A system and method are provided for the separation of hydrogen from natural gas feedstock to form hydrocarbon radicals. Aspects of the system include perpendicular magnetic and electric fields, a method of radical formation that separates hydrogen from the reaction process, and a separation method based on centrifugal forces and phase transitions. The gases rotate in the chamber due to the Lorentz force without any mechanical motion. Rotation separates gases and liquids by centrifugal force. The lighter species are collected from the mid region endpoint of the apparatus and fed back for further reaction. A new concept of controlled turbulence is introduced to mix various species. A novel magnetic field device is introduced comprised of two specially magnetized cylinders. A novel control of temperatures, pressures, electron densities and profiles by, RF, microwaves, UV and rotation frequency are possible especially when atomic, molecular, cyclotron resonances are taken into account. The electrodes can be coated with catalysts; the entire apparatus can be used as a new type of chemical reactor.

A switching circuit includes: an electronic switch comprising one or more diodes for switching a capacitor within an electronic variable capacitor array; a first power switch receiving a common input signal and a first voltage input; and a second power switch receiving the common input signal and a second voltage input, wherein the second voltage input is opposite in polarity to the first voltage input, and the first power switch and the second power switch asynchronously connect the first voltage input and the second voltage input, respectively, to a common output in response to the common input signal, the one or more diodes being switched according to the first voltage input or the second voltage input connected to the common output.

Sterilisation systems suitable for clinical use for generating a flow of hydroxyl radicals, comprising: a coaxial transmission line comprising an inner and outer conductor; an end cap mounted on a distal end of the coaxial transmission line, wherein the end cap comprises an outlet aperture; a fluid conduit extending from a fluid inlet to the outlet aperture; and a plasma generating region at a proximal end of the outlet aperture, wherein the plasma generating region contains a first electrode electrically connected to the inner conductor, and a second electrode electrically connected to the outer conductor, wherein the fluid conduit defines a fluid flow path through the device aligned with a feed direction in which fluid is receivable through the fluid inlet, and wherein the first electrode and second electrode oppose each other in a transverse direction across the longitudinal fluid flow path in the plasma generating region.

Methods and apparatus for plasma processing are provided herein. The method for controlling current ratio in a substrate processing chamber may include (a) providing a first RF signal to a first RF coil and a second RF coil at a first current ratio set point and a first current operating mode, (b) determining a first dynamic control limit for the first current ratio set point based on a value of the first current ratio set point and the first current operating mode, (c) measuring an amount of current supplied to each of the first and second coils, (d) determining the actual current ratio based on the measured amounts of current supplied to each of the first and second coils, (e) determining whether the actual current ratio determined is within the dynamic control limits, and (f) repeating steps (b)-(e) until the actual current ratio determined is within the dynamic control limits.

A RF amplifier is provided that includes a plurality of switch modules connected in a cascade configuration and divided into disjoint sets in accordance with their corresponding distinct peak DC voltages or currents, each switch module including a plurality of switch devices connected in a half-bridge or full-bridge circuit and a DC voltage or current source electrically connected with the half-bridge or full-bridge circuit, and a control circuit configured to determine an output voltage or current of the RF amplifier at the next switching interval, examine the states of the switching devices in the respective switch modules to identify a combination of least-recently-switched switching devices within each set of switch modules that, when switched to an opposite state, will produce the determined output voltage or current, and switch to an opposite state, at the next switching interval, the switching devices in the identified combination.

A miniaturized plasma source includes a stripline split-ring resonator. The split-ring resonator is sandwiched between two dielectric substrates and two metal ground planes. In order to make the plasma accessible from the outside of the ground planes, a hole is made through the gap between the ends of the split ring. The two ground planes act as an electromagnetic shield, protecting the split-ring resonator from electromagnetic interference due to changes in the electric or dielectric environment surrounding it. The miniaturized plasma source is particularly useful in optogalvanic spectroscopy applications.

A system and method for creating an anti-reflective surface structure on an optical device includes a shim including a textured pattern, wherein the ship is configured to stamp the optical device with the textured pattern, a connector configured to place the optical device in proximity to the shim and apply a force to the optical device against the shim, and a laser source configured to heat the optical device by generating and applying a laser beam to the optical device when the optical device is placed in proximity to the shim.

In one embodiment, an RF generator includes an RF amplifier comprising an RF input, a DC input, and an RF output, the RF amplifier configured to receive at the RF input an RF signal from an RF source; receive at the DC input a DC voltage from a DC source; and provide an output power at the RF output; and a control unit operably coupled to the DC source and the RF source, the control unit configured to receive a power setpoint indicative of a desired output power at the RF output; determine a power dissipation at the RF generator; alter the DC voltage to decrease the power dissipation at the RF generator; and alter the RF signal to enable the output power at the RF output to be substantially equal to the power setpoint.

Disclosed herein are methods and apparatuses for adding thermal energy to a glass melt. Apparatuses for generating a thermal plasma disclosed herein comprise an electrode, a grounded electrode, a dielectric plasma confinement vessel extending between the two electrodes, and a magnetic field generator extending around the dielectric plasma confinement vessel. Also disclosed herein are methods for fining molten glass comprising generating a thermal plasma using the apparatuses disclosed herein and contacting the molten glass with the thermal plasma. Glass structures produced according to these methods are also disclosed herein.

A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.