An electronic package and a method for making an electronic package are provided. The electronic package comprises a substrate; a plurality of electronic components disposed on the substrate; and an encapsulant cap for encapsulating the substrate and the plurality of electronic components, wherein the encapsulant cap comprises a top surface having a first region and a second region; and wherein the first region has a first roughness, the second region has a second roughness greater than the first roughness.

A pattern forming apparatus according to an embodiment includes: a pre-alignment unit that performs pre-alignment for a substrate; a transfer unit that transfers the substrate into the pre-alignment unit; a placing table on which the substrate transferred into the pre-alignment unit is placed; a position detecting unit provided at a position included in the placing table and overlapping with an edge of the substrate, and adapted to detect a position of the edge of the substrate; and a control unit that calculates a positional displacement amount of the substrate from the position of the edge of the substrate detected by the position detecting unit, and controls the placing table on the basis of the positional displacement amount of the substrate to correct the position of the substrate.

An inkjet printing system and method for processing wafers in a high volume are disclosed. The inkjet printing system includes a chuck on which a wafer can be placed and an inkjet printing head with at least one nozzle. Each chuck is associated with a single camera. Each chuck includes a 2-dimensional visual reference. An electronic controller assembly is configured to take a single image containing the wafer edge and the 2-dimensional visual reference each instance a wafer has been placed on a chuck. For each image, the position of the chuck relative to the camera and the position of the wafer relative to the camera are determined. Subsequently, the wafer position relative to the chuck is calculated and based on that the firing of the at least one nozzle is timed and the movement of the printing motion assembly is controlled so that the liquid drops are accurately positioned on the wafer.

A method for making integrated circuit (IC) packages includes providing a leadframe strip having a plurality of leadframe units and providing the leadframe strip to an operating station. The operating station is operable to perform one or more tests on the plurality of leadframe units in the making of IC packages. The method includes obtaining a database that has the locations of leadframe units in the leadframe strip stored in the database. The method also includes performing the one or more tests on the plurality of leadframe units and updating the database in response to the results of the testing.

An apparatus includes a substrate; circuit components disposed on the substrate; and a location identifier layer over the circuit, wherein the location identifier layer includes one or more section labels for representing physical locations of the circuit components within the apparatus.

Multi-operation tools for photovoltaic cell processing are described. In an example, a multi-operation tool includes a conveyor system to move a photovoltaic (PV) cell continuously along a conveyor path through a laser scribing station and an adhesive printing station. Furthermore, the PV cell may be aligned to a laser head of the laser scribing station and a printer head of the adhesive printing station in a single alignment operation prior to being laser scribed and printed with an adhesive in a continuous process.

A method for manufacturing a semiconductor wafer including: slicing off a plurality of wafers from an ingot; chamfering outer peripheral portions of the plurality of sliced wafers; and performing double-side polishing to polish both surfaces of each wafer whose outer peripheral portion is held by a carrier, wherein includes performing warp direction adjustment to uniform directions of warps of the plurality of wafers in one direction after the slicing and before the chamfering, and the chamfering and the double-side polishing are performed in a state where the directions of the warps of the plurality of wafers are uniformed in one direction after the warp direction adjustment. Consequently, it is possible to provide the method for manufacturing a semiconductor wafer which can suppress degradation of flatness of the double-side polished wafers even in case of uniforming the directions of the warps of the wafers in one direction before the double-side polishing.

Inkjet printing system for processing substrates including a chuck for placement of a substrate and an inkjet printing head with at least one nozzle. Each chuck has chuck reference marks, each of which is associated with an associated camera. An electronic controller assembly is configured to take a set of images each instance a substrate having substrate reference marks has been placed on a chuck, with each image containing a chuck reference mark and a substrate reference mark. For each image, the position of the chuck relative to the camera and the position of the substrate relative to the camera is determined. Subsequently, the substrate position relative to the chuck is calculated and based thereon the firing of the at least one nozzle is timed and the movement of the printing motion assembly is controlled so that the liquid drops are accurately positioned on the substrate.

Provided is an apparatus and method for correcting a marking position, in which, by measuring and correcting a marking position by using a processing film for position correction, marking may be accurately performed on a position on a semiconductor chip during a marking operation, before a marking operation is performed on semiconductor chips provided on a wafer. The apparatus for correcting a marking position of a wafer includes a support configured to support a processing film for position correction, a laser head configured to emit a laser beam to the processing film for position correction to form a pattern, a vision camera configured to obtain pattern position information, a movable table configured to move the support in a horizontal direction, and a controller configured to compare and match the pattern position information and marking position information set in the laser head.

The present disclosure relates a lithographic substrate marking tool. The tool includes a first electromagnetic radiation source disposed within a housing and configured to generate a first type of electromagnetic radiation. A radiation guide is configured to provide the first type of electromagnetic radiation to a photosensitive material over a substrate. A second electromagnetic radiation source is disposed within the housing and is configured to generate a second type of electromagnetic radiation that is provided to the photosensitive material.