An apparatus for producing a plasma including a control circuit which is electrically connected to a piezoelectric transformer in order to excite the piezoelectric transformer. A hand-held device that uses the apparatus. The piezoelectric transformer is constructed of several layers. The control circuit is implemented on a circuit board, and the piezoelectric transformer is held over the circuit board by means of a region of a first end. A high voltage is applied to a second free end of the piezoelectric transformer. The plasma is produced at atmospheric pressure.

Disclosed herein are flexible plasma applicators based on fibrous layers that are capable of rapidly sanitizing a surface via either direct or indirect contact with said surface.

A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.

Apparatus for plasma processing of a continuous fiber, comprising a first and a second plasma torch. Each plasma torch comprises oppositely arranged electrodes to define a plasma discharge chamber between the electrodes. The plasma discharge chamber comprises an inlet and an outlet for passing a plasma forming gas between the electrodes. The apparatus further comprises an afterglow chamber in fluid communication with the outlets of the plasma discharge chambers, which comprises a substrate inlet and a substrate outlet arranged at opposite sides of the outlets of the plasma discharge chambers. A transport system is configured to continuously transport the fiber from the substrate inlet to the substrate outlet through the afterglow chamber. The substrate inlet comprises an aperture having a cross-sectional size substantially smaller than a cross-sectional size of the afterglow chamber. The outlets of the plasma torches face each other and exhaust plasma activated species into the afterglow chamber.

A nozzle assembly for generating an atmospheric plasma jet includes an inlet, through which the jet can be introduced into the nozzle assembly, and a channel connected to the inlet so that the plasma jet introduced is conducted through the channel. Multiple nozzle openings are provided in the channel wall along the channel, through which a plasma jet can exit the assembly. The cross section of the channel in the region of a nozzle opening is shaped in such a way that a virtual medial plane runs between a virtual first tangent plane of the cross section through the nozzle opening and a virtual second tangent plane of the cross section opposite thereto and parallel to the first tangent plane divides the cross section into a first cross-sectional area at the nozzle opening. The cross-sectional surface of the first cross-sectional area differs from the cross-sectional surface of the second.

Provided is a film forming device that deposits, on a substrate, a product generated by decomposing raw material gas by a plasma discharged from a discharge port of a double tube, the device including: an inner tube through which raw material gas containing a film-forming raw material flows and is guided to the discharge port on a downstream side; an outer tube that has the inner tube inserted thereinto and through which plasma-generating gas flows and a plasma generated by discharge is guided to the discharge port on the downstream side; a first electrode that is formed in an annular shape around the outer tube and grounded; and a second electrode that is formed in an annular shape around the outer tube and to which a voltage is applied. The second electrode is disposed on the downstream side with respect to the first electrode, and assuming that a length of the second electrode in an axial direction is L1 and a diameter of the outer tube is D1, a relationship of L1≥D1 is satisfied.

Disclosed are dielectric barrier discharge (DBD) devices and methods of use for sterilizing surfaces. The DBD devices generally include one or more first electrodes, one or more second electrodes or chemical reagent layers, and at least one dielectric layer between the one or more first electrodes and the one or more second electrodes or chemical reagent layers. In various configurations, the at least one dielectric layer is either (a) in contact with at least one of the first electrodes or (if present) at least one chemical reagent layer, or (b) is separated from the one or more first electrodes by a first gap and is also separated from the one or more second electrodes or chemical reagent layers by a second gap.

Systems and methods for generating plasma to stimulate plant growth comprise a high voltage generation circuit comprising a mains power input, a high power mosfet and insulated-gate bipolar transistor, and a trigger circuit; and a plasma emitter plant applicator comprising an applicator body, a plasma applicator shield, and two plasma activator electrodes configured to generate an electric field therebetween.

There is provision of a plasma spraying device including a supplying section configured to convey feedstock powder with a plasma generating gas, and to inject the feedstock powder and the plasma generating gas from an opening of a tip; a plasma generating section configured to generate a plasma by decomposing the injected plasma generating gas using electric power of 500 W to 10 kW; and a chamber causing the supplying section and the plasma generating section to be an enclosed region, which is configured to deposit the feedstock powder on a workpiece by melting the feedstock powder by the plasma generated in the enclosed region. The feedstock powder is any one of lithium (Li), aluminum (Al), copper (Cu), silver (Ag), and gold (Au). A particle diameter of the feedstock powder is between 1 μm and 50 μm.

An apparatus for treating a substrate includes a support unit that supports the substrate and a nozzle that dispenses liquid plasma to etch a film formed on the substrate supported on the support unit.