Patent classifications
H05H2242/10
PLASMA REACTOR
A plasma reactor for decomposing a hydrocarbon fluid includes a reactor chamber and a plasma torch attached to a wall of the reactor chamber and including an inner tubular electrode and an outer tubular electrode. A feed lance projecting into the reactor chamber is arranged inside the inner tubular electrode and is displaceable relative to the tubular electrodes by way of a sliding mechanism. A plasma gas outlet for dispensing plasma gas is between the inner tubular electrode and the outer tubular electrode, and an oxidizing fluid outlet for dispensing oxidizing fluid preferably including CO.sub.2 or H.sub.2O is disposed within the inner tubular electrode. Related methodology is also disclosed.
DEVICE AND METHOD FOR GENERATING A DIELECTRIC BARRIER DISCHARGE
In an embodiment a device includes a thermoelectric component, an electrode arranged opposite the thermoelectric component, a high voltage source configured to generate a high voltage between the thermoelectric component and the electrode sufficient to ignite a dielectric barrier discharge, wherein the thermoelectric component includes two or more thermoelectric elements and metal bridges connecting the thermoelectric elements, and a weakly conductive layer directly contacting the metal bridges and a first ceramic plate.
Plasma Treatment With Liquid Cooling
A method for the treatment, in particular for cleaning, reduction treatment and/or coating, of a workpiece, in which an atmospheric plasma jet is generated. A workpiece to be treated, in particular a workpiece to be cleaned, reduced and/or coated, is brought into contact with a liquid. A surface of the workpiece to be treated or the liquid is impinged with the atmospheric plasma jet. An apparatus for the treatment, in particular for cleaning, reduction treatment and/or coating, of a strip-shaped workpiece, in particular a metal strip, in particular for carrying out the afore-mentioned method.
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
Resonator Coil Frequency Vibration Control
An ion implanter that includes a plurality of RF resonator cavities is disclosed. Each RF resonator cavity includes a resonator coil. A cooling fluid is passed through the resonator coil. A sensor or transducer is used to measure a parameter of the cooling fluid, such as flow rate or pressure, as it exits the cooling fluid source. The measured parameter is then used by a vibration control system to control an actuator assembly located near the resonator coil. The actuator assembly is used to reduce the variations in the parameter, as experienced by the resonator coil. This system may reduce the amount of frequency vibration that the resonator coil experiences.
Compact neutron generator based on an all-glass helicon wave ion source
The present application discloses a compact neutron generator based on an all-glass helicon wave ion source, which belongs to the field of accelerator neutron sources. The neutron generator includes a helicon wave ion source part, a cavity part, and a target part. First, deuterium gas is introduced into the ion source chamber. Then, the deuterium gas is excited by an antenna, thereby generating a helicon wave plasma. Under the constraint of a magnetic field, deuterium ions are first extracted in the form of a beam by the potential difference between an extraction electrode and an ion source cover plate, and then accelerated by the electric field between the extraction electrode and a titanium target. Finally, the deuterium ion beam bombards the titanium target, and a deuterium-deuterium fusion reaction occurs to generate neutrons. At the same time, an arc magnet and a resistor are used to suppress the secondary electrons generated by the target, so as to prevent the secondary electrons from being reversely accelerated and entering the ion source chamber. The present application has the advantages of low energy consumption, a compact structure, high plasma density, autonomous cooling, a good secondary electron suppression effect, high extraction beam intensity, and a high neutron yield.