H01S3/0092

SOLID-STATE LASER APPARATUS, FIBER AMPLIFIER SYSTEM, AND SOLID-STATE LASER SYSTEM

A solid-state laser apparatus may include a first oscillator, a laser light generator, and a plurality of stages of fiber amplifiers. The first oscillator may be configured to output seed light. The laser light generator may be configured to output a pulsed laser light beam generated on a basis of the seed light. The plurality of stages of fiber amplifiers may be disposed in series in an optical path of the pulsed laser light beam, and may include a final stage fiber amplifier. The final stage fiber amplifier may be located in a final stage in the plurality of stages of fiber amplifiers, and may include a silica fiber doped with erbium and ytterbium. A value as a result of division of a cross-sectional area of the silica fiber by a fiber length of the silica fiber may be in a range from 0.7 nm to 1.64 nm both inclusive.

SOLID-STATE LASER SYSTEM AND LASER APPARATUS USED FOR EXPOSURE APPARATUS
20170338619 · 2017-11-23 · ·

A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.

Multi-wavelength, ultrashort pulse generation and delivery, with applications in microscopy
09825419 · 2017-11-21 · ·

In one aspect, the present disclosure describes a fiber laser system for the generation and delivery of femtosecond (fs) pulses in multiple wavelength ranges. For improved versatility in multi-photon microscopy, an example of a dual wavelength fiber system based on Nd fiber source providing gain at 920 and 1060 nm is described. An example of a three-wavelength system is included providing outputs at 780 nm, 940 nm, and 1050 nm. The systems include dispersion compensation so that high quality fs pulses are provided for applications in microscopy, for example in multiphoton microscope (MPM) systems.

LASER SYSTEM FOR NONLINEAR PULSE COMPRESSION AND GRATING COMPRESSOR

A laser system for nonlinear pulse compression includes a laser source configured to generate laser pulses with a pulse energy of at least 50 mJ, a spectral broadening device for spectrally broadening the high-energy laser pulses using self-phase modulation, and a compression device including a grating compressor having at least two diffraction gratings and configured to compress the spectrally broadened high-energy laser pulses. The laser system is configured to generate a pulse duration of the high-energy laser pulses of less than 100 fs.

Discriminative remote sensing and surface profiling based on superradiant photonic backscattering

Disclosed is a system and method for remote sensing, surface profiling, object identification, and aiming based on two-photon population inversion and subsequent photon backscattering enhanced by superradiance using two co-propagating pump waves. The present disclosure enables efficient and highly-directional photon backscattering by generating the pump waves in properly pulsed time-frequency modes, proper spatial modes, with proper group-velocity difference in air. The pump waves are relatively delayed in a tunable pulse delay device and launched to free space along a desirable direction using a laser-pointing device. When the pump waves overlap in air, signal photons will be created through two-photon driven superradiant backscattering if target gas molecules are present. The backscattered signal photons propagate back, picked using optical filters, and detected. By scanning the relative delay and the launching direction while the signal photons are detected, three-dimensional information of target objects is acquired remotely.

Optical parametric oscillator for lidar system

In one embodiment, a lidar system includes a pump laser configured to produce pulses of light at a pump wavelength. The lidar system further includes an optical parametric oscillator (OPO) with an OPO medium configured to: receive the pump pulses from the pump laser; convert at least part of the received pump pulses into pulses of light at a signal wavelength and pulses of light at an idler wavelength; and emit at least a portion of the signal pulses. The lidar system also includes a scanner configured to scan the emitted pulses of light across a field of regard and a receiver configured to detect at least a portion of the scanned pulses of light scattered by a target located a distance from the lidar system. The lidar system also includes a processor configured to determine the distance from the lidar system to the target.

Q-switched laser for LIDAR system

In one embodiment, a lidar system includes a Q-switched laser configured to emit pulses of light, where the Q-switched laser includes a gain medium and a Q-switch. The lidar system further includes a scanner configured to scan the emitted pulses of light across a field of regard and a receiver configured to detect at least a portion of the scanned pulses of light scattered by a target located a distance from the lidar system. The lidar system also includes a processor configured to determine the distance from the lidar system to the target based at least in part on a round-trip time of flight for an emitted pulse of light to travel from the lidar system to the target and back to the lidar system.

HHG Source, Inspection Apparatus and Method for Performing a Measurement

Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

System and method for reducing the bandwidth of a laser and an inspection system and method using a laser

A DUV laser includes an optical bandwidth filtering device, such as etalon, which is disposed outside of the laser oscillator cavity of the fundamental laser, and which directs one range of wavelengths into one portion of a frequency conversion chain and another range of wavelengths into another portion of the frequency conversion train, thereby reducing the bandwidth of the DUV laser output while maintaining high conversion efficiency in the frequency conversion chain.

HIGHLY EFFICIENT, SINGLE-PASS, HARMONIC GENERATOR WITH ROUND OUTPUT BEAM

An extra cavity harmonic generator system may produce a round, non-astigmatic third harmonic output beam from a nominally round, non-astigmatic, diffraction limited input fundamental beam. The system may include a second harmonic generation crystal. An input fundamental beam size is expanded in a non-walkoff direction for the SHG crystal at the SHG crystal input face. A higher harmonic generation crystal has an output face oriented at an oblique angle of incidence in a non-walkoff direction for the HHG crystal such that an output higher harmonic beam size is contracted in this direction. Expansion of the input fundamental beam at the SHG crystal input face exceeds reduction of third harmonic beam at the HHG crystal output face.