A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors; at least one metal layer interconnecting the first transistors and forming a plurality of logic gates; a first intermediate metal layer overlaying the at least one metal layer; a second intermediate metal layer overlaying the first intermediate metal layer; where the first intermediate metal layer has a first current carrying capacity, where the second intermediate metal layer has a second current carrying capacity, and where the first current carrying capacity is significantly greater than the second current carrying capacity; a plurality of second transistors overlaying the second intermediate metal layer; and a top metal layer overlaying the second transistors; and a memory cell, where at least one of the second transistors includes a polysilicon transistor channel, where the second transistors are precisely aligned to the first transistors.

A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors and at least one metal layer, where the at least one metal layer interconnecting the first transistors; a plurality of logic gates including the at least one metal layer interconnecting the first transistors; a plurality of second transistors overlaying the at least one metal layer; a plurality of third transistors overlaying the second transistors; a top metal layer overlaying the third transistors; and a memory array including wordlines, where the memory array includes at least four rows by four columns of memory mini arrays, where each of the mini arrays includes at least four rows by four columns of memory cells, and where each of the memory cells includes at least one of the second transistors or at least one of the third transistors.

A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors and at least one metal layer, where the at least one metal layer interconnecting the first transistors; a plurality of logic gates including the at least one metal layer interconnecting the first transistors; a plurality of second transistors overlaying the at least one metal layer; a plurality of third transistors overlaying the second transistors; a top metal layer overlaying the third transistors; and a memory array including wordlines, where the memory array includes at least four rows by four columns of memory mini arrays, where each of the mini arrays includes at least four rows by four columns of memory cells, and where each of the memory cells includes at least one of the second transistors or at least one of the third transistors.

A method of making a package is disclosed. The method may include forming bond pads on a first surface of a substrate, forming leads in the substrate by etching recesses in a second surface of the substrate, the second surface being opposite the first surface, and plating at least a portion of a top surface of the leads with a layer of finish plating. The method may also include thermosonically bonding the leads to a die by thermosonically bonding the finish plating to the die and encapsulating the die and the leads in an encapsulant.

A method of making a package is disclosed. The method may include forming bond pads on a first surface of a substrate, forming leads in the substrate by etching recesses in a second surface of the substrate, the second surface being opposite the first surface, and plating at least a portion of a top surface of the leads with a layer of finish plating. The method may also include thermosonically bonding the leads to a die by thermosonically bonding the finish plating to the die and encapsulating the die and the leads in an encapsulant.

A three-dimensional (3D) bonded semiconductor structure is provided in which a first bonding oxide layer of a first semiconductor structure is bonded to a second bonding oxide layer of a second semiconductor structure. Each of the first and second bonding oxide layers has a metallic capacitor plate structure embedded therein, wherein each metallic capacitor plate structure has a columnar grain microstructure. A high-k dielectric material is present between the first and second metallic capacitor plate structures. The presence of the columnar grain microstructure in the metallic capacitor plate structures can provide an embedded capacitor that has an improved quality factor, Q.

A three-dimensional (3D) bonded semiconductor structure is provided in which a first bonding oxide layer of a first semiconductor structure is bonded to a second bonding oxide layer of a second semiconductor structure. Each of the first and second bonding oxide layers has a metallic capacitor plate structure embedded therein, wherein each metallic capacitor plate structure has a columnar grain microstructure. A high-k dielectric material is present between the first and second metallic capacitor plate structures. The presence of the columnar grain microstructure in the metallic capacitor plate structures can provide an embedded capacitor that has an improved quality factor, Q.

Structures and methods of fabricating semiconductor wafer assemblies that encapsulate one or die in a cavity etched into an oxide bonded semiconductor wafer stack. The methods generally include the steps of positioning the die in the cavity, mechanically and electrically mounting the die to the wafer stack, and encapsulating the die within the cavity by bonding a lid wafer to the wafer stack in one of multiple ways. Semiconductor processing steps are applied to construct the assemblies (e.g., deposition, annealing, chemical and mechanical polishing, etching, etc.) and connecting the die (e.g., bump bonding, wire interconnecting, ultrasonic bonding, oxide bonding, etc.) according to the embodiments described above.

Structures and methods of fabricating semiconductor wafer assemblies that encapsulate one or die in a cavity etched into an oxide bonded semiconductor wafer stack. The methods generally include the steps of positioning the die in the cavity, mechanically and electrically mounting the die to the wafer stack, and encapsulating the die within the cavity by bonding a lid wafer to the wafer stack in one of multiple ways. Semiconductor processing steps are applied to construct the assemblies (e.g., deposition, annealing, chemical and mechanical polishing, etching, etc.) and connecting the die (e.g., bump bonding, wire interconnecting, ultrasonic bonding, oxide bonding, etc.) according to the embodiments described above.

A method includes forming a dielectric layer over a carrier, forming a plurality of bond pads in the dielectric layer, and performing a planarization to level top surfaces of the dielectric layer and the plurality of bond pads with each other. A device die is bonded to the dielectric layer and portions of the plurality of bond pads through hybrid bonding. The device die is encapsulated in an encapsulating material. The carrier is then demounted from the device die and the dielectric layer.