A discharge chamber for a deep ultraviolet (DUV) light source includes a housing; and a first electrode and a second electrode in the housing, the first electrode and the second electrode being separated from each other to form a discharge region between the first electrode and the second electrode, the discharge region being configured to receive a gain medium including at least one noble gas and a halogen gas. At least one of the first electrode and the second electrode includes a metal alloy including more than 33% and less than 50% zinc by weight.

The present invention relates to an electrode heating device that dries an electrode. The electrode heating device comprises a heating body having a drying space through which the electrode passes, and a heating member that directly heats and dries a surface of the electrode that passes through the drying space to remove moisture from the electrode.

The present invention relates to an electrode heating device that dries an electrode. The electrode heating device comprises a heating body having a drying space through which the electrode passes, and a heating member that directly heats and dries a surface of the electrode that passes through the drying space to remove moisture from the electrode.

An excimer lamp includes a discharge vessel in which a rare gas and a halogen are enclosed. The excimer lamp also includes at least one first electrode and at least one second electrode for generating a dielectric barrier discharge inside the discharge vessel. The discharge vessel has a discharge forming region and a non-discharge region such that discharging takes place in the discharge forming region and no discharging takes place in the non-discharge region. The discharge forming region is formed between the first electrode(s) and the second electrode(s). The non-discharge region communicates with the discharge forming region. The excimer lamp satisfies a following equation:
(Vb×Ph)/Sd≥4.50
where Vb [mm.sup.3] represents a space volume inside the discharge vessel, Sd [mm.sup.2] represents an inner surface area of the discharge vessel in the discharge forming region, and Ph [Torr] represents a halogen-atoms partial pressure enclosed in the discharge vessel.

An excimer lamp includes a discharge vessel in which a rare gas and a halogen are enclosed. The excimer lamp also includes at least one first electrode and at least one second electrode for generating a dielectric barrier discharge inside the discharge vessel. The discharge vessel has a discharge forming region and a non-discharge region such that discharging takes place in the discharge forming region and no discharging takes place in the non-discharge region. The discharge forming region is formed between the first electrode(s) and the second electrode(s). The non-discharge region communicates with the discharge forming region. The excimer lamp satisfies a following equation:
(Vb×Ph)/Sd≥4.50
where Vb [mm.sup.3] represents a space volume inside the discharge vessel, Sd [mm.sup.2] represents an inner surface area of the discharge vessel in the discharge forming region, and Ph [Torr] represents a halogen-atoms partial pressure enclosed in the discharge vessel.

Modules, systems and methods that disinfect surfaces using ultraviolet (UV) light are disclosed. In one aspect, a UV light-emitting module comprises an enclosure comprising a rear wall and a face plate spaced from the rear wall and comprising a light-transmitting aperture. At least one sidewall extends between the rear wall and the face plate, and at least one UV light emitter is within the enclosure. A ventilation opening is located in one or more walls selected from (1) the rear wall and (2) the at least one sidewall.

Modules, systems and methods that disinfect surfaces using ultraviolet (UV) light are disclosed. In one aspect, a UV light-emitting module comprises an enclosure comprising a rear wall and a face plate spaced from the rear wall and comprising a light-transmitting aperture. At least one sidewall extends between the rear wall and the face plate, and at least one UV light emitter is within the enclosure. A ventilation opening is located in one or more walls selected from (1) the rear wall and (2) the at least one sidewall.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

An excimer lamp includes a dielectric tube, an end cap, a conductive hollow tube, and an electrode grid. The dielectric tube has a closed end and an open end, and defines a cavity. The end cap sealingly covers the open end. The conductive hollow tube passes through the end cap and into the cavity of the dielectric tube, with a volume defined between an exterior surface of the conductive hollow tube and an interior surface of the dielectric tube. The volume is configured to hold a gas. The electrode grid is disposed on an exterior surface of the dielectric tube.