Systems and techniques for multilayer electrode assemblies are generally described. In some examples, a multilayer electrode assembly may comprise a first dielectric material. In some examples, the first dielectric material may be shaped so as to form a channel defined by an interior surface. In various examples the multilayer electrode assemblies may comprise a first metal layer disposed adjacent to a first portion of the exterior surface of the first dielectric material. In various further examples, the multilayer electrode assemblies may comprise a second metal layer disposed adjacent to a second portion of the exterior surface of the first dielectric material. In some examples, the first metal layer may be disposed in a first spaced relationship with the second metal layer. In various examples, a substantially uniform electric field may be generated in the channel of the first dielectric material when a voltage is applied to the multilayer electrode assembly.

The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

A CO.sub.2 beam source includes a discharge tube in which a laser gas serves as a laser medium, a fan for supplying the laser gas into the discharge tube via a supply element and for removing the laser gas from the discharge tube via a removal element in a closed laser gas circuit, and a catalyst for catalysing oxidation of dissociation products formed upon excitation of the laser gas. The catalyst includes precious metal nanoparticles applied to a substrate. The catalyst is arranged with clearance from the discharge tube in the flow direction of the laser gas within the closed laser gas circuit in order to reduce deposition of degradation products formed in the discharge tube upon excitation of the laser gas compared to an arrangement within the discharge tube. A temperature of the at least one catalyst during operation of the CO.sub.2 beam source is at least 60? C.

A CO.sub.2 beam source includes a discharge tube in which a laser gas serves as a laser medium, a fan for supplying the laser gas into the discharge tube via a supply element and for removing the laser gas from the discharge tube via a removal element in a closed laser gas circuit, and a catalyst for catalysing oxidation of dissociation products formed upon excitation of the laser gas. The catalyst includes precious metal nanoparticles applied to a substrate. The catalyst is arranged with clearance from the discharge tube in the flow direction of the laser gas within the closed laser gas circuit in order to reduce deposition of degradation products formed in the discharge tube upon excitation of the laser gas compared to an arrangement within the discharge tube. A temperature of the at least one catalyst during operation of the CO.sub.2 beam source is at least 60? C.

A laser marking system for marking a product includes a marking head having an electromagnetic radiation steering mechanism configured to steer electromagnetic radiation to address a specific location within a two-dimensional field of view. The electromagnetic radiation steering mechanism comprises a first optical element having an associated first actuator configured to rotate the first optical element about a first rotational axis to change a first coordinate of a first steering axis in the two-dimensional field of view and a second optical element having an associated second actuator configured to rotate the second optical element about a second rotational axis to change a second coordinate of a second steering axis in the two-dimensional field of view. The electromagnetic radiation steering mechanism comprises an electromagnetic radiation manipulator configured to introduce a difference between a first angle and a second angle (defined between the first and second rotational and steering (respectively) axes).

A laser marking system for marking a product includes a marking head having an electromagnetic radiation steering mechanism configured to steer electromagnetic radiation to address a specific location within a two-dimensional field of view. The electromagnetic radiation steering mechanism comprises a first optical element having an associated first actuator configured to rotate the first optical element about a first rotational axis to change a first coordinate of a first steering axis in the two-dimensional field of view and a second optical element having an associated second actuator configured to rotate the second optical element about a second rotational axis to change a second coordinate of a second steering axis in the two-dimensional field of view. The electromagnetic radiation steering mechanism comprises an electromagnetic radiation manipulator configured to introduce a difference between a first angle and a second angle (defined between the first and second rotational and steering (respectively) axes).

A carbon dioxide gas-discharge slab-laser is assembled in a laser-housing. The laser-housing is formed from a hollow extrusion. An interior surface of the extrusion provides a ground electrode of the laser. Another live electrode is located within the extrusion, electrically insulated from and parallel to the ground electrode, forming a discharge-gap of the slab-laser. The electrodes are spaced apart by parallel ceramic strips. Neither the extrusion, nor the live electrode, include any direct fluid-cooling means. The laser-housing is cooled by fluid-cooled plates attached to the outside thereof.

A carbon dioxide gas-discharge slab-laser is assembled in a laser-housing. The laser-housing is formed from a hollow extrusion. An interior surface of the extrusion provides a ground electrode of the laser. Another live electrode is located within the extrusion, electrically insulated from and parallel to the ground electrode, forming a discharge-gap of the slab-laser. The electrodes are spaced apart by parallel ceramic strips. Neither the extrusion, nor the live electrode, include any direct fluid-cooling means. The laser-housing is cooled by fluid-cooled plates attached to the outside thereof.

A gas laser apparatus includes a voltage application circuit, a chamber device that includes an electrode and is configured to output light generated when a voltage is applied to the electrode from the voltage application circuit, a first pallet that includes a mounting surface on which the chamber device and the voltage application circuit are disposed in parallel with each other, and a housing unit in and out of which the first pallet is movable by movement in an in-plane direction of the mounting surface.