Apparatuses, systems, and methods for generating a beam for inspecting a wafer positioned on a stage in a charged particle beam system are disclosed. In some embodiments, a controller may include circuitry configured to classify a plurality of regions along a stripe of the wafer by type of region, the stripe being larger than a field of view of the beam, wherein the classification of the plurality of regions includes a first type of region and a second type of region; and scan the wafer by controlling a speed of the stage based on the type of region, wherein the first type of region is scanned at a first speed and the second type of region is scanned at a second speed.

Provided is a substrate holding device comprising: a holder that holds a substrate irradiated with an ion beam; and a driving device that rotates the holder around a predetermined axis to change an inclination of the held substrate with respect to the ion beam, wherein the driving device comprises: a power source that outputs power to rotate the holder; a reduction gear provided in the middle of a power transmission path from the power source to the holder; a first shaft member that rotates together with the holder by a power outputted from the reduction gear; a first detector that detects a rotational motion of the first shaft member; and a power control device that controls the power source based on a detection value of the first detector.

A system and method for etching workpieces in a uniform manner are disclosed. The system includes a semiconductor processing system that generates a ribbon ion beam, and a workpiece holder that scans the workpiece through the ribbon ion beam. The workpiece holder includes a plurality of independently controlled thermal zones so that the temperature of different regions of the workpiece may be separately controlled. In certain embodiments, etch rate uniformity may be a function of distance from the center of the workpiece, also referred to as radial non-uniformity. Further, when the workpiece is scanned, there may also be etch rate uniformity issues in the translated direction, referred to as linear non-uniformity. The present workpiece holder comprises a plurality of independently controlled thermal zones to compensate for both radial and linear etch rate non-uniformity.

A substrate processing system is installable in a small installation area. The substrate processing system includes one or more process modules and a vacuum transfer module. At least one of the one or more process modules and the vacuum transfer module at least partially overlap with each other as viewed from above.

An emitter and process for plasma fusing of materials. The emitter including a discharge device defining an emitter or an emitter array configured to create a directed plasma to transfer energy to a target object; and a plasma generating electrical system including a power source and two poles, wherein one of said two poles is connected to the target object and the other of said two poles is connected to the discharge device.

A vacuum processing apparatus includes a linear motor. The linear motor includes a mover having a permanent magnet, a stator having a coil covered by a resin member, and a wire for supplying a current to the coil provided in a vacuum sample chamber. The wire is led out to an outside of the vacuum sample chamber through a through hole portion provided in the wall surface of the vacuum sample chamber. The through hole portion is filled with the resin member integrally or with a filler that binds to the resin member, so that the through hole portion is sealed.

A driving apparatus is disclosed which has a movable part, a measuring device measuring a position of the movable part, two actuators respectively generating two thrusts which have a common axis of action thereof with respect to the movable part, and a controller that controls the position by the two actuators based on output of the measuring device. The controller obtains information of at least one of a thrust constant of one of the two actuators, a thrust constant of the other of the actuators, and rigidity of a member which supports the movable part with respect to the axis of action, based on a relationship between disturbance force estimated from thrust commands for the two actuators and an output of the measuring device in a case where the one actuator generates a thrust and the other actuator controls the position, and a thrust command for the one actuator.

A double-tilt sample holder for TEM, comprising: it comprise the main body of sample holder body, front-end tilt stage, drive rod, linkage, tilt axis, rotation axis, fixed axis of drive rod and sample loading stage. The axis hole is arranged at the front-end tilt stage, which is connected to the main body of the sample holder body by the tilt axis. The linkage, the boss slot and the drive rod slot are connected by the rotation axis. Two through movement guide grooves are designed symmetrically at both sides of the front-end of sample holder body, and the drive rod is fixed by the fixed axis of the drive rod, which restricts the drive rod to move reciprocally in a straight line driven by the linear stepping motor at the back-end of the main body of the holder body, further leading the tilt stage to rotate around the tilt axis. The tilt angle of the sample loading stage can be precisely controlled by the high precision linear stepping motor in the apparatus. The maximum tilt angle of the sample stage can be adjusted by the included angle between the boss at the bottom surface of the front-end tilt stage and the horizontal direction and the length of the movement guide groove in the apparatus. The apparatus can be used coordinately with TEM and its universality is wide.

The present invention provides an electrode assembly comprising two or more electrodes arranged around a primary axis forming a non-cylindrical channel space. General electronic apparatus/device, particularly apparatus of charged-particle beam such as electron microscope, may use the electrode assembly to create an optimized pattern of electrical field within non-cylindrical channel space. When the electrode assembly is used as a beam deflector in a magnetic objective lens, the electrical field within the central channel space can be co-optimized with the magnetic field for reducing aberration(s) such as distortion, field curvature, astigmatism, and chromatic aberration, after the beam passes through the central channel space.

A specimen holder for a Charged Particle Microscope is disclosed. The holder has a support structure with an elongated member including a specimen mounting zone. The specimen mounting zone comprises a rotor with an axis perpendicular to the elongated member with a paddle connected to it which may be rotated. Specimens may be mounted on the paddle so that rotation of the paddle allows specimens to be rotated and/or inverted for microscopic observation on both sides. Specimens may either be directly mounted on the paddle, or on a grid, half-moon grid, lift-out grid, aperture frame, dielectric film, etc.