Patent classifications
H01S3/09705
Laser device, laser machining apparatus, and method for controlling output of laser device
A laser device, including multiple laser modules, includes a plurality of drive power units that drive the laser modules, a plurality of output detection units that detect laser outputs from the laser modules, and output detected values as first output signals, a coupled output detection unit that detects a total laser output after coupling of a plurality of the laser outputs, and outputs a detected value as a second output signal, a computing unit that sets multiple output correction factors for correspondingly controlling the laser modules using the plurality of first output signals and the second output signal, and a control unit that controls the plurality of drive power units using the multiple output correction factors. The multiple output correction factors are each set to allow the total laser output to be maintained at a constant value.
Systems and methods for spatiotemporal control of a laser and applications of same
Methods and systems are disclosed for using a chromatic lens system to provide a flying focusi.e., an advanced focusing scheme enabling spatiotemporal control of a focal location. In a method, a photon beam is emitted from a source at a wavelength. The photon beam may have more than one wavelength. The photon beam is focused to a focal location using a chromatic lens system. The focal location is at a first longitudinal distance along an optical axis from the chromatic lens system. The wavelength of the photon beam is changed as a function of time to change the focal location as a function of time. The wavelength may be changed such that the focal location changes with a focal velocity.
Gas optimization in a gas discharge light source
In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
Laser gas regeneration system and laser system
A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.
LASER DEVICE, LASER MACHINING APPARATUS, AND METHOD FOR CONTROLLING OUTPUT OF LASER DEVICE
A laser device, including multiple laser modules, includes a plurality of drive power units that drive the laser modules, a plurality of output detection units that detect laser outputs from the laser modules, and output detected values as first output signals, a coupled output detection unit that detects a total laser output after coupling of a plurality of the laser outputs, and outputs a detected value as a second output signal, a computing unit that sets multiple output correction factors for correspondingly controlling the laser modules using the plurality of first output signals and the second output signal, and a control unit that controls the plurality of drive power units using the multiple output correction factors. The multiple output correction factors are each set to allow the total laser output to be maintained at a constant value.
LASER GAS MANAGEMENT SYSTEM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND METHOD FOR CONTROLLING EXCIMER LASER SYSTEM
A laser gas management system includes a gas regeneration apparatus connected to a plurality of excimer laser apparatuses and configured to regenerate a laser gas discharged from the plurality of excimer laser apparatuses into a regenerated gas and supply the plurality of excimer laser apparatuses with the regenerated gas and a controller configured to evaluate whether or not at least one parameter of any of the plurality of excimer laser apparatuses has exceeded a range determined in advance and determine that abnormality has occurred in the gas regeneration apparatus when the at least one parameter has exceeded the range determined in advance in two or more of the excimer laser apparatuses.
LASER GAS REGENERATION SYSTEM AND LASER SYSTEM
A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.
GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE
In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
GAS LASER DEVICE
A discharge excitation gas laser device includes: first and second discharge electrodes disposed to face each other; a plurality of peaking capacitors connected to the first discharge electrode; a charger; a plurality of pulse power modules, each one of the pulse power modules including a charging capacitor to which a charged voltage is applied from the charger, a pulse compression circuit that pulse-compresses and outputs electrical energy stored in the charging capacitor as an output pulse to a corresponding peaking capacitor, and a switch disposed between the charging capacitor and the pulse compression circuit; a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding pulse power module; and a control unit configured to control, based on a detection result of each of the output pulse sensor, a tinting of a switch signal to be input to a corresponding switch.
SYSTEMS AND METHODS FOR SPATIOTEMPORAL CONTROL OF A LASER AND APPLICATIONS OF SAME
Methods and systems are disclosed for using a chromatic lens system to provide a flying focusi.e., an advanced focusing scheme enabling spatiotemporal control of a focal location. In a method, a photon beam is emitted from a source at a wavelength. The photon beam may have more than one wavelength. The photon beam is focused to a focal location using a chromatic lens system. The focal location is at a first longitudinal distance along an optical axis from the chromatic lens system. The wavelength of the photon beam is changed as a function of time to change the focal location as a function of time. The wavelength may be changed such that the focal location changes with a focal velocity.