The present invention discloses a three-dimensional vertical one-time-programmable memory (3D-OTP.sub.V). It comprises a plurality of vertical OTP strings formed side-by-side on a substrate circuit. Each OTP string comprises a plurality of vertically stacked OTP cells. Each OTP cell comprises an antifuse layer. The horizontal address lines and the vertical address lines comprise oppositely-doped semiconductor materials.

The present invention discloses an offset-printing method for a three-dimensional printed memory with multiple bits-per-cell. The mask-patterns for different bits-in-a-cell are merged onto a multi-region data-mask. At different printing steps, a wafer is offset by different values with respect to the data-mask. Accordingly, data-patterns from a same data-mask are printed into different bits-in-a-cell.

The present invention discloses an offset-printing method for a three-dimensional 3D-oP (three-dimensional offset-printed memory)-based package. The mask-patterns for different 3D-op dice are merged onto a same data-mask. At different printing steps, a wafer is offset by different values with respect to the data-mask. Accordingly, data-patterns from a same data-mask are printed into different 3D-oP dice.

According to one embodiment, a semiconductor device includes a substrate; a stacked body; a columnar portion; a plate portion; and a sidewall insulating film. The thermal expansion coefficient of the substrate is 1. The stacked body includes a plurality of electrode layers and a memory cell array. The columnar portion includes a semiconductor body and a charge storage film. The plate portion includes a first layer and a second layer. The thermal expansion coefficient of the first layer is the .sub.2 being different from the .sub.1. The thermal expansion coefficient of the second layer is the .sub.3 being different from the .sub.2. The value of the .sub.3 is in a direction from the value of the .sub.2 toward the value of the .sub.1. The second layer faces the major surface of the substrate continuously in the memory cell array.

The present invention discloses a three-dimensional vertical read-only memory (3D-OTP.sub.V) comprising no separate diode layer. It comprises a plurality of vertical address line, a plurality of memory holes through said vertical address line, a plurality of antifuse layers and vertical address lines in said memory holes. The memory holes comprise no separate diode layer. The horizontal and vertical address lines comprise different metallic materials.

The present invention discloses an offset-printing method for a three-dimensional printed memory. The mask-patterns for different memory levels are merged onto a multi-region data-mask. At different printing steps, a wafer is offset by different values with respect to the data-mask. Accordingly, data-patterns from a same data-mask are printed into different memory levels.

A semiconductor device includes a memory array comprising a plurality of transistors arranged over a plurality of rows and a plurality of columns. The plurality of rows correspond to a plurality of active regions that continuously extend along a first lateral direction, respectively, and the plurality of columns correspond to a plurality of gate structures that discontinuously extend along a second lateral direction, respectively, the first lateral direction and the second lateral direction being perpendicular to each other. A first one of the gate structures comprising a first gap cutting the first gate structure and a second one of the gate structures comprising a second gap cutting the second gate structure are disposed immediately next to each other along the first lateral direction. The first gap and an extension of the second gap are offset from each other along the second lateral direction.

A 3D semiconductor device including: a first layer including a first monocrystalline layer, the first layer including first logic cells; a second layer including a monocrystalline semiconductor layer, the second layer overlying the first layer, the second layer including second transistors, where the logic cells include a Look-Up-Table logic cell, and where the second transistors are aligned to the first logic cells with less than 200 nm alignment error.

Methods, systems, and devices for split pillar architectures for memory devices are described. A memory device may include a substrate arranged with conductive contacts in a pattern and openings through alternative layers of conductive and insulative material that may decrease the spacing between the openings while maintaining a dielectric thickness to sustain the voltage to be applied to the array. After etching material, an insulative material may be deposited in a trench. Portions of the insulative material may be removed to form openings, into which cell material is deposited. Conductive pillars may extend perpendicular to the planes of the conductive material and the substrate, and couple to conductive contacts. The conductive pillars may be divided to form first and second pillars.

A memory device is provided which includes a first memory cell including a first transistor and a second transistor coupled to the first transistor in parallel. Gates of the first transistor and the second transistor are coupled to each other, and the gates of the first transistor and the second transistor pass different layers and overlap with each other. Types of the first transistor and the second transistor are the same.