H01L2224/755

BATCH PROCESSING OVEN AND METHOD
20210265301 · 2021-08-26 ·

The present disclosure is directed to a compact vertical oven for reflow of solder bumps for backend processes in semiconductor wafer assembly and packaging. This disclosure describes a vertical oven which uses a plurality of wafers (e.g., an example value is 50-100 wafers) in a batch with controlled injection of the reducing agent (e.g. formic acid), resulting in a process largely free of contamination. This disclosure describes controlled formic acid flow through a vertical system using laminar flow technology in a sub-atmospheric pressure environment, which is not currently available in the industry. The efficacy of the process depends on effective formic acid vapor delivery, integrated temperature control during heating and cooling, and careful design of the vapor flow path with exhaust. Zone-dependent reaction dynamics managed by vapor delivery process, two-steps temperature ramp control, and controlled cooling process and formic acid content ensures the effective reaction without any flux.

BATCH PROCESSING OVEN AND METHOD
20210265301 · 2021-08-26 ·

The present disclosure is directed to a compact vertical oven for reflow of solder bumps for backend processes in semiconductor wafer assembly and packaging. This disclosure describes a vertical oven which uses a plurality of wafers (e.g., an example value is 50-100 wafers) in a batch with controlled injection of the reducing agent (e.g. formic acid), resulting in a process largely free of contamination. This disclosure describes controlled formic acid flow through a vertical system using laminar flow technology in a sub-atmospheric pressure environment, which is not currently available in the industry. The efficacy of the process depends on effective formic acid vapor delivery, integrated temperature control during heating and cooling, and careful design of the vapor flow path with exhaust. Zone-dependent reaction dynamics managed by vapor delivery process, two-steps temperature ramp control, and controlled cooling process and formic acid content ensures the effective reaction without any flux.

PROCESS AND DEVICE FOR LOW-TEMPERATURE PRESSURE SINTERING
20210104488 · 2021-04-08 ·

Process for producing an electronic subassembly by low-temperature pressure sintering, comprising the following steps: arranging an electronic component on a circuit carrier having a conductor track, connecting the electronic component to the circuit carrier by the low-temperature pressure sintering of a joining material which connects the electronic component to the circuit carrier, characterized in that, to avoid the oxidation of the electronic component or of the conductor track, the low-temperature pressure sintering is carried out in a low-oxygen atmosphere having a relative oxygen content of 0.005 to 0.3%.

PROCESS AND DEVICE FOR LOW-TEMPERATURE PRESSURE SINTERING
20210104488 · 2021-04-08 ·

Process for producing an electronic subassembly by low-temperature pressure sintering, comprising the following steps: arranging an electronic component on a circuit carrier having a conductor track, connecting the electronic component to the circuit carrier by the low-temperature pressure sintering of a joining material which connects the electronic component to the circuit carrier, characterized in that, to avoid the oxidation of the electronic component or of the conductor track, the low-temperature pressure sintering is carried out in a low-oxygen atmosphere having a relative oxygen content of 0.005 to 0.3%.

Substrate Bonding Apparatus and Substrate Bonding Method

A substrate bonding apparatus that bonds a first substrate and a second substrate together, comprising a joining section that joins the first substrate and second substrate together aligned to each other for stacking; a detecting section that detects an uneven state on at least one of the first substrate and second substrate prior to joining by the joining section; and a determining section that determines whether the uneven state detected by the detecting section satisfies a predetermined condition, wherein the joining section does not join the first substrate and the second substrate if it is determined by the determining section that the uneven state does not satisfy the predetermined condition.

Substrate Bonding Apparatus and Substrate Bonding Method

A substrate bonding apparatus that bonds a first substrate and a second substrate together, comprising a joining section that joins the first substrate and second substrate together aligned to each other for stacking; a detecting section that detects an uneven state on at least one of the first substrate and second substrate prior to joining by the joining section; and a determining section that determines whether the uneven state detected by the detecting section satisfies a predetermined condition, wherein the joining section does not join the first substrate and the second substrate if it is determined by the determining section that the uneven state does not satisfy the predetermined condition.

Conveying device

In a conveying device, a belt conveyer is equipped with a conveying portion that conveys an object from an upstream region to a downstream region. A heat source heats the conveyed object. A cooling portion is located downstream of a terminal end of the belt conveyor and cools the object. A first thermoacoustic cooling device cools the cooling portion. A first prime mover generates acoustic waves from heat transmitted from the first heat source. A first receiver generates, from the acoustic waves, cooling heat corresponding to a cooling temperature that is lower than a temperature of the heat source.

Interconnect using embedded carbon nanofibers
10658349 · 2020-05-19 · ·

Embodiments relate to the design of a device capable of increasing the electrical performance of an interconnect feature by amplifying the current carrying capacity of an interconnect feature. The device comprises a first body comprising a first surface with at least one nanoporous conductive structure protruding from the first surface. The device further comprises a second body comprising a second surface with arrays of nanofibers extending from the second surface and penetrating into corresponding nanoporous conductive structures to form conductive pathways between the first body and the second body.

METHOD FOR TRANSFERRING MASSIVE MICRO-LED AND MICRO-LED SUBSTRATE

A method for transferring massive Micro-LED includes: providing a transfer plate including a base substrate, an insulation film on the base substrate and provided with recesses, and first metal bonding pads in the recesses; providing Micro-LED grains each provided with a second bonding metal at a backside of the Micro-LED gain; forming solder on the first metal bonding pad or the second metal bonding pad; placing the transfer plate and the Micro-LED gains into a chamber which contains solvent and has a temperature higher than a melting point of the solder, vibrating the chamber to enable the Micro-LED gains to fall into the recesses, thereby enabling the second metal bonding pads of the Micro-LED gains fallen in the recesses to be in contact with the first metal bonding pads in the recesses through the solder; and cooling down the transfer plate, thereby solidifying the solder and forming a Micro-LED substrate.

Apparatus and method for forming a package structure

An apparatus for forming a package structure is provided. The apparatus includes a processing chamber for bonding a first package component and a second package component. The apparatus also includes a bonding head disposed in the processing chamber. The bonding head includes a plurality of vacuum tubes communicating with a plurality of vacuum devices. The apparatus further includes a nozzle connected to the bonding head and configured to hold the second package component. The nozzle includes a plurality of first holes that overlap the vacuum tubes. The nozzle also includes a plurality of second holes offset from the first holes, wherein the second holes overlap at least two edges of the second package component. In addition, the apparatus includes a chuck table disposed in the processing chamber, and the chuck table is configured to hold and heat the first package component.