A substrate treating apparatus includes a chamber having a space therein in which a substrate is treated, a support unit that supports the substrate in the chamber, a gas supply unit that supplies gas into the chamber, and a plasma generation unit that excites the gas in the chamber into a plasma state. The plasma generation unit includes a high-frequency power supply, a first antenna connected to one end of the high-frequency power supply, a second antenna connected with the first antenna in parallel, and a current divider that distributes electric current to the first antenna and the second antenna. The current divider includes a first capacitor disposed between the first antenna and the second antenna, a second capacitor connected with the second antenna in parallel, and a third capacitor connected with the second antenna in series. The second capacitor and the third capacitor are implemented with a variable capacitor.

A microscale gas breakdown device includes a first surface and a second surface. The first surface and the second surface define a gap distance. The device includes a perturbation on the first surface or the second surface. The perturbation is defined by a height value and a radius value. The device includes a current source or a voltage source configured to apply a current or a voltage across the first surface and the second surface. In response to the current or the voltage being applied, a resulting discharge travels along a first discharge path in response to being exposed to a high pressure and a second discharge path in response to being exposed to a low pressure.

A dielectric barrier discharge ionization detector (BID) capable of achieving a high level of signal-to-noise ratio in a stable manner is provided. In a BID having a high-voltage electrode, upstream-side ground electrode and downstream-side ground electrode circumferentially formed on the outer circumferential surface of a cylindrical dielectric tube, a heater for heating the cylindrical dielectric tube or tube-line tip member attached to the upper end of the same tube is provided. Increasing the temperature of the cylindrical dielectric tube by this heater improves the stability of the electric discharge, whereby the amount of noise is reduced and a high level of signal-to-noise is achieved.

The current disclosure relates to a suppressor circuit configuration for extending the stable region of operation of a DC driven micro plasma discharge at atmospheric and higher pressures. The current disclosure also provides various systems for suppressing a self-pulsing regime of a direct current driven micro plasma discharge comprising, at least, a power supply, a ballast resistor, a plasma discharge, and an inductor.

Embodiments disclosed herein include diagnostic substrates and methods of using the diagnostic substrates to extract plasma parameters. In an embodiment, a diagnostic substrate comprises a substrate and an array of resonators across the substrate. In an embodiment, the array of resonators comprises at least a first resonator with a first structure and a second resonator with a second structure. In an embodiment, the first structure is different than the second structure.

Systems, devices, methods, and computer readable media for generating plasma for treating objects may be provided. Embodiments include a housing; a plasma generation zone within the housing configured to enable accommodation of an object; a plasma generator for enabling formation of plasma within the plasma generation zone; a plurality of vacuum pumps within the housing, each pump having a vacuum inlet; a plurality of conduits within the housing connecting the plurality of vacuum pumps in series, such that when activated, the series of pumps cause a vacuum within the plasma generation zone; and at least one processor configured to simultaneously operate the plurality of vacuum pumps while the object is in a region of the plasma generation zone.

A plasma chemical reactor including an anode having a generally cylindrical shape and an axis of rotational symmetry; a cathode inside the anode and co-axial with the anode; a hot plasma channel between the between the anode and the cathode; a gas input module providing gas flow into the anode; a gas output module at a distal end of the anode; and a high voltage power supply providing with a current in a range of 0.1-1.0 A. The high voltage power supply provides a voltage to the cathode in a range of 0-5 kV, a power of at least 1 kW, and a voltage/current ratio of at least 1000 V/A.

Disclosed herein is a multi-channel device for detecting plasma at an ultra-fast speed, including: a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the leakage current; a first current detection module detecting the first leakage current; a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information; and a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information.

The dielectric barrier discharge ionization detector includes: a dielectric tube through which a plasma generation gas is passed; a high-voltage electrode formed on the outer wall of the dielectric tube; two ground electrodes and formed on the outer wall of the dielectric tube, with the high-voltage electrode in between; a voltage supplier for applying AC voltage between the high-voltage electrode and each ground electrode to generate electric discharge within the dielectric tube and thereby generate plasma from the plasma generation gas; and a charge-collecting section for detecting an ion current formed by ionized sample-component gas produced by the plasma. The distance between one ground electrode and the high-voltage electrode is longer than a discharge initiation distance between these two electrodes, while the distance between the other ground electrode and the high-voltage electrode is shorter than the discharge initiation distance between these two electrodes.

A method for non-invasively measuring the impedance of a plasma discharge. Parallel anode and cathode electrodes are connected to a DC voltage source that ignites and sustains a plasma between the anode and cathode. A network analyzer applies a frequency-swept AC signal superimposed onto the DC voltage applied to the electrodes. The voltage of the AC signal reflected by the plasma is measured by the network analyzer through one of the electrodes used to sustain the plasma and is used to find the complex impedance of the plasma as a function of the applied AC frequency. Since the electrode serves dual purposes, the insertion of an additional physical probe that could introduce perturbations or contaminate the discharge is not necessary.