An apparatus for providing material feedstock into a plasma of a plasma torch includes a material feeding device having an input end and an output end. The output end of the material feeding device extends at least partially around the periphery of a plasma generated near the output end of the plasma torch. The material feeding device is oriented at an angle with respect to a central axis of the plasma torch.

A fine particle manufacturing apparatus and a fine particle manufacturing method are provided. The apparatus includes a raw material supply part supplying a raw material; a plasma torch in which the thermal plasma flame is generated and the raw material supplied by the raw material supply part is vaporized by using the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation part generating the thermal plasma flame inside the plasma torch. The plasma generation part includes a first coil encircling the plasma torch; a second coil encircling the plasma torch and disposed below the first coil; a first power supply part supplying a high-frequency electric current to the first coil; and a second power supply part supplying an amplitude-modulated high-frequency electric current to the second coil. The first coil and the second coil are arranged in the longitudinal direction of the plasma torch.

A fine particle manufacturing apparatus and a fine particle manufacturing method are provided. The apparatus includes a raw material supply part supplying a raw material; a plasma torch in which the thermal plasma flame is generated and the raw material supplied by the raw material supply part is vaporized by using the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation part generating the thermal plasma flame inside the plasma torch. The plasma generation part includes a first coil encircling the plasma torch; a second coil encircling the plasma torch and disposed below the first coil; a first power supply part supplying a high-frequency electric current to the first coil; and a second power supply part supplying an amplitude-modulated high-frequency electric current to the second coil. The first coil and the second coil are arranged in the longitudinal direction of the plasma torch.

A separation apparatus for separating a supply of high-level nuclear waste (HLW), where the HL nuclear waste is separated into high-mass and low-mass portions. The high-and-low mass portions of the HLW have respective atomic masses that are above and below an atomic mass cut-off point of the separation apparatus. The separation apparatus includes first and second ICP torches that are respectively mounted to and within an apparatus housing. The apparatus housing defines a cylindrical separation chamber and includes first and second magnetic elements which generate a magnetic field along the length of the separation chamber, and a plurality concentric ring electrodes which generate an electric field that is perpendicular to, and which crosses the magnetic field. The supply of HLW is subject to a mass separation process within the separation chamber using the set of crossed electric and magnetic fields.

A separation apparatus for separating a supply of high-level nuclear waste (HLW), where the HL nuclear waste is separated into high-mass and low-mass portions. The high-and-low mass portions of the HLW have respective atomic masses that are above and below an atomic mass cut-off point of the separation apparatus. The separation apparatus includes first and second ICP torches that are respectively mounted to and within an apparatus housing. The apparatus housing defines a cylindrical separation chamber and includes first and second magnetic elements which generate a magnetic field along the length of the separation chamber, and a plurality concentric ring electrodes which generate an electric field that is perpendicular to, and which crosses the magnetic field. The supply of HLW is subject to a mass separation process within the separation chamber using the set of crossed electric and magnetic fields.

Methodologies, systems, and devices are provided for producing metal spheroidal powder products. Dehydrogenated and spheroidized particles are prepared using a process including introducing a metal hydride feed material into a plasma torch. The metal hydride feed material is melted within a plasma in order to dehydrogenate and spheroidize the materials, forming dehydrogenated and spheroidized particles. The dehydrogenated and spheroidized particles are then exposed to an inert gas and cooled in order to solidify the particles into dehydrogenated and spheroidized particles. The particles are cooled within a chamber having an inert gas.

Methodologies, systems, and devices are provided for producing metal spheroidal powder products. Dehydrogenated and spheroidized particles are prepared using a process including introducing a metal hydride feed material into a plasma torch. The metal hydride feed material is melted within a plasma in order to dehydrogenate and spheroidize the materials, forming dehydrogenated and spheroidized particles. The dehydrogenated and spheroidized particles are then exposed to an inert gas and cooled in order to solidify the particles into dehydrogenated and spheroidized particles. The particles are cooled within a chamber having an inert gas.

The embodiments disclosed herein are directed to systems and devices which utilize multiple microwave plasmas can be used to increase the efficiency of traditional single microwave plasma systems. Disclosed herein is a microwave plasma apparatus for processing materials which includes a reaction chamber, a plurality of microwave plasma applicators in communication with the reaction chamber, one or more microwave radiation sources, at least one waveguide for guiding microwave radiation from the one or more microwave radiations sources to multiple plasma applicators, and a material feeding system in communication with the reaction chamber.

The embodiments disclosed herein are directed to systems and devices which utilize multiple microwave plasmas can be used to increase the efficiency of traditional single microwave plasma systems. Disclosed herein is a microwave plasma apparatus for processing materials which includes a reaction chamber, a plurality of microwave plasma applicators in communication with the reaction chamber, one or more microwave radiation sources, at least one waveguide for guiding microwave radiation from the one or more microwave radiations sources to multiple plasma applicators, and a material feeding system in communication with the reaction chamber.

A desolvation unit performs desolvation by heating after a sample solution is turned to sample mist by a nebulizer. A sample gas that contains the desolvated sample mist and a carrier gas is introduced through a sample introduction tube to a plasma torch. An addition unit for adding, to the sample introduction tube, a water-containing gas is provided. The addition unit includes a container that contains ultrapure water, a gas tube for introducing the carrier gas into the ultrapure water to cause bubbling, and a gas tube for adding the water-containing gas, to the sample introduction tube. The plasma torch generates an inductively coupled plasma under the condition that supplied power is set to a range of 550 W to 700 W. Generation of interfering molecule ions due to an element having a high ionization potential is inhibited when an element in a sample ionized by the plasma is analyzed.