A method for transferring light emitting elements during manufacture of a display panel includes providing light emitting elements; providing a first electromagnetic plate defining adsorption positions; providing a receiving substrate defining receiving areas; energizing the first electromagnetic plate to magnetically adsorb one of the light emitting elements at each adsorption position; facing the first electromagnetic plate to the receiving substrate; and transferring the light emitting elements to one corresponding receiving area of the receiving substrate.

A memory device includes a peripheral circuit layer, a first memory layer provided on the peripheral circuit layer, an inter-metal layer provided on the first memory layer, and a second memory layer provided on the inter-metal layer. The peripheral circuit layer includes a first substrate and a peripheral circuit provided on the first substrate. The first memory layer includes a first memory structure electrically connected to the peripheral circuit through metal bonding pads. The inter-metal layer includes intermediate pads electrically connected to the peripheral circuit through metal bonding pads. The second memory layer includes a second memory structure electrically connected with the intermediate pads and a second substrate provided on the second memory structure. The peripheral circuit, the first memory structure, and the second structure are provided between the first substrate and the second substrate.

A memory device includes a peripheral circuit layer, a first memory layer provided on the peripheral circuit layer, an inter-metal layer provided on the first memory layer, and a second memory layer provided on the inter-metal layer. The peripheral circuit layer includes a first substrate and a peripheral circuit provided on the first substrate. The first memory layer includes a first memory structure electrically connected to the peripheral circuit through metal bonding pads. The inter-metal layer includes intermediate pads electrically connected to the peripheral circuit through metal bonding pads. The second memory layer includes a second memory structure electrically connected with the intermediate pads and a second substrate provided on the second memory structure. The peripheral circuit, the first memory structure, and the second structure are provided between the first substrate and the second substrate.

Disclosed are semiconductor packages and methods of fabricating the same. The semiconductor package comprises a first wiring layer, a first semiconductor substrate on the first wiring layer, a first dielectric layer on the first semiconductor substrate, a landing pad in the first wiring layer, a through hole that penetrates the first semiconductor substrate, the first dielectric layer, and the first wiring layer and exposes the landing pad, the through hole including a first hole and a second hole on a bottom end of the first hole, the second hole having a maximum diameter less than a minimum diameter of the first hole, and a mask layer on an upper lateral surface of the through hole.

Disclosed are semiconductor packages and methods of fabricating the same. The semiconductor package comprises a first wiring layer, a first semiconductor substrate on the first wiring layer, a first dielectric layer on the first semiconductor substrate, a landing pad in the first wiring layer, a through hole that penetrates the first semiconductor substrate, the first dielectric layer, and the first wiring layer and exposes the landing pad, the through hole including a first hole and a second hole on a bottom end of the first hole, the second hole having a maximum diameter less than a minimum diameter of the first hole, and a mask layer on an upper lateral surface of the through hole.

A device is disclosed. The device includes a gate conductor, a first source-drain region and a second source-drain region. The device includes a first air gap space between the first source-drain region and a first side of the gate conductor and a second air gap space between the second source-drain region and a second side of the gate conductor. A hard mask layer that includes holes is under the gate conductor, the first source-drain region, the second source-drain region and the air gap spaces. A planar dielectric layer is under the hard mask.

A device is disclosed. The device includes a gate conductor, a first source-drain region and a second source-drain region. The device includes a first air gap space between the first source-drain region and a first side of the gate conductor and a second air gap space between the second source-drain region and a second side of the gate conductor. A hard mask layer that includes holes is under the gate conductor, the first source-drain region, the second source-drain region and the air gap spaces. A planar dielectric layer is under the hard mask.

A chip package structure is provided. The chip package structure includes a first substrate. The chip package structure includes a conductive via structure passing through the first substrate. The chip package structure includes a chip over a first surface of the first substrate. The chip package structure includes a barrier layer over a second surface of the first substrate. The chip package structure includes an insulating layer over the barrier layer. The chip package structure includes a conductive pad over the insulating layer and passing through the insulating layer and the barrier layer to connect with the conductive via structure. The chip package structure includes a conductive bump over the conductive pad.

A via for semiconductor devices is disclosed. Implementations of vias for semiconductor devices may include: a semiconductor substrate that includes a first side; a via extending from the first side of the semiconductor substrate to a pad; a polymer layer coupled along an entire sidewall of the via, the polymer layer in direct contact with the pad; and a metal layer directly coupled over the polymer layer and directly coupled with the pad.

A via for semiconductor devices is disclosed. Implementations of vias for semiconductor devices may include: a semiconductor substrate that includes a first side; a via extending from the first side of the semiconductor substrate to a pad; a polymer layer coupled along an entire sidewall of the via, the polymer layer in direct contact with the pad; and a metal layer directly coupled over the polymer layer and directly coupled with the pad.