The present application provides a display screen, a display device and a method of manufacturing the display screen, and relates the field of display technology. The display screen includes an array substrate, an anode layer, a light-emitting layer and a cathode layer which are stacked in sequence; the light-emitting layer includes a plurality of light-emitting units and a pixel definition layer separating the light-emitting units from each other, and the pixel definition layer is a transparent layer; the cathode layer is provided with a hollow-out area corresponding to the pixel definition layer, the hollow-out area has a semitransparent portion and a light transmitting portion penetrating through the cathode layer. The present application can improve the transmittance of the cathode layer corresponding to the pixel definition layer by disposing the light transmitting portion, thereby improving an effect of the photosensitive element acquiring an image.

An opto-electronic device having a plurality of layers, comprising a nucleation-inhibiting coating (NIC) disposed on a first layer surface in a first portion of a lateral aspect thereof. In the first portion, the device comprises a first electrode, a second electrode and a semiconducting layer between them. The second electrode lies between the NIC and the semiconducting layer in the first portion. In the second portion, a conductive coating is disposed on a second layer surface. The first portion is substantially devoid of the conductive coating. The conductive coating is electrically coupled to the second electrode and to a third electrode in a sheltered region of a partition in the device.

Disclosed are a light-emitting diode (LED) device, a manufacturing method thereof, and a display panel. The LED device includes a base substrate, a first electrode layer, an electron transport layer, a quantum dot light-emitting layer and a second electrode layer. The first electrode layer is laminated on the base substrate; the electron transport layer is laminated on a surface of the first electrode layer away from the base substrate; the quantum dot light-emitting layer is laminated on a surface of the electron transport layer away from the first electrode layer; the second electrode layer is laminated on the surface of the quantum dot light-emitting layer away from the electron transport layer; wherein the surface of the electron transport layer away from the first electrode layer is a first concave-convex surface including a plurality of protrusions.

The disclosure relates to a display panel, a method for fabricating the same, and a display device. The display panel includes: a base substrate including a first base substrate in a blind hole area and a second base substrate, the thickness of the first base substrate is smaller than the thickness of the second base substrate; an anode layer, a light-emitting layer, a cathode layer and an encapsulation layer arranged successively on the second base substrate, and the cathode layer and the encapsulation layer arranged successively on the first base substrate; wherein at least one installation hole is arranged in a display area of the display panel, the at least one installation hole is within the blind hole area and runs through the first base substrate and the respective layers on the first base substrate.

A method of forming an optical thin film, comprises providing an assembly comprising a layer of semiconductor material deposited on a substrate, the semiconductor material comprising a compound of at least one metal and a group VI element; depositing a masking layer onto the layer of semiconductor material, the masking layer being patterned to expose one or more regions of the layer of semiconductor material; applying to the assembly a plasma of the group VI element in order to cause indiffusion of the group VI element into the semiconductor material in the exposed regions while the masking layer blocks indiffusion in unexposed regions, the indiffusion causing a reduction in carrier density in the semiconductor material; and removing the masking layer; thereby forming, from the layer of semiconductor material, an optical thin film having a variation in carrier density and corresponding variation in optical properties matching the patterning of the masking layer in a plane parallel to the substrate.

A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.

A method of manufacturing a display apparatus includes: forming a first lower lift-off layer, a first upper lift-off layer, and a first photoresist layer on a substrate on which a first pixel electrode is formed; forming a first masking layer including a first photoresist pattern, a first upper lift-off pattern, and a first lower lift-off pattern, which expose the first pixel electrode, by partially removing the first photoresist layer, the first upper lift-off layer, and the first lower lift-off layer; forming a first light emitting layer and a first counter electrode on the first pixel electrode by using the first masking layer; forming a first passivation layer on the first counter electrode; and removing the first masking layer.

A method of manufacturing a display device includes preparing a substrate, wherein the substrate includes a pixel area and a transmission area, forming insulating layers in the pixel area and in the transmission area, forming a pixel electrode on the insulating layers in the pixel area and forming a pixel-defining layer on the pixel electrode, wherein the pixel-defining layer exposes at least part of the pixel electrode, forming a metal layer on the pixel-defining layer in the pixel area, the at least part of the pixel electrode exposed by the pixel-defining layer in the pixel area, and the insulating layers in the transmission area, removing the metal layer on the insulating layers in the transmission area, and removing the insulating layers in the transmission area.

A method of manufacturing a display panel includes forming a circuit layer including a gate, a source, and a drain on a base substrate and forming a light emitting element layer on the circuit layer. The forming of the circuit layer includes sequentially forming a preliminary metal layer, a preliminary oxide layer comprising molybdenum and tantalum, and a preliminary capping layer which comprise a preliminary electrode layer, cleaning the preliminary electrode layer, forming a photoresist layer pattern on the preliminary electrode layer, etching the preliminary electrode layer, and removing the photoresist layer pattern. During the etching of the preliminary electrode layer, a ratio between a removal speed ER.sub.1 of the preliminary oxide layer and a removal speed ER.sub.2 of the preliminary metal layer satisfies Equation 1 to maintain a low reflection property
1≤ER.sub.2/ER.sub.1≤3.  [Equation 1]

A display panel and a method of fabricating the same are provided. The display panel may include first and second regions connected to each other. When viewed in a plan view, the first and second regions may have a curved edge and a rectilinear edge, respectively. When viewed in a sectional view, a side surface of the first region may include a center region having a rectilinear shape and a side surface of the second region may include a center region having a curved shape. In some embodiments, the side surface of the first region has a first roughness, and a side surface of the second region has a second roughness that is smoother than the first roughness.