A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.

A discharge electrode E in an electrode chamber C is formed of a pair of electrode members 8 and 9 having lengths equal to or greater than a width of a film F. Also, the pair of electrode members 8 and 9 are disposed facing each other so as to sandwich a support member 4 there-between, which has nearly the same length as to electrode members; a gap is formed in a section in which the pair of electrode members 8 and 9 face each other; and this gap is open at a tip of the discharge electrode so as to serve as a gas pathway 15. Meanwhile, in the aforementioned support member 4, a plurality of gas guiding holes 5 are formed in a longitudinal direction thereof, and the gas guiding holes are in communication with a gas supplying system.

Provided is a composition for atopy or psoriasis treatment including a liquid type plasma. More particularly, provided is a method for producing a liquid type plasma for preventing or treating atopic dermatitis or psoriasis, a pharmaceutical composition for preventing or treating atopic dermatitis or psoriasis using a liquid type plasma produced according to the method, and a method for preventing or treating atopic dermatitis or psoriasis using the liquid type plasma.

A method and apparatus for plasma processing of substrates is provided. A processing chamber has a substrate support and a lid assembly facing the substrate support. The lid assembly has a plasma source that comprises a coil disposed within a conductive plate, which may comprise nested conductive rings. The coil is substantially coplanar with the conductive plate, and insulated therefrom by an insulator that fits within a channel formed in the conductive plate, or nests within the conductive rings. A field concentrator is provided around the coil, and insulated therefrom by isolators. The plasma source is supported from a conductive support plate. A gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.

A method and apparatus for plasma processing of substrates is provided. A processing chamber has a substrate support and a lid assembly facing the substrate support. The lid assembly has a plasma source that comprises a coil disposed within a conductive plate, which may comprise nested conductive rings. The coil is substantially coplanar with the conductive plate, and insulated therefrom by an insulator that fits within a channel formed in the conductive plate, or nests within the conductive rings. A field concentrator is provided around the coil, and insulated therefrom by isolators. The plasma source is supported from a conductive support plate. A gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.

An optical fiber coating stripper includes a pair of electrodes, each of which having a discharge head portion and an electrode portion, and a gliding plasma (GP) head housing the electrodes therein. The GP head includes internal airflow channels. The pair of electrodes are disposed at a front end of the GP head and form an air gap therebetween. Each of the discharge head portion includes a curved portion with a rib-shaped protrusion extending in a longitudinal direction of the discharge head portion. In operation, the electrodes are connected to non-alternating electrically positive and negative polarities. When a gas flows through the internal airflow channels in a direction a back end of the GP head toward the front end, a tongue-shaped GP flow is formed in the air gap between the rib-shaped protrusions of the discharge head portions.

The device for treating an object with plasma comprises a jacket apparatus (10) which forms, or can form, a substantially gas-tight holding chamber (15) in which an object (1) to be treated can be accommodated. The device comprises a first electrode (20) and a second electrode (21), wherein the two electrodes (20, 21) are arranged with reference to the jacket apparatus (10) such that a plasma (2) can be generated in the holding chamber (15) of the jacket apparatus (10). A wall (13) of the jacket apparatus (10) forming the holding chamber (15) of the jacket apparatus (10) has a modulus of elasticity of Ew<10 kN/mm.sup.2, at least in sections. The device comprises a housing (30), by means of which a housing interior (33) is or can be formed, wherein the jacket apparatus (10) is arranged within the interior of the housing (33).

Apparatuses and methods are provided that, in some embodiments use an adjustable middle coil to tune plasma density in a plasma processing system. For example, in one embodiment, a plasma processing apparatus includes an impedance match circuit coupled to an Rf power source. The impedance match circuit measures voltage and current at an inner and an outer coil. The match circuit calculates plasma density from the measured voltage and/or current. An adjustable middle coil located between the inner and outer coils is adjusted and/or replaced to tune the plasma density radial profile.

A method for producing metal alloys. The method allows the production of metal alloys consisting of at least two metals having a high melting point difference. Here, the higher melting metal is melted first and the lower melting metal is melted with a delay by means of heat transfer whereupon the metals mix together. This enables to obtain metal alloys with high purity and low evaporation losses, which in particular allow the use of contaminated starting components such as recycled metal.

Apparatuses and methods are provided that, in some embodiments use an adjustable middle coil to tune plasma density in a plasma processing system. For example, in one embodiment, a plasma processing apparatus includes an impedance match circuit coupled to an Rf power source. The impedance match circuit measures voltage and current at an inner and an outer coil. The match circuit calculates plasma density from the measured voltage and/or current. An adjustable middle coil located between the inner and outer coils is adjusted and/or replaced to tune the plasma density radial profile.