A semiconductor laser element includes a light emission layer and a plurality of waveguides to arranged in one direction. A semiconductor laser device includes the semiconductor laser element and a first base disposed, via a first adhesion layer, on one face in the lamination direction of the semiconductor laser element. The thermal resistance of the first adhesion layer is, in the arrangement direction of the plurality of waveguides to lower on one end portion side than on the other end portion side.

The present invention relates to a device for generating laser radiation.

An object of the present invention is to indicate a laser diode which simultaneously has a high degree of efficiency and a low degree of far field divergence.

The diode laser according to the invention comprises a current barrier (5), characterized in that the current barrier (5) extends along a third axis (X), wherein the current barrier (5) has at least one opening, and a first width (W1) of the opening of the current barrier (5) along the third axis (X) is smaller than a second width (W2) of the metal p-contact (8) along the third axis (X).

Trenched VCSEL emitter structures are described. In an embodiment, an emitter structure includes a cluster of non-uniformly distributed emitters in which each emitter includes an inside mesa trench and an oxidized portion of an oxide aperture layer extending from the inside mesa trench. An outside moat trench is located adjacent the inside mesa trench and is formed to a depth past the oxide aperture layer.

A laser includes a substrate, first and second claddings, a gain medium, and multiple supports. The first cladding is spaced apart from the substrate by an air gap. A thickness of the first cladding in a vertical direction is in a range from 0.05-0.15 micrometers. The gain medium is disposed on the first cladding opposite the air gap. The second cladding is disposed on the gain medium opposite the first cladding. A thickness of the second cladding in the vertical direction is in a range from 0.05-0.15 micrometers. The supports are coupled to each of the substrate, the first cladding, the gain medium, and the second cladding to retain the first cladding, the gain medium, and the second cladding spaced apart from the substrate.

A surface-emitting laser, which is a ridge waveguide structure, including: a substrate, a first cladding layer, an active layer, a conductive layer, a second cladding layer; the Bragg gratings is etched on the surface of the ridge waveguide; the two upper electrodes are disposed on both sides of the ridge waveguide; two grooves are formed between the ridge waveguide and each of the two upper electrodes; the first waveguide cladding layer includes one or more current confinement regions; or a buried tunnel junction is formed in the second cladding layer for limiting current. The Bragg gratings comprise two first-order gratings and one second-order grating placed between two first-order gratings.

The application concerns a method of manufacturing optoelectronic semiconductor components (1) comprising the following steps: A) Growing a semiconductor layer sequence (3) for generating radiation onto a growth substrate (2), B) Structuring the semiconductor layer sequence (3) into emitter strands (11) so that the semiconductor layer sequence (3) is removed in gaps (12) between adjacent emitter strands (11), C) Applying a passivation layer (4), the semiconductor layer sequence (3) at waveguide contacts (51) remote from the growth substrate (2) and the gaps (12) remaining at least partially free, D) Producing at least one metal layer (50), which extends from the waveguide contacts (51) into the gaps (12), E) Replacing the growth substrate (2) with a carrier (6), F) Making vias (53) in the carrier (6) so that the metal layer (50) and underside contacts (52) of the semiconductor layer sequence (3) facing the carrier (6) are electrically contacted, and removing the carrier (6) between at least some of the emitter strands (11) and between emitter units (13) following one another along the emitter strands (11), and G) Breaking the semiconductor layer sequence (3) between the emitter units (13), so that facets (31) are formed.

An optical semiconductor device outputting a predetermined wavelength of laser light includes a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction. The optical semiconductor device includes a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer. The optical semiconductor device further includes an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer. The quantum well active layer is doped with 0.3 to 1×10.sup.18/cm.sup.3 of n-type impurity.

An optoelectronic component includes a layer structure including an active zone that generates electromagnetic radiation and is arranged in a plane, wherein the layer structure includes a top side and four side faces, first and third side faces are arranged opposite one another, second and fourth side faces are arranged opposite one another, a strip-shaped ridge structure is arranged on the top side of the layer structure and extends between the first side face and the third side face, the first side face constitutes an emission face for electromagnetic radiation, wherein a first recess is introduced into the top side of the layer structure laterally alongside the ridge structure, a second recess is introduced into the first recess, the second recess extends as far as the second side face, and at least one third recess is introduced into a base face of the first recess laterally alongside the ridge structure.

The present invention provides one or more injection-lockable whistle-geometry semiconductor ring lasers, which may be cascaded, that are integrated on a common silicon-on-insulator (SOI) substrate with a single-frequency semiconductor master laser, wherein the light output from the semiconductor master laser is used to injection-lock the first of the semiconductor ring lasers. The ring lasers can be operated in strongly injection-locked mode, while at least one of them is subjected to direct injection current modulation.

A method for manufacturing an optical semiconductor device having a ridge stripe configuration containing an active layer and current blocking layers which embed both sides of the ridge stripe configuration, comprises steps of forming a mask of an insulating film on a surface of a semiconductor layer containing an active layer, forming a ridge stripe configuration by etching a semiconductor layer using gas containing SiCl.sub.4, removing an oxide layer with regard to a Si based residue which is attached on a surface which is etched of the ridge stripe configuration which is formed and removing a Si based residue whose oxide layer is removed.