Patent classifications
H01S3/005
LASER AMPLIFICATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
A laser amplification device includes a laser oscillator that includes a first laser active medium including a mixed gas containing carbon dioxide gas and emits pulsed laser light with the full width at half maximum of between 15 ns to 200 ns, and a laser amplifier that includes a second laser active medium including a mixed gas containing carbon dioxide gas through which the pulsed laser light emitted from the laser oscillator passes to be shortened to pulsed laser light with the full width at half maximum of between 5 ns and 30 ns to be output.
Nanocavities, and systems, devices, and methods of use
Disclosed are dielectric cavity arrays with cavities formed by pairs of dielectric tips, wherein the cavities have low mode volume (e.g., 7*10.sup.−5λ.sup.3, where X is the resonance wavelength of the cavity array), and large quality factor Q (e.g., 10.sup.6 or more). Applications for such dielectric cavity arrays include, but are not limited to, Raman spectroscopy, second harmonic generation, optical signal detection, microwave-to-optical transduction, and as light emitting devices.
Synthetic diamond optical elements
An optical element comprising a window formed of synthetic diamond material and an optical surface pattern formed directly in a surface of the synthetic diamond material. The window of synthetic diamond material is in the form of a wedged diamond window with non-parallel major surfaces defining a wedge angle in a range (1) arcminute to 10° and the optical surface pattern is formed directly in one or both of the non-parallel major surfaces. There is also described a laser system comprising the optical element and a laser having a coherence length, wherein the coherence length of the laser is greater than twice a thickness of the wedged diamond window at its thickest point.
LASER LIGHT SOURCE, WAVELENGTH CONVERSION LIGHT SOURCE, LIGHT COMBINING LIGHT SOURCE, AND PROJECTION SYSTEM
A laser light source (300), a wavelength conversion light source, a light combining light source, and a projection system. The laser light source comprises a laser element array, a focusing optical element (33), a collimation optical element (34), an integrator rod (36) for receiving and homogenizing a secondary laser beam array (382), an angular distribution control element (35) disposed on the light path between the laser element array and the integrator rod (36) for enlarging the divergence angle of the laser beam array (382) in the direction of the short axis of the light distribution, such that the rate between the divergence angle of each of the secondary laser beam that enters the integrator rod (36) in the direction of the short axis of the light distribution and the divergence angle in the direction of the long axis is greater than or equal to 0.7.
METHOD AND APPARATUS FOR USE IN LASER SHOCK PEENING
An apparatus may include a diode-pumped solid-state laser oscillator configured to output a pulsed laser beam, a modulator configured to modify an energy and a temporal profile of the pulsed laser beam, and an amplifier configured to amplify an energy of the pulse laser beam. A modified and amplified beam to laser peen a target part may have an energy of about 5J to about 10 J, an average power (defined as energy (J) x frequency (Hz)) of from about 25 W to about 200 W, with a flattop beam uniformity of less than about 0.2. The diode-pumped solid-state oscillator may be configured to output a beam having both a single longitudinal mode and a single transverse mode, and to produce and output beams at a frequency of about 20 Hz.
LASER LIGHT SOURCE, WAVELENGTH CONVERSION LIGHT SOURCE, LIGHT COMBINING LIGHT SOURCE, AND PROJECTION SYSTEM
A laser light source (300), a wavelength conversion light source, a light combining light source, and a projection system. The laser light source comprises a laser element array, a focusing optical element (33), a collimation optical element (34), an integrator rod (36) for receiving and homogenizing a secondary laser beam array (382), an angular distribution control element (35) disposed on the light path between the laser element array and the integrator rod (36) for enlarging the divergence angle of the laser beam array (382) in the direction of the short axis of the light distribution, such that the rate between the divergence angle of each of the secondary laser beam that enters the integrator rod (36) in the direction of the short axis of the light distribution and the divergence angle in the direction of the long axis is greater than or equal to 0.7.
ATTENUATOR
The present invention relates to an attenuator for a light source that has a monochromatic output, and in particular a variable attenuator for such a source.
LINE BEAM FORMING DEVICE
Provided is a line beam forming device that can divide a laser beam into beam segments in a first direction (y-axis) perpendicular to the traveling direction (z-axis) of the laser beam, and arrange and emit the beam segments with regular intervals in a second direction (x-axis) perpendicular to the traveling direction of the laser beam, using a single mirror set composed of a plurality of mirrors. The line beam forming device of the present invention can be used for an excimer laser which is a multimode laser beam generator with high beam divergence, a high-power DPSS laser, or a laser diode, can obtain high-density energy by condensing beams, can obtain a beam profile having uniform intensity in both of a long axis and a short axis, and can combine a plurality of laser beams without being influenced by the properties of an incident beam.
Laser irradiation method and laser irradiation system
A laser irradiation method of irradiating, with a pulse laser beam, an irradiation object in which an impurity source film is formed on a semiconductor substrate includes: reading fluence per pulse of the pulse laser beam with which a rectangular irradiation region set on the irradiation object is irradiated and the number of irradiation pulses the irradiation region is irradiated, the fluence being equal to or larger than a threshold at or beyond which ablation potentially occurs to the impurity source film when the irradiation object is irradiated with pulses of the pulse laser beam in the irradiation pulse number and smaller than a threshold at or beyond which damage potentially occurs to the surface of the semiconductor substrate; calculating a scanning speed Vdx; and moving the irradiation object at the scanning speed Vdx relative to the irradiation region while irradiating the irradiation region with the pulse laser beam at the repetition frequency f.
LASER DEVICE
The purpose of the present invention is to provide a laser device that makes it possible to minimize condensation in a closed space by means of a simple structure. This laser device comprises a closed space (S4) in which an optical system (31) for transmitting laser light is accommodated and a dew point adjustment flow path (5) of which at least one part is a flow path wall section formed from a transmissive material (51) through which gas molecules including water vapor are transmitted and dust and oil mist are not transmitted. The transmissive material (51) separates the interior of the dew point adjustment flow path (5) and the closed space (S4).