A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

System and method for decapsulation of plastic integrated circuit packages by providing a microwave generator, providing a Beenakker resonant cavity connected to the microwave generator, which cavity comprises a coupling antenna loop, providing the cavity with a tube or tubes for supply of plasma gas and etchant gas or gases and with means for igniting the plasma gas, and providing that the cavity is set at a predefined value of its Q factor by embodying the coupling antenna loop and/or a wire optionally attached to the coupling antenna loop in a metal or metal alloy, or providing that at least at part of its surface area the coupling antenna loop and/or the wire is coated with a metal or metal alloy different than copper and with a higher resistivity than copper.

System and method for decapsulation of plastic integrated circuit packages by providing a microwave generator, providing a Beenakker resonant cavity connected to the microwave generator, which cavity comprises a coupling antenna loop, providing the cavity with a tube or tubes for supply of plasma gas and etchant gas or gases and with means for igniting the plasma gas, and providing that the cavity is set at a predefined value of its Q factor by embodying the coupling antenna loop and/or a wire optionally attached to the coupling antenna loop in a metal or metal alloy, or providing that at least at part of its surface area the coupling antenna loop and/or the wire is coated with a metal or metal alloy different than copper and with a higher resistivity than copper.

A plasma generator comprises a radio frequency power source, a coaxial cavity resonator assembly, and a direct current power source. The radio frequency power source provides a voltage supply of radio frequency power having a first ratio of power over voltage. The resonator assembly includes a center conductor coupled to the radio frequency power source, and also includes a virtual short circuit. The direct current power source is connected to the center conductor at the virtual short circuit, and provides a voltage supply of direct current power having a second ratio of power over voltage that is less than the first ratio.

A plasma generator comprises a radio frequency power source, a coaxial cavity resonator assembly, and a direct current power source. The radio frequency power source provides a voltage supply of radio frequency power having a first ratio of power over voltage. The resonator assembly includes a center conductor coupled to the radio frequency power source, and also includes a virtual short circuit. The direct current power source is connected to the center conductor at the virtual short circuit, and provides a voltage supply of direct current power having a second ratio of power over voltage that is less than the first ratio.

A laser-sustained plasma (LSP) light source with vortex gas flow is disclosed. The LSP source includes a gas containment structure for containing a gas, one or more gas inlets configured to flow gas into the gas containment structure, and one or more gas outlets configured to flow gas out of the gas containment structure. The one or more gas inlets and the one or more gas outlets are arranged to generate a vortex gas flow within the gas containment structure. The LSP source also includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure within an inner gas flow within the vortex gas flow. The LSP source includes a light collector element configured to collect at least a portion of broadband light emitted from the plasma.

A laser-sustained plasma (LSP) light source with vortex gas flow is disclosed. The LSP source includes a gas containment structure for containing a gas, one or more gas inlets configured to flow gas into the gas containment structure, and one or more gas outlets configured to flow gas out of the gas containment structure. The one or more gas inlets and the one or more gas outlets are arranged to generate a vortex gas flow within the gas containment structure. The LSP source also includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure within an inner gas flow within the vortex gas flow. The LSP source includes a light collector element configured to collect at least a portion of broadband light emitted from the plasma.

Generators and methods for igniting a plasma in a plasma chamber are disclosed. The generator includes an ignition profile generator that includes a data interface configured to receive a voltage value and a time value for each of N data points and an ignition data generator configured to create an ignition profile from the N data points. The generator also includes an ignition profile datastore to store the ignition profile and a waveform generator configured to apply a waveform with the ignition profile to an output of the generator.

Generators and methods for igniting a plasma in a plasma chamber are disclosed. The generator includes an ignition profile generator that includes a data interface configured to receive a voltage value and a time value for each of N data points and an ignition data generator configured to create an ignition profile from the N data points. The generator also includes an ignition profile datastore to store the ignition profile and a waveform generator configured to apply a waveform with the ignition profile to an output of the generator.