A plasma generation system includes a plasma confinement device, a precursor supply unit, and a power supply unit. The plasma confinement device includes an inner electrode, an outer electrode, and an electrically insulating insert. The outer electrode surrounds the inner electrode to define an acceleration region therebetween, and extends longitudinally beyond the inner electrode to define an assembly region. The acceleration and assembly regions form a plasma chamber. The plasma generation system has a first and a second operation mode, wherein the insert is respectively removed from and inserted into the plasma chamber. In both modes, the precursor supply unit is configured to supply a plasma precursor in the plasma chamber and the power supply unit is configured to energize the plasma precursor into a Z-pinch plasma. In the second mode, the insert is configured to reduce a discharge volume of the plasma chamber to substantially exclude the acceleration region.

Methods and systems are provided for impregnating capacitors and other receptacles with a fluid. In one example, a system may include a reservoir of a purified fluid to be used to impregnate one or more receptacles and a manifold configured to withstand an internal pressure differential to cause the purified fluid to infiltrate the manifold. The system may further include a convection oven in which the one or more receptacles and the manifold are located when the one or more receptacles are impregnated with the purified fluid.

Methods and systems are provided for impregnating capacitors and other receptacles with a fluid. In one example, a system may include a reservoir of a purified fluid to be used to impregnate one or more receptacles and a manifold configured to withstand an internal pressure differential to cause the purified fluid to infiltrate the manifold. The system may further include a convection oven in which the one or more receptacles and the manifold are located when the one or more receptacles are impregnated with the purified fluid.

An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma having a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.

An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma having a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.

An example plasma confinement system includes an inner electrode having a rounded first end that is disposed on a longitudinal axis of the plasma confinement system and an outer electrode that at least partially surrounds the inner electrode. The outer electrode includes a solid conductive shell and an electrically conductive material disposed on the solid conductive shell and on the longitudinal axis of the plasma confinement system. The electrically conductive material has a melting point within a range of 170 C. to 800 C. at 1 atmosphere of pressure. Related plasma confinement systems and methods are also disclosed herein.

An example plasma confinement system includes an inner electrode having a rounded first end that is disposed on a longitudinal axis of the plasma confinement system and an outer electrode that at least partially surrounds the inner electrode. The outer electrode includes a solid conductive shell and an electrically conductive material disposed on the solid conductive shell and on the longitudinal axis of the plasma confinement system. The electrically conductive material has a melting point within a range of 170 C. to 800 C. at 1 atmosphere of pressure. Related plasma confinement systems and methods are also disclosed herein.