Patent classifications
H05K3/425
Overhang-Compensating Annular Plating Layer in Through Hole of Component Carrier
A component carrier with an electrically insulating layer having a front side and a back side, a first and a second electrically conductive layer covering the front side and the back side of the electrically insulating layer, respectively. A through hole extends through both electrically conductive layers and the electrically insulating layer. An overhang is formed along one of the electrically conductive layers and sidewalls of the electrically insulating layer structure delimiting the through hole. An annular plating layer covers the sidewalls and fills part of the overhang such that a horizontal extension of the overhang after plating is less than 20 m and/or such that a ratio between a horizontal extension of the overhang after plating and a width of a first window through the first electrically conductive layer and/or a width of a second window through the second electrically conductive layer is smaller than 20%.
Component Carrier With Blind Hole Filled With An Electrically Conductive Medium And Fulfilling A Minimum Thickness Design Rule
A component carrier with a stack including at least one electrically insulating layer structure and at least one electrically insulating structure has a tapering blind hole formed in the stack and an electrically conductive plating layer extending along at least part of a horizontal surface of the stack outside of the blind hole and along at least part of a surface of the blind hole. A minimum thickness of the plating layer at a bottom of the blind hole is at least 8 m.
Laminate production method
Method of manufacturing laminate body by: curing thermosetting resin composition on a support; laminating the curable resin onto a substrate; heating the laminate; forming a via hole in the cured resin layer; peeling the supporting body from the cured composite; performing a second heating of the cured composite; removing resin residue in the via hole of the cured composite; and forming a conductor layer on an inner wall surface of the via hole by electroless plating or a combination of electroless plating and electrolytic plating.
METHOD FOR FORMING CIRCUITS USING SEED LAYER AND ETCHANT COMPOSITION FOR SELECTIVE ETCHING OF SEED LAYER
The present invention relates to a method for forming a circuit using a seed layer. The method for forming a circuit using a seed layer according to the present invention, may realize a fine pitch, increase the adhesion of the circuit, and prevent the migration phenomenon.
COUPLED VIA STRUCTURE, CIRCUIT BOARD HAVING THE COUPLED VIA STRUCTURE AND METHOD OF MANUFACTURING THE CIRCUIT BOARD
A coupled via structure includes a plate via penetrating through an board body and having first and second plates spaced apart from each other by a first gap distance, a contact pad connected to the plate via on a surface of the board body and having first and second contacts connected to the first and second plates, respectively, and a connection line connected to the contact pad on the surface of the board body and having first and second lines connected to the first and second contacts, respectively, and spaced apart from the first line by a second gap distance. Accordingly, the deviation of the characteristic impedance is reduced (or, alternatively, minimized) between the coupled via structure and the coupled signal line.
HERMETIC METALLIZED VIA WITH IMPROVED RELIABILITY
According to various embodiments described herein, an article comprises a glass or glass-ceramic substrate having a first major surface and a second major surface opposite the first major surface, and a via extending through the substrate from the first major surface to the second major surface over an axial length in an axial direction. The article further comprises a helium hermetic adhesion layer disposed on the interior surface; and a metal connector disposed within the via, wherein the metal connector is adhered to the helium hermetic adhesion layer. The metal connector coats the interior surface of the via along the axial length of the via to define a first cavity from the first major surface to a first cavity length, the metal connector comprising a coating thickness of less than 12 m at the first major surface. Additionally, the metal connector coats the interior surface of the via along the axial length of the via to define a second cavity from the second major surface to a second cavity length, the metal connector comprising a coating thickness of less than 12 m at the second major surface and fully fills the via between the first cavity and the second cavity.
Method of making a fusion bonded circuit structure
A method of making a fusion bonded circuit structure. Each major surface of an LCP substrate is provided with a seed layers of a conductive material. Resist layers are deposited on the seed layers. The resist layers are processed to create recesses corresponding to a desired circuitry layers on each side of the LCP substrate. The recesses expose portions of the seed layers of conductive material. The LCP substrate is electroplated to simultaneously create conductive traces defined by the first recesses on both sides of the LCP substrate. The resist layers are removed to reveal the conductive traces. The LCP substrate is etched to remove exposed portions of the seed layers adjacent the conductive traces. LCP layers are fusion bonded to the major surfaces of the LCP substrate to encapsulate the conductive traces in an LCP material. The LCP layers can be laser drilled to expose the conductive traces.
Methods of fast fabrication of single and multilayer circuit with highly conductive interconnections without drilling
Provided herein is a method to printed electronics, and more particularly related to printed electronics on flexible, porous substrates. The method includes applying a coating compound comprising poly (4-vinylpyridine) (P4VP) and SU-8 dissolved in an organic alcohol solution to one or more surface of a flexible, porous substrate, curing the porous substrate at a temperature of at least 130 C. such that the porous substrate is coated with a layer of said coating compound, printing a jet of a transition metal salt catalyst solution onto one or more printing sides of the flexible, porous substrate to deposit a transition metal salt catalyst onto the one or more printing sides, and submerging the substrate in an electroless metal deposition solution to deposit the metal on the flexible, porous substrate, wherein the deposited metal induces the formation of one or more three-dimensional metal-fiber conductive structures within the flexible, porous substrate.
METHOD OF MANUFACTURE FOR EMBEDDED IC CHIP DIRECTLY CONNECTED TO PCB
Methods and systems are contemplated for making portions of electrical circuits with embedded electrical components, and the electrical circuits produced thereby. A layer of dielectric material is deposited over a substrate, and a cavity is formed in the dielectric material. An electrical component (e.g., integrated chip, etc.) is deposited in the cavity and covered by a further dielectric material, embedding the electrical component. Another cavity is formed in the further dielectric material, and a catalyst (e.g., electrolytic deposition catalyst, electroless deposition catalyst, etc.) is deposited over the further dielectric material and at least a portion of the electrical component. A conductor is then plated at the catalyst, preferably contacting the I/O ports of the electrical component.
PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING THE SAME
A printed circuit board includes a printed wiring board, a semiconductor element, and conductive members. The printed wiring board includes an insulative substrate having a first surface and a second surface opposite to the first surface, and wiring provided on the second surface of the insulative substrate to face the through-holes. The insulative substrate has flexibility and through-holes passing through the insulative substrate from the first surface to the second surface. The semiconductor element is mounted on the first surface of the insulative substrate of the printed wiring board and has element terminals interposed between the printed wiring board and the semiconductor element. The conductive members filled in the through-holes connect the element terminals and the wiring.