H05H1/02

Systems and methods for improved sustainment of a high performance FRC and high harmonic fast wave electron heating in a high performance FRC
11929182 · 2024-03-12 · ·

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injection and high harmonic fast wave electron heating.

Systems and methods for improved sustainment of a high performance FRC and high harmonic fast wave electron heating in a high performance FRC
11929182 · 2024-03-12 · ·

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injection and high harmonic fast wave electron heating.

System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. The system may include an illumination source configured to output a pump beam, one or more focusing optics, and one or more beam shapers configured to reshape the pump beam to provide a shaped pupil power distribution at an illumination pupil plane of the one or more focusing optics. The shaped pupil power distribution may include at least one of a flat-top distribution or an inverted distribution with a central local intensity minimum. Further, the one or more focusing optics may receive the pump beam from the one or more beam shapers and direct the pump beam to a plasma-forming material, whereby the pump beam at least one of forms or maintains a plasma that emits broadband illumination.

System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. The system may include an illumination source configured to output a pump beam, one or more focusing optics, and one or more beam shapers configured to reshape the pump beam to provide a shaped pupil power distribution at an illumination pupil plane of the one or more focusing optics. The shaped pupil power distribution may include at least one of a flat-top distribution or an inverted distribution with a central local intensity minimum. Further, the one or more focusing optics may receive the pump beam from the one or more beam shapers and direct the pump beam to a plasma-forming material, whereby the pump beam at least one of forms or maintains a plasma that emits broadband illumination.

MICROWAVE PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING MULTIPLE MICROWAVE PLASMA APPLICATORS

The embodiments disclosed herein are directed to systems and devices which utilize multiple microwave plasmas can be used to increase the efficiency of traditional single microwave plasma systems. Disclosed herein is a microwave plasma apparatus for processing materials which includes a reaction chamber, a plurality of microwave plasma applicators in communication with the reaction chamber, one or more microwave radiation sources, at least one waveguide for guiding microwave radiation from the one or more microwave radiations sources to multiple plasma applicators, and a material feeding system in communication with the reaction chamber.

System and Method for Pumping Laser Sustained Plasma with a Frequency Converted Illumination Source
20190373709 · 2019-12-05 ·

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source configured to output illumination having a first spectral frequency and an optical frequency converter. The optical frequency converter can be configured to receive the illumination having the first spectral frequency from the illumination source and configured to output pump illumination having a second spectral frequency that is different from the first spectral frequency.

System and Method for Pumping Laser Sustained Plasma with a Frequency Converted Illumination Source
20190373709 · 2019-12-05 ·

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source configured to output illumination having a first spectral frequency and an optical frequency converter. The optical frequency converter can be configured to receive the illumination having the first spectral frequency from the illumination source and configured to output pump illumination having a second spectral frequency that is different from the first spectral frequency.

SYSTEMS AND METHODS FOR IMPROVED SUSTAINMENT OF A HIGH PERFORMANCE FRC AND HIGH HARMONIC FAST WAVE ELECTRON HEATING IN A HIGH PERFORMANCE FRC
20190326023 · 2019-10-24 ·

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injection and high harmonic fast wave electron heating.

SYSTEMS AND METHODS FOR IMPROVED SUSTAINMENT OF A HIGH PERFORMANCE FRC AND HIGH HARMONIC FAST WAVE ELECTRON HEATING IN A HIGH PERFORMANCE FRC
20190326023 · 2019-10-24 ·

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injection and high harmonic fast wave electron heating.

SYSTEMS, METHODS, AND DEVICES FOR GENERATING PREDOMINANTLY RADIALLY EXPANDED PLASMA FLOW
20240147599 · 2024-05-02 ·

Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.