There are provided a display device and a method for fabricating the display device. The display device includes a thin-film transistor located in each pixel defined by intersection between a gate line extending in a first direction and a data line extending in a second direction on a substrate. A first electrode has a first layer connected to one of a source electrode or a drain electrode of the transistor through the first contact hole and a second layer located on the first layer and in the first contact hole. There is also a signal line including a first signal line layer formed on the first protective layer of the same material on the same layer as the first layer of the first electrode and a second signal line layer formed on the first signal line layer of the same material as the second.

A liquid crystal display panel includes: first laminated structures provided on a first substrate; and first spacers provided on a second substrate. A plurality of transistors are provided in each of a plurality of pixels. The respective first spacer is located between two adjacent transistors of the plurality of transistors in corresponding one of the plurality of pixels. The first laminated structure is provided opposite to the first spacer. Each of the plurality of transistors includes a gate electrode, a semiconductor layer, and a source and drain electrode. The first laminated structure includes a first film formed in a layer identical to that of the gate electrode and a second film formed in a layer identical to that of one of the semiconductor layer and the source and drain electrode.

The present disclosure provides a manufacturing method for an array substrate and a liquid crystal display device. The manufacturing method for an array substrate may include: providing a substrate; forming a thin film transistor device comprising a source and a drain on the substrate; covering a passivation layer, a blocking layer, and a photoresist layer on the thin film transistor device, sequentially; processing the photoresist layer to divide the blocking layer and the passivation layer into a first region and a second region corresponding to positions of an active area, and a third region corresponding to a position of the thin film transistor device. By the above-mentioned manufacturing method, on one hand, a number of mask processes may be reduced, and the manufacturing efficiency may be improved. On the other hand, peeling efficiency of the photoresist may be improved.

An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal diversion groove.

A display device includes a display element including a first electrode, a protective layer arranged on the first electrode, a second electrode arranged on the protective layer at a pixel area and contacting a thin film transistor. A sensing line is arranged on the protective layer and contacts the first electrode through a contact hole exposing the first electrode through the third protective layer. The sensing line comprises a first conductive layer arranged on the protective layer and contacting the second electrode through the contact hole, and a second conductive layer arranged on the first conductive layer.

The present disclosure provides an array substrate. The array substrate includes a base on which pixel electrodes, gate lines, data lines, and thin film transistors are disposed. The data lines and the gate lines are alternately arranged to define a plurality of pixel units one-to-one corresponding to the pixel electrodes and the thin film transistors. An insulating layer is disposed between the pixel electrodes and a layer where a data pattern is located. The data pattern, part of which is overlapped with the pixel electrodes, includes the data lines and source electrodes of the thin film transistors. The insulating layer is provided with recesses, and an orthographic projection of the recess on the base is outside of an orthographic projection of an overlapping region of the pixel electrode and the data pattern on the base.

The embodiments of the present disclosure provide a display panel, a method for producing the same and a display apparatus. The display panel includes a first sub-pixel region; a second sub-pixel region, wherein an aperture opening ratio of the first sub-pixel region is less than an aperture opening ratio of the second sub-pixel region; and an insulation layer, having a first thickness at the first sub-pixel region less than a second thickness of the insulation layer at the second sub-pixel region, so that a first cell gap of the display panel at the first sub-pixel region is larger than a second cell gap of the display panel at the second sub-pixel region, thereby at least partially compensating for a difference between the aperture opening ratio of the first sub-pixel region and the aperture opening ratio of the second sub-pixel region.

A display device includes: a substrate; a touch electrode disposed on the substrate; a routing wiring disposed on the touch electrode; a light blocking layer disposed on the touch electrode; a semiconductor layer disposed on the light blocking layer; a source electrode and a drain electrode spaced apart from each other and disposed on the semiconductor layer; and a gate electrode disposed on the source electrode and the drain electrode.

A display device and a method of manufacturing the display device are disclosed. In one aspect, the display device includes a substrate including a display region and a peripheral region. A first block member is in the peripheral region and surrounding display structures, the first block member having a first height. A second block member is spaced apart from the first block member in a first direction extending from the display region to the peripheral region, the second block member surrounding the first block member, the second block member having a second height that is greater than the first height. A first encapsulation layer is over the display structures, the first block member, and the second block member. A second encapsulation layer is over the first encapsulation layer, the second encapsulation layer overlapping at least a portion of the first block member in the depth dimension of the display device.

The number of masks and photolithography processes used in a manufacturing process of a semiconductor device are reduced. A first conductive film is formed over a substrate; a first insulating film is formed over the first conductive film; a semiconductor film is formed over the first insulating film; a semiconductor film including a channel region is formed by etching part of the semiconductor film; a second insulating film is formed over the semiconductor film; a mask is formed over the second insulating film; a first portion of the second insulating film that overlaps the semiconductor film and second portions of the first insulating film and the second insulating film that do not overlap the semiconductor film are removed with the use of the mask; the mask is removed; and a second conductive film electrically connected to the semiconductor film is formed over at least part of the second insulating film.