A method and apparatus are provided for identifying a material with a sample-specific reference spectral list or library. A sequential approach to SEM-EDS automated mineralogy classification is carried out by performing two or more material classification analyses. A pre-classification step restricts the processing of spectra deconvolution algorithms to a subset of spectra that pass a dominant mineral criteria resulting in a significantly reduced subset of reference spectra that occur within the measured sample in pure enough form at a given minimum quantity. The following complex classification stages involving deconvolution of multiple constituents within measured spectra is based on this sample relevant subset.

A method and apparatus are provided for identifying a material with a sample-specific reference spectral list or library. A sequential approach to SEM-EDS automated mineralogy classification is carried out by performing two or more material classification analyses. A pre-classification step restricts the processing of spectra deconvolution algorithms to a subset of spectra that pass a dominant mineral criteria resulting in a significantly reduced subset of reference spectra that occur within the measured sample in pure enough form at a given minimum quantity. The following complex classification stages involving deconvolution of multiple constituents within measured spectra is based on this sample relevant subset.

A device for mass spectrometry in continuous operation can be equipped with a focused electron beam source or laser radiation source. It can further include a vacuum chamber, a stage for placing the specimen, and an ion beam column with a plasma source for producing a primary ion beam and a secondary ion mass spectrometer for secondary ion analysis. The ion beam column is connected to an inert gas source and to a reactive gas source and is modified for simultaneous introduction of at least two gases from the inert gas source and reactive gas source. The secondary ion mass spectrometer is of an orthogonal Time-of-Flight type to ensure the function with the ion beam column in continuous operation.

An inverse photoemission spectroscopy apparatus is configured to detect a light generated by the relaxation of electrons to an unoccupied state of a sample. The apparatus includes an electron source for generating electrons with which a sample is irradiated, a wavelength selector for extracting a light having a certain wavelength from the light generated in the sample, a photodetector for detecting the light extracted by the wavelength selector; and a focusing optics disposed between the sample and the photodetector. The electron source contains yttrium oxide as a thermionic emission material.

The present invention relates to an object information obtaining apparatus that obtains information about a phase image of an object using information about an interference pattern produced by a shearing interferometer, the interference pattern being formed by an electromagnetic wave or electron beam passed through or reflected by the object. The apparatus includes a first obtaining unit configured to obtain information about a differential phase image of the object using the information about the interference pattern, a second obtaining unit configured to obtain information about contrast in each region of the interference pattern, a third obtaining unit configured to weight the information about the differential phase image using the information about the contrast to obtain information about a weighted differential phase image, and a fourth obtaining unit configured to integrate the information about the weighted differential phase image to obtain the information about the phase image of the object.

The present invention relates to an object information obtaining apparatus that obtains information about a phase image of an object using information about an interference pattern produced by a shearing interferometer, the interference pattern being formed by an electromagnetic wave or electron beam passed through or reflected by the object. The apparatus includes a first obtaining unit configured to obtain information about a differential phase image of the object using the information about the interference pattern, a second obtaining unit configured to obtain information about contrast in each region of the interference pattern, a third obtaining unit configured to weight the information about the differential phase image using the information about the contrast to obtain information about a weighted differential phase image, and a fourth obtaining unit configured to integrate the information about the weighted differential phase image to obtain the information about the phase image of the object.

Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary,
in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.

The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary,
in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.