A ballast transformer and system using the ballast transformer to couple power to a plasma load. The ballast transformer has a magnetic core, a first primary winding on a primary side of the magnetic core, a secondary winding on a secondary side of the magnetic core, and a second primary winding connected in series with the first primary winding and wound in proximity to the secondary winding on the secondary side of the magnetic core. The first primary winding is connectable to the AC power source, and the secondary winding is connectable to the plasma load via a coaxial cable.

Methodologies, systems, and devices are provided for producing metal spheroidal powder products. By utilizing a microwave plasma, control over spheriodization and resulting microstructure can be tailored to meet desired demands.

Methodologies, systems, and devices are provided for producing metal spheroidal powder products. By utilizing a microwave plasma, control over spheriodization and resulting microstructure can be tailored to meet desired demands.

Certain embodiments described herein are directed to a torch that includes a lanthanide or actinide material. In some embodiments, the torch can include one or more other materials in combination with the lanthanide or actinide material. In some embodiments, the torch can comprise cerium, terbium or thorium. In other embodiments, the torch can comprise a lanthanide or actinide material comprising a melting point higher than the melting point of quartz.

Certain embodiments described herein are directed to a torch that includes a lanthanide or actinide material. In some embodiments, the torch can include one or more other materials in combination with the lanthanide or actinide material. In some embodiments, the torch can comprise cerium, terbium or thorium. In other embodiments, the torch can comprise a lanthanide or actinide material comprising a melting point higher than the melting point of quartz.

A modified deposit-and-etch Bosch process of cyclic anisotropic etching and film deposition by gas switching. The modification of which includes depositing nucleated silicon layers as liquefied droplets of silicon instead of by passivation, and using a bias discharge to decelerate an otherwise ballistic deposition instead into a nuclei-generation cloud at the deposition site. Such is then useful in the refurbishment of gas distribution plates made of silicon.

Inductively coupled plasma (ICP) analyzers use an ICP torch to generate a plasma in which a sample is atomized an ionized. Analysis of the atomic ions can be performed by atomic analysis, such as mass spectrometry (MS) or atomic emission spectrometry (AES). Particle based ICP analysis includes analysis of particles such as cells, beads, or laser ablation plumes, by atomizing and ionizing particles in an ICP torch followed by atomic analysis. In mass cytometry, mass tags of particles are analyzed by mass spectrometry, such as by ICP-MS. Systems and methods of the subject application include one or more of: a demountable ICP torch holder assembly, an external ignition device; an ICP load coil comprising an annular fin, particle suspension sample introduction fluidics, and ICP analyzers thereof.

Inductively coupled plasma (ICP) analyzers use an ICP torch to generate a plasma in which a sample is atomized an ionized. Analysis of the atomic ions can be performed by atomic analysis, such as mass spectrometry (MS) or atomic emission spectrometry (AES). Particle based ICP analysis includes analysis of particles such as cells, beads, or laser ablation plumes, by atomizing and ionizing particles in an ICP torch followed by atomic analysis. In mass cytometry, mass tags of particles are analyzed by mass spectrometry, such as by ICP-MS. Systems and methods of the subject application include one or more of: a demountable ICP torch holder assembly, an external ignition device; an ICP load coil comprising an annular fin, particle suspension sample introduction fluidics, and ICP analyzers thereof.

A device for chemical destruction of at least one feed comprising at least one organic compound are provided. In one aspect, the device comprises at least one inductive plasma torch, means for introducing at least one plasma-forming gas into the torch, optionally when the plasma gas(es) comprise(s) no or little oxygen, means for bringing oxygen gas into the plasma or into the vicinity of the plasma, means for introducing the feed into the torch, a reaction enclosure capable of allowing thermal destruction of the gases flowing from the torch, a device allowing mixing of the gases flowing out of the reaction enclosure to be carried out, means for introducing air and/or oxygen gas into the mixing device, a device allowing recombination by cooling of at least one portion of the gases from the mixing device, the torch, the reaction enclosure, the mixing device and the recombination device being in fluidic communication.

A device for chemical destruction of at least one feed comprising at least one organic compound are provided. In one aspect, the device comprises at least one inductive plasma torch, means for introducing at least one plasma-forming gas into the torch, optionally when the plasma gas(es) comprise(s) no or little oxygen, means for bringing oxygen gas into the plasma or into the vicinity of the plasma, means for introducing the feed into the torch, a reaction enclosure capable of allowing thermal destruction of the gases flowing from the torch, a device allowing mixing of the gases flowing out of the reaction enclosure to be carried out, means for introducing air and/or oxygen gas into the mixing device, a device allowing recombination by cooling of at least one portion of the gases from the mixing device, the torch, the reaction enclosure, the mixing device and the recombination device being in fluidic communication.