Patent classifications
G01N2021/646
DETECTION OF CONTAMINATION ON STEEL PARTS USING ULTRAVIOLET LIGHT
There is disclosed methods and apparatus for detecting contamination on cold-formed steel parts prior to subsequent press-hardening in which such contamination may be problematic, and also for detecting contamination on cold-forming machinery that might be transferred to cold-formed steel parts during cold-forming. In some aspects, the disclosure also relates to methods and apparatus for detecting splits or cracks in cold-formed steel parts prior to subsequent press-hardening. The methods and apparatus make use of ultraviolet light to detect contamination or to detect splits or cracks.
Method of Visualizing and Quantifying Remineralization
A method of assessing and/or quantifying remineralization in a tooth model by exposing a tooth model to calcium and a calcium-binding fluorophore either sequentially or simultaneously under conditions sufficient to produce a remineralized/demineralized tooth model; exposing the remineralized/demineralized tooth model to a non-calcium binding fluorophore to produce an enhanced tooth model; and assessing and/or quantifying remineralization, demineralization, or both on the enhanced tooth model by determining the location and extent of calcium binding fluorophore and non-calcium binding fluorophore on the enhanced test tooth sample.
METHODS AND SYSTEMS FOR IDENTIFYING FEATURES
Aspects of the present disclosure include methods, apparatuses, and computer readable media for transmitting a light such that it is incident on a multi-layer stack, wherein the multi-layer stack includes the feature and a region without the feature, detecting a narrow-band light from the feature and the region without the feature, wherein the feature has a first optical response in response to a wavelength of the narrow-band light and the region without the feature has a second optical response in response to the wavelength of the narrow-band light, and generating, based on the narrow-band light, an image indicative of where the first optical response and the second optical response occur on the multi-layer stack.
APPARATUS AND METHOD FOR EXTRACTING LOW INTENSITY PHOTONIC SIGNALS
A system for detecting stimulated emission from a material of interest comprising: an excitation source; and an imaging component; wherein, in use, the system is configured to: a) emit excitation radiation from the excitation source for a first time period, the excitation radiation having a wavelength suitable for inducing stimulated emission in the material of interest; b) capture a first image via the imaging component, the first image substantially consisting of a background illumination component and a stimulated emission component; c) stop emitting excitation radiation for a second time period; d) capture a second image via the imaging component, the second image substantially consisting of the background illumination component; e) create a difference image corresponding to the difference between the first and second images, such that the difference image includes any stimulated emission signals from the material of interest.
METHOD OF EVALUATING SiC SUBSTRATE, METHOD OF MANUFACTURING SiC EPITAXIAL WAFER, AND METHOD OF MANUFACTURING SiC DEVICE
This method of evaluating a SiC substrate includes a preparation step of preparing two or more SiC substrates obtained from the same SiC ingot grown from the same seed crystal, a defect position specifying step of specifying positions of defects in the substrates by observing a main surface of each of the two or more SiC substrates, and a comparison step of comparing the positions of the defects of the two or more SiC substrates, in which, in the preparation step, a SiC substrate positioned closest to the seed crystal is used as a reference wafer among the two or more SiC substrates, and the comparison step comprises a sub-step wherein a first defect of the reference wafer is compared with a second defect of a SiC substrate other than the reference wafer, it is judged whether a defect distance of the two compared defects in a [11-20] direction is 0.6 mm or more or less than 0.2 mm, and the two compared defects are determined to be defects not associated with the same threading defect when the defect distance is 0.6 mm or more, and the two compared defects are determined to be defects associated with the same threading defect when the defect distance is less than 0.2 mm.
DETECTION OF DEFECTS ON METAL SURFACES
In one aspect, the disclosure relates to the detection of defects on metal surfaces. In accordance with the purpose(s) of the present disclosure, as embodied and broadly described herein, the disclosure, in one aspect, relates to methods for using functionalized CdSe/ZnS quantum dots to detect damage on metal surfaces including, but not limited to, copper surfaces such as those found in passive components of electronic devices. Also disclosed herein are methods for removing bound quantum dots from metal surfaces. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
SYSTEMS AND METHODS FOR BIO-INACTIVATION
A system for irradiating a microplate may include a modular light engine with one or more light emitting devices. The light emitting devices are configured to emit germicidal radiation to irradiate the microplate, which is configured to be positioned below the modular light engine inside a chamber of the microplate irradiation system. In this way, a uniform intensity of germicidal radiation may be output by light emitting devices, resulting in disruption of contaminating nucleic acids present in the microplate.
LOCALIZED SURFACE COATING DEFECT PATCHING PROCESS
A method of producing a coating. The method includes determining a surface defect region of a coating on a substrate and a location of the surface defect. The method further includes selectively and locally correcting the surface defect by applying a corrective coating region to the surface defect region based on the location of the surface defect via spatial atomic layer deposition (SALD) using an SALD reactor.
METHOD OF AND APPARATUS FOR PRODUCING AN IMAGE ON A DISPLAY SCREEN
A method of producing an image on a display screen comprises the steps of generating at least one wavelength of light in a selected wavelength band of red light in the wavelength range from about 620 nm to about 655 nm and/or yellow-green light in the wavelength range from about 530 nm to about 580 nm, and directing the generated light to a target object containing an accumulation of a fluorescable biomarker, such that the generated light reaches the fluorescable biomarker and excites the fluorescable biomarker to thereby cause it to emit fluoresced light within a characteristic wavelength band. The fluoresced light from the fluorescable biomarker is captured. A digital data file representative of the captured fluoresced light is created. A representative image is formed on a display screen from the digital data file. An apparatus for generating an image on a display screen using the above method is also disclosed.
Semiconductor defect inspection apparatus
A semiconductor defect inspection apparatus for inspecting a specimen including a semiconductor substrate having a surface on which a predetermined pattern is formed, includes an excitation light irradiator, a polarization converter, a detector, and a defect analysis detector. The excitation light irradiator irradiates the specimen with excitation light along an optical path from the irradiator to the specimen and such that the excitation light is obliquely incident at a predetermined incident angle. The first polarization converter is disposed in the optical path, and converts the excitation light into s-polarized light. The detector detects photoluminescence light generated from the specimen when the excitation light is incident on the specimen. The defect analysis detector detects a dislocation defect by analyzing a photoluminescence image obtained by photoelectrically converting the photoluminescence light.