Patent classifications
H01L2224/83007
JOINT CONNECTION OF CORNER NON-CRITICAL TO FUNCTION (NCTF) BALL FOR BGA SOLDER JOINT RELIABILITY (SJR) ENHANCEMENT
Embodiments include semiconductor packages and a method of forming the semiconductor packages. A semiconductor package includes a package substrate with a top surface, a corner portion, and a plurality of solder balls on the top surface of the package substrate. The semiconductor package also includes a pattern on the corner portion of the package substrate. The pattern may have a width substantially equal to a width of the solder balls. The pattern may also include a continuous line having solder materials. The semiconductor package may include a plurality of conductive pads on the package substrate. The conductive pads may be coupled to the pattern. The pattern may have a z-height that is substantially equal to a z-height of the solder balls, and have one or more outer edges, where the outer edges of the pattern are sidewalls. The sidewalls of the pattern may be substantially vertical or tapered sidewalls.
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
In a semiconductor device, a substrate has a main surface. A first semiconductor chip has a first front surface and a first back surface, and is mounted on the main surface via a plurality of bump electrodes. A first spacer has a second front surface and a second back surface that is mounted on the main surface. A height of the second front surface from the main surface is within a range between a highest height and a lowest height of the first back surface from the main surface. A second spacer has a third front surface and a third back surface that is mounted on the main surface. A height of the third front surface from the main surface is within the range between the highest height and the lowest height of the first back surface from the main surface.
SEMICONDUCTOR DEVICE
A conductive plate includes a first slit formed in the space between a first chip area and a second chip area, a second slit formed in the space between the first chip area and a terminal area, and a third slit formed in the space between the second chip area and the terminal area. The first slit is a continuous line that penetrates through the conductive plate, whereas the second and third slits are continuous lines that do not penetrate through the conductive plate.
CIRCUIT BOARD AND SEMICONDUCTOR PACKAGE BOARD COMPRISING SAME
A circuit board according to an embodiment includes an insulating layer; a circuit pattern disposed on the insulating layer; and a first protective layer disposed on the insulating layer, wherein the first protective layer includes a first opening vertically overlapping at least a part of an upper surface of the circuit pattern; wherein an inner wall of the first protective layer constituting the first opening includes: a first portion having a first inclination, and a second portion disposed on the first portion and having a second inclination different from the first inclination, and wherein the first portion overlaps the circuit pattern in a horizontal direction.
DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
A display device includes: a display layer on a substrate, the display layer including a light emitting element; a reflective structure on the display layer; a resin part on the display layer; a cover part on the resin part; and a driving circuit board, at least a portion of the driving circuit board being on a side of the display layer. The reflective structure includes a reflective surface facing the at least the portion of the driving circuit board.
Processes for adjusting dimensions of dielectric bond line materials and related films, articles and assemblies
Processes for adjusting dimensions of dielectric bond line materials in stacks of microelectronic components to prevent extrusion of the dielectric bond line materials beyond component peripheries during thermocompression bonding by patterning the materials with boundary portions inset from component peripheries, or employing an inset dielectric material surrounded by another solidified dielectric material. Related material films, articles and assemblies are also disclosed.
Semiconductor device, method for manufacturing the same, and power conversion device
In a method for manufacturing a semiconductor device, a plurality of first provisional fixing portions are supplied on a front surface of a substrate such that the plurality of first provisional fixing portions are spaced from each other and thus dispersed. A first solder layer processed into a plate to be a first soldering portion is disposed in contact with the plurality of first provisional fixing portions. A semiconductor chip is disposed on the first solder layer. In addition a conductive member in the form of a flat plate is disposed thereon via a second provisional fixing portion and a second solder layer. A reflow process is performed to solder the substrate, the semiconductor chip and the conductive member together.
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
In a semiconductor device, a semiconductor element includes a semiconductor substrate, a surface electrode and a protective film. The semiconductor substrate has an active region and an outer peripheral region. The surface electrode includes a base electrode disposed on a front surface of the semiconductor substrate and a connection electrode disposed on the base electrode. The protective film covers a peripheral end portion of the base electrode and an outer peripheral edge of the connection electrode. The protective film has an opening to expose the connection electrode so as to enable a solder connection. A boundary between the outer peripheral edge of the connection electrode and the protective film is located at a position corresponding to the outer peripheral region in a plan view.
SEMICONDUCTOR WAFER, METHOD FOR SEPARATING THE SEMICONDUCTOR WAFER, SEMICONDUCTOR CHIP, AND SEMICONDUCTOR PACKAGE INCLUDING THE SEMICONDUCTOR CHIP
A semiconductor wafer includes a first chip region and a second chip region spaced apart from each other by a scribe lane region. The semiconductor wafer also includes a test pad disposed in the scribe lane region. The semiconductor wafer additionally includes a protective layer partially covering the first chip region, the second chip region, and the scribe lane region, wherein the protective layer covers a portion of the test pad adjacent to the first chip region and leaves a remaining portion of the first test pad exposed.
Chip package structure and method for forming the same
A method for forming a chip package structure is provided. The method includes disposing a chip package over a wiring substrate. The method includes forming a first heat conductive structure and a second heat conductive structure over the chip package. The first heat conductive structure and the second heat conductive structure are separated by a first gap. The method includes bonding a heat dissipation lid to the chip package through the first heat conductive structure and the second heat conductive structure. The first heat conductive structure and the second heat conductive structure extend toward each other until the first heat conductive structure contacts the second heat conductive structure during bonding the heat dissipation lid to the chip package.