Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, precursors, in a gaseous form, may be utilized in a chamber to build a film of correlated electron materials comprising various impedance characteristics.

Fabricating a steep-switch transistor includes receiving a semiconductor structure including a substrate, a fin disposed on the substrate, a source/drain disposed on the substrate adjacent to the fin, a gate disposed upon the fin, a cap disposed on the gate, a trench contact formed on and in contact with the source/drain, and a source/drain contact formed on an in contact with the trench contact. A recess is formed in a portion of the source/drain contact using a recess patterning process. A bi-stable resistive system (BRS) material is deposited in the recess in contact with the portion of the source/drain contact. A metallization layer is formed in contact upon the BRS material, a portion of the source/drain contact, the BRS material, and a portion of the metallization layer contact forming a reversible switch.

Subject matter disclosed herein may relate to programmable fabrics including correlated electron switch devices.

Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, a correlated electron material may be doped using dopant species derived from one or more precursors utilized to fabricate nearby structures such as, for example, a conductive substrate or a conductive overlay.

Subject matter disclosed herein may relate to correlated electron switches that are capable of asymmetric set or reset operations.

Disclosed is a method for the manufacture of a CEM device comprising forming a thin film of a correlated electron material having a predetermined electrical impedance when the CEM device in its relatively conductive (low impedance) state, wherein the forming of the CEM thin film comprises forming a d- or f-block metal or metal compound doped by a physical or chemical vapor deposition with a predetermined amount of a dopant comprising a back-donating ligand for the metal.

A non-Boolean analog system includes a first Mott memristor having a first value of a characteristic, and a second Mott memristor having a second value of the characteristic different than the first value. The system includes a resistance in series with the first and second Mott memristors to form a network having a capacitance and that is operable as a relaxation oscillator. Responsive to electrical excitation, a temperature of the network operating an environment including ambient thermal noise settles at an equilibrium corresponding to a global minimum that is a maximally optimal global solution to a global optimization problem to which the network corresponds.

Provided is a field effect transistor (FET) including a gate insulating film with a laminated (two-layer) structure having more improved characteristics for practical use. The FET includes a perovskite-type structure single-crystalline composite oxide substrate 1 that forms a channel layer; and a gate insulating film with a laminated structure in which para-xylylene polymer films 4 and 5 and hafnium oxide 6 are laminated in this order on the single-crystalline composite oxide substrate 1.

Disclosed is a method for the manufacture of a CEM device comprising forming a thin film of a correlated electron material having a predetermined electrical impedance when the CEM device in its relatively conductive (low impedance) state, wherein the forming of the CEM thin film comprises forming a d- or f-block metal or metal compound doped by a physical or chemical vapour deposition with a predetermined amount of a dopant comprising a back-donating ligand for the metal.

Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, precursors, in a gaseous form, may be utilized in a chamber to build a film of correlated electron materials comprising various impedance characteristics.