraction surface. The external connection terminals have first through holes. In inspection, the attraction part is placed on the front surface of the flexible base material so that the first through holes and the vacuum attraction holes overlap each other and the attraction surface covers the first through holes, and the insides of the first through holes and the vacuum attraction holes are made into vacuum, whereby the attraction surface is attracted to the flexible base material and the external connection terminals are attracted to the inspection terminals.

Planar ring radiation barrier for cryogenic wafer test system

One example includes a cryogenic wafer test system. The system includes a first chamber that is cooled to a cryogenic temperature and a wafer chuck confined within the first chamber. The wafer chuck can be configured to accommodate a wafer device-under-test (DUT) comprising a plurality of superconducting die. The system also includes a second chamber that is held at a non-cryogenic temperature and which comprises a wafer chuck actuator system configured to provide at least one of translational and rotational motion of the wafer chuck via mechanical linkage interconnecting the wafer chuck and the wafer chuck actuator system. The system further includes a radiation barrier arranged between the first chamber and the second chamber and through which the mechanical linkage extends, the radiation barrier being configured to provide a thermal gradient between the cryogenic temperature of the first chamber and the non-cryogenic temperature of the second chamber.

TEMPERATURE-CONTROL DEVICE, SYSTEM, AND METHOD FOR CONTROLLING THE TEMPERATURE OF A PROBER TABLE FOR SEMICONDUCTOR WAFERS AND/OR HYBRIDS
20230207346 · 2023-06-29 ·

A temperature-control device (1) is provided for controlling the temperature of a prober table (110) for semiconductor wafers and/or hybrids. The device has a fluid inlet (10) for introducing a temperature-control fluid into the temperature-control device (1) and a first heat exchanger (20) for preliminary control of the temperature of the temperature-control fluid that is introduced. A second heat exchanger (30) is used to control the temperature of the temperature-control fluid. The temperature-controlled temperature-control fluid can be conducted to the prober table (110) through a prober temperature-control line (40). A return circuit (60) is configured, so that upon receiving a return switch signal, the return circuit (60) selectively either conducts a temperature-control fluid returned from the prober table (110) through the first heat exchanger (20) or allows the temperature control fluid to flow out bypassing the first heat exchanger (20).

Multi-prober chuck assembly and channel

A multi-prober chuck assembly and channel are provided. The multi-prober chuck assembly, according to one embodiment of the present invention, comprises: a chuck for supporting a wafer; a probe card structure coupled to the top part of the chuck; a heater for heating the chuck under the chuck; a conductive guard plate spaced apart from the heater below the heater; and a body part positioned under the chuck so that the heater and the guard plate are positioned inside the body part, wherein the probe card structure and the body part are coupled mechanically to form a cartridge-type structure.

ELECTROSTATIC CHUCK IMPEDANCE EVALUATION
20170345698 · 2017-11-30 ·

A support assembly for a semiconductor processing chamber is provided and includes a body comprising a heater, and a puck coupled to the body, the puck comprising a chucking electrode embedded in a dielectric material, wherein, when a radio frequency power of about 13.56 megahertz is applied to a substrate receiving surface of the body, an electrical resistance (R) of the body is about 0.460 Ohms, or less, and an electrical reactance (X) of the body is about 10.9 Ohms, or greater.

Housing with anti-dislodge capability

A contactor assembly for a testing system is disclosed. The assembly includes a contact having a contact tail and a housing having a top surface and a bottom surface. A slot extends through the housing from the top surface to the bottom surface and defines a first inner side wall of the housing and a first inner end wall. The contact is receivable in the slot. The contact tail includes a sloped terminus. A retainer is disposed on the first inner side wall. When the sloped terminus is engaged with the first inner end wall, at least a portion of the retainer overlaps with the contact forming at an overlapping area in a cross-sectional view, thereby preventing removal of the contact from the top side of the housing.

Shielding for probing system

A probing system includes a chuck configured to support a device under test (DUT); a probe card disposed above the chuck and including a plurality of probes protruding from the probe card toward the chuck; and a platen disposed between the chuck and the probe card and configured to support the probe card, wherein the chuck includes a shielding member disposed between the platen and the chuck.

Wafer probe station
11262401 · 2022-03-01 · ·

A wafer probe station includes a thermal chuck, a chuck stage, a platen, some probes, a first focusing device, a second focusing device and a thermal plate. The thermal chuck heats up to an operational temperature and holds a device under test (DUT). The chuck stage connects with the thermal chuck and moves the thermal chuck. The thermal chuck locates between the chuck stage and the platen. The probes are disposed on the platen and configured to contact with the DUT. The first focusing device is disposed on the platen to focus on the DUT. The second focusing device is disposed on the chuck stage to focus on the probes. The thermal plate locates between the second focusing device and the platen and is configured to heat up to the operational temperature. The thermal plate has a through hole aligning with the second focusing device.