Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.

A system for reducing plasma instability is disclosed. The system includes: an outer electrode having a first end and a second end spaced from the first end; and an inner electrode disposed inside of a void defined within the outer electrode and arranged coaxial with the outer electrode. The inner electrode includes: a base end defined by the first end of the outer electrode; and an apical end spaced from the base end. The system includes a fiber injector configured to inject a frozen fiber into the void from the apical end of the inner electrode; an electrode power source configured to energize the outer electrode and the inner electrode, and thereby, cause a plasma contained within the outer electrode to flow axially along the frozen fiber; and a frozen fiber power source configured to drive an electrical pulse to the frozen fiber.

A system for reducing plasma instability is disclosed. The system includes: an outer electrode having a first end and a second end spaced from the first end; and an inner electrode disposed inside of a void defined within the outer electrode and arranged coaxial with the outer electrode. The inner electrode includes: a base end defined by the first end of the outer electrode; and an apical end spaced from the base end. The system includes a fiber injector configured to inject a frozen fiber into the void from the apical end of the inner electrode; an electrode power source configured to energize the outer electrode and the inner electrode, and thereby, cause a plasma contained within the outer electrode to flow axially along the frozen fiber; and a frozen fiber power source configured to drive an electrical pulse to the frozen fiber.

A system for reducing plasma instability is disclosed. The system includes: an outer electrode having a first end and a second end spaced from the first end; and an inner electrode disposed inside of a void defined within the outer electrode and arranged coaxial with the outer electrode. The inner electrode includes: a base end defined by the first end of the outer electrode; and an apical end spaced from the base end. The system includes a fiber injector configured to inject a frozen fiber into the void from the apical end of the inner electrode; an electrode power source configured to energize the outer electrode and the inner electrode, and thereby, cause a plasma contained within the outer electrode to flow axially along the frozen fiber; and a frozen fiber power source configured to drive an electrical pulse to the frozen fiber.

According to the present invention, provided is an inductively coupled plasma reactor including: a reaction chamber configured to provide a plasma reaction space; a ferrite core arranged to surround the plasma reaction space; and an antenna coil formed by winding a strip-shaped wire structure on the ferrite core, wherein the wire structure includes a plurality of electrically conductive wires and a covering made of a flexible material and configured to surround the plurality of electrically conductive wires.

According to the present invention, provided is an inductively coupled plasma reactor including: a reaction chamber configured to provide a plasma reaction space; a ferrite core arranged to surround the plasma reaction space; and an antenna coil formed by winding a strip-shaped wire structure on the ferrite core, wherein the wire structure includes a plurality of electrically conductive wires and a covering made of a flexible material and configured to surround the plurality of electrically conductive wires.

An inertial electrostatic confinement fusion device has a body defining an internal vacuum chamber cavity, the chamber having attached a pump to evacuate atmosphere to vacuum conditions, the chamber further having attached a source to inject a nuclear fusion fuel at a metered rate, the chamber further having within it a plurality of electrodes connected to a high voltage alternating current power supply such that at least one pair of electrodes consistently have electrical charge of opposite polarity and of equal magnitude, the distance between them defining an electrode gap. The assembly acts to control the specific relationship between the electrode gap and the applied power, both frequency and voltage, to excite ions of the nuclear fuel enough to generate fusion but alternate the electrode polarity sufficiently to prevent the ions from completely traversing the electrode gap, preventing electrode bombardment.

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source and a beam shaper. The illumination source can be configured to output illumination having a first pupil power distribution. In embodiments, the beam shaper is configured to receive the illumination having the first pupil power distribution from the illumination source and is further configured to output pump illumination having a second pupil power distribution that is different from the first pupil power distribution.

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source and a beam shaper. The illumination source can be configured to output illumination having a first pupil power distribution. In embodiments, the beam shaper is configured to receive the illumination having the first pupil power distribution from the illumination source and is further configured to output pump illumination having a second pupil power distribution that is different from the first pupil power distribution.