Patent classifications
H05H1/30
SEGMENTED LINER AND METHODS OF USE WITHIN A MICROWAVE PLASMA APPARATUS
Disclosed herein are devices, systems and methods of use of an improved liner for a plasma torch. In particular, a segmented liner for use in a plasma torch (e.g., annular torch, swirl torch) is provided. In general, the improved segmented liner has improved thermal shock resistance capabilities over conventional unitary liners.
Double-frequency power-driven inductively coupled plasma torch, and apparatus for generating nanoparticle using same
A dual frequency power-driven inductively coupled plasma torch according to an exemplary embodiment of the present invention includes: a hollow confinement tube provided with a space in which thermal plasma is formed; an induction coil that surrounds the confinement tube; and a power supply source that supplies power to the induction coil, wherein the power supply source may supply at least two powers having different frequencies to the induction coil.
Double-frequency power-driven inductively coupled plasma torch, and apparatus for generating nanoparticle using same
A dual frequency power-driven inductively coupled plasma torch according to an exemplary embodiment of the present invention includes: a hollow confinement tube provided with a space in which thermal plasma is formed; an induction coil that surrounds the confinement tube; and a power supply source that supplies power to the induction coil, wherein the power supply source may supply at least two powers having different frequencies to the induction coil.
REACTION GAS SUPPLY EQUIPMENT OF AN INDUCTIVE COUPLED PLASMA MASS SPECTROMETER COMPRISES AN AMMONIA SUPPLY END AND A HELIUM SUPPLY END AND A REACTION GAS SUPPLY EQUIPMENT
A reaction gas supply equipment of an inductive coupled plasma mass spectrometer comprises an ammonia supply end and a helium supply end and a reaction gas supply equipment, which is supplied with an ammonia supply end and a helium supply end, and the reaction gas supply equipment is provided with an ammonia mass flow meter to adjust the flow of ammonia and helium mass flow meter to adjust the flow of helium; the ammonia mass flow meter and helium mass flow meter are adjusted by the proportion of reaction gas specified by the inductive coupled plasma spectrometer, and ammonia gas is mixed with helium gas to form reaction gas, which is then provided to the inductive coupled plasma mass spectrometer; through the technical means of the prevent invention, several advantages such as the protection of detection instrument and the reduction of cost of reaction gas can be achieved.
REACTION GAS SUPPLY EQUIPMENT OF AN INDUCTIVE COUPLED PLASMA MASS SPECTROMETER COMPRISES AN AMMONIA SUPPLY END AND A HELIUM SUPPLY END AND A REACTION GAS SUPPLY EQUIPMENT
A reaction gas supply equipment of an inductive coupled plasma mass spectrometer comprises an ammonia supply end and a helium supply end and a reaction gas supply equipment, which is supplied with an ammonia supply end and a helium supply end, and the reaction gas supply equipment is provided with an ammonia mass flow meter to adjust the flow of ammonia and helium mass flow meter to adjust the flow of helium; the ammonia mass flow meter and helium mass flow meter are adjusted by the proportion of reaction gas specified by the inductive coupled plasma spectrometer, and ammonia gas is mixed with helium gas to form reaction gas, which is then provided to the inductive coupled plasma mass spectrometer; through the technical means of the prevent invention, several advantages such as the protection of detection instrument and the reduction of cost of reaction gas can be achieved.
Apparatus and method for depositing a coating on a substrate at atmospheric pressure
An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
Apparatus and method for depositing a coating on a substrate at atmospheric pressure
An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
COVETIC MATERIALS
This disclosure provides a graded composition including at least a first, second, and third material property zone each having a crystallographic configuration distinct from other zones. In some implementations, the graded composition has a first material in the first material property zone including a metal, the first material composed of metallic bonds between metal atoms present in the first material property zone; a second material that at least partially overlaps the first material in the first material property zone including carbon, the second material composed of covalent bonds between the carbon in the second material and the metal in the first material; and, a third material that at least partially overlaps the second material property zone including carbon, the third material composed of covalent bonds between the carbon of the third material. Each crystallographic configuration may include a cubic crystallographic lattice, a hexagonal lattice, a face or body-centered cubic lattice.
SURFACE MODIFYING DEVICE
A discharge electrode E in an electrode chamber C comprises a plurality of electrode members 8, 9. The electrode members 8, 9 are disposed facing each other by having a supporting member 4 therebetween, a gap is formed between the facing portions of the electrode members 8, 9, and by having the gap as a gas passageway 15, the gas passageway is opened in the leading end of the discharge electrode. A replacement gas having been supplied from a manifold pipe 3 is supplied to the gas passageway 15 via an orifice.
PLASMA PROCESSES FOR PRODUCING GRAPHENE NANOSHEETS
Provided are plasma processes for producing graphene nanosheets comprising injecting into a thermal zone of a plasma a carbon-containing substance at a velocity of at least 60 m/s standard temperature and pressure STP to nucleate the graphene nano sheets, and quenching the graphene nanosheets with a quench gas of no more than 1000 C. The injecting of the carbon-containing substance may be carried out using a plurality of jets. The graphene nanosheets may have a Raman G/D ratio greater than or equal to 3 and a 2D/G ratio greater than or equal to 0.8, as measured using an incident laser wavelength of 514 nm. The graphene nanosheets may be produced at a rate of at least 80 g/h. The graphene nanosheets can have a polyaromatic hydrocarbon concentration of less than about 0.7% by weight.