An excimer lamp, which includes a first lamp cap, a second lamp cap, a first electrode head, a second electrode head, a conductive heat dissipation rod, a light-transparent annular sleeve, and a conductive annular net. The heat dissipation rod and conductive annular net are respectively connected to the first and second electrode heads to excite an excimer gas in the light-transparent annular sleeve. Inside the excimer lamp the, a large amount of heat can be conducted and dissipated through the conductive heat dissipation rod, and then through the heat dissipation of the first lamp cap or by heat conductive annular rings between sections of the lamp. At the same time, the conductive annular nets can also conduct and dispatch a large amount of above mentioned heat; the heat may be further conducted and dispatched through the second lamp cap or through the heat conductive annular rings, if present.

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

In the excimer lamp according to the present invention, a flat discharge vessel having a substantially rectangular cross-sectional shape and comprising a pair of planar parts and a pair of side-surface parts has a pair of external electrodes disposed on the respective outer surfaces of the planar parts. The end parts of the external electrodes are provided with an auxiliary electrode extending to a region that is made smaller than the distance between the planar parts. A lead that supplies electricity to the external electrode is connected to the auxiliary electrode in the region that is made smaller than the distance between the planar parts.

A UV emitting device having at least one first phosphor that absorbs UV radiation of a wavelength shorter than 200 nm and at least one second phosphor which absorbs UV radiation of a wavelength between 220 nm and 245 nm. The at least one first phosphor emits UV radiation of a wavelength between 220 nm and 245 nm and the at least one second phosphor emits UV radiation of a wavelength between 250 nm and 315 nm. The at least one first phosphor and the at least one second phosphor are disposed in the form of layers, wherein the at least one first phosphor layer is positioned between a discharge volume and the at least one second phosphor layer.

A UV emitting device having at least one first phosphor that absorbs UV radiation of a wavelength shorter than 200 nm and at least one second phosphor which absorbs UV radiation of a wavelength between 220 nm and 245 nm. The at least one first phosphor emits UV radiation of a wavelength between 220 nm and 245 nm and the at least one second phosphor emits UV radiation of a wavelength between 250 nm and 315 nm. The at least one first phosphor and the at least one second phosphor are disposed in the form of layers, wherein the at least one first phosphor layer is positioned between a discharge volume and the at least one second phosphor layer.

The present invention provides a UV sterilization module capable of suppressing a generation of ozone inside and outside a device, and emitting UV rays having a wavelength of near 200 to 230 nm, in particular UV rays having a wavelength of 222 nm at a high luminous intensity, and a UV sterilization apparatus using the UV sterilization module. According to the UV sterilization apparatus of the present invention, bacteria or viruses existing on a surface of the biological tissue may be selectively UV sterilized without harming animal cells such as human cells, and a generation of ozone harmful to the skin may be reduced.

The present invention provides a UV sterilization module capable of suppressing a generation of ozone inside and outside a device, and emitting UV rays having a wavelength of near 200 to 230 nm, in particular UV rays having a wavelength of 222 nm at a high luminous intensity, and a UV sterilization apparatus using the UV sterilization module. According to the UV sterilization apparatus of the present invention, bacteria or viruses existing on a surface of the biological tissue may be selectively UV sterilized without harming animal cells such as human cells, and a generation of ozone harmful to the skin may be reduced.

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

The present disclosure relates to an implant surface modification treatment device including an internal electrode having a barrel-shaped structure and a surface on which a plurality of transmission parts are formed, an ultraviolet (UV) discharge vessel having a barrel-shaped structure that accommodates the internal electrode and has a gas-filled area filled with a discharge gas that serves as a UV light source, and an external electrode accommodating the UV discharge vessel inside thereof, wherein an implant fixture is placed inside the internal electrode to perform surface modification.

A method of calibrating a spectrophotometer comprising a flash lamp. The method comprises receiving light from the flash lamp at a monochromator of the spectrometer, wherein the flash lamp is a short arc noble gas flash lamp with transverse or axially aligned electrodes; configuring the monochromator to progressively transmit the received light at each of a plurality wavelengths of a selected range of wavelengths, wherein the range of wavelengths is associated with a wavelength feature according to a known spectral profile of the flash lamp, and wherein the wavelength feature is a self-absorption feature; and determining a spectrum of the flash lamp, wherein the spectrum comprises a corresponding power or intensity value for each of the plurality of wavelengths. The method further comprises determining a wavelength calibration error value for the wavelength feature by comparing the spectrum with a segment of a predetermined reference spectrum associated with the flash lamp, wherein the segment of the predetermined reference spectrum includes one or more wavelengths associated with the self-absorption feature; and calibrating the spectrophotometer based on the wavelength calibration error value.