An integrated circuit package comprising one or more electronic component(s); a first substrate including a first surface and a second surface of the first substrate; and a second substrate including a first surface and a second surface of the second substrate. The first substrate including a first first-substrate cavity on the first surface of the first substrate. The second substrate includes a first second-substrate cavity on the first surface of the second substrate. The second surface of the first substrate and the second surface of the second substrate is located between the first surface of the first substrate and the first surface of the second substrate; or the first surface of the first substrate and the first surface of the second substrate is located between the second surface of the first substrate and the second surface of the second substrate.

An integrated circuit package comprising one or more electronic component(s); a first substrate including a first surface and a second surface of the first substrate; and a second substrate including a first surface and a second surface of the second substrate. The first substrate including a first first-substrate cavity on the first surface of the first substrate. The second substrate includes a first second-substrate cavity on the first surface of the second substrate. The second surface of the first substrate and the second surface of the second substrate is located between the first surface of the first substrate and the first surface of the second substrate; or the first surface of the first substrate and the first surface of the second substrate is located between the second surface of the first substrate and the second surface of the second substrate.

A multi-pin wafer level chip scale package is achieved. One or more solder pillars and one or more solder blocks are formed on a silicon wafer wherein the one or more solder pillars and the one or more solder blocks all have a top surface in a same horizontal plane. A pillar metal layer underlies the one or more solder pillars and electrically contacts the one or more solder pillars with the silicon wafer through an opening in a polymer layer over a passivation layer. A block metal layer underlies the one or more solder blocks and electrically contacts the one or more solder pillars with the silicon wafer through a plurality of via openings through the polymer layer over the passivation layer wherein the block metal layer is thicker than the pillar metal layer.

Two transistor rows are arranged on or in a substrate. Each of the two transistor rows is configured by a plurality of transistors aligned in a first direction, and the two transistor rows are arranged at an interval in a second direction orthogonal to the first direction. A first wiring is arranged between the two transistor rows when seen from above. The first wiring is connected to collectors or drains of the plurality of transistors in the two transistor rows. The first bump overlaps with the first wiring when seen from above, is arranged between the two transistor rows, and is connected to the first wiring.

The present application discloses a multi-die FPGA implementing a built-in analog circuit using an active silicon connection layer, and relates to the field of FPGA technology. The multi-die FPGA allows multiple small-scale and small-area dies to cascade to achieve large-scale and large-area FPGA products, reducing processing difficulties and improving chip production yields. Meanwhile, due to the existence of the active silicon connection layer, some circuit structures that are difficult to implement within the die and/or occupy a large die area and/or have a low processing requirement can be laid out in the silicon connection layer, solving the existing problems of making these circuit structures directly within the die. Part of the circuit structures can be implemented within the silicon connection layer and the rest in the die, which helps optimize the performance of FPGA products, improve system stability, and reduce system area.

A method and apparatus are described for fabricating a microchip structure (60A) which includes a first chip (41) that is affixed to a lead frame strip (11-18) having a plurality of lead frame pads (11-16) in a circuit mounting area (19) and a planar lead frame inductor coil (17) that is laterally displaced from the circuit mounting area (19), where molded body (61) encapsulates the first chip (41), lead frame pads (11-16) and planar lead frame inductor coil (17).

A multi-pin wafer level chip scale package is achieved. One or more solder pillars and one or more solder blocks are formed on a silicon wafer wherein the one or more solder pillars and the one or more solder blocks all have a top surface in a same horizontal plane. A pillar metal layer underlies the one or more solder pillars and electrically contacts the one or more solder pillars with the silicon wafer through an opening in a polymer layer over a passivation layer. A block metal layer underlies the one or more solder blocks and electrically contacts the one or more solder pillars with the silicon wafer through a plurality of via openings through the polymer layer over the passivation layer wherein the block metal layer is thicker than the pillar metal layer.

A filter structure includes a ground plane in a first metal layer of an integrated circuit (IC) package, a plate in a second metal layer of the IC package, a dielectric layer between the ground plane and the plate, the ground plane, the dielectric layer, and the plate thereby being configured as a capacitive device, and an inductive device in a third metal layer of the IC package. The inductive device is electrically connected to the plate, and the plate and the inductive device are configured to have a resonance frequency greater than 1 GHz.

An integrated circuit package includes a transmission line structure, wire bonds, a first post and a second post. The transmission line structure runs from a printed circuit board (PCB) to an integrated circuit (IC) and includes a center transmission line between two ground lines and sealed from exposure to air. The wire bonds connect the transmission line structure to pads on the integrated circuit from where the center transmission line exits the integrated circuit package. The wire bonds are selected to have an impedance matched to impedance of the integrated circuit. The first post supports the center transmission line where the center transmission line enters the integrated circuit package from the printed circuit board. The second post supports the center transmission line where the center transmission line exits the integrated circuit package to connect to the wire bonds.

A semiconductor package comprises an encapsulation having a first lateral side and an opposite second lateral side, at least one power semiconductor chip having a drain contact region running along the first lateral side, a source contact region running along the second lateral side, and first and second inner contact regions arranged between the drain and source contact regions, a first external terminal which is connected to the drain contact region, is arranged centrally on the first lateral side, and is configured to apply a supply voltage for the at least one power semiconductor chip, a second external terminal which is connected to the source contact region, is arranged centrally on the second lateral side, and is configured to apply a reference voltage for the at least one power semiconductor chip, third and fourth external terminals which are connected to the first inner contact region. are arranged opposite each other at a first end of the first and second lateral sides, respectively, and are configured a first output of the semiconductor package, and fifth and sixth external terminals which are connected to the second inner contact region and are arranged opposite each other at a second end of the first and second lateral sides, respectively, and are configured as a second output of the semiconductor package.