The present invention provides a substrate holding member comprising: a first holding member; a second holding member that cooperates with the first holding member to hold the substrate therebetween; and a transparent portion provided in at least one of the first and second holding members.

A conveyance system for conveying a workpiece to each of a plurality of processing apparatuses includes a conveyance passage, an automated conveying vehicle for travelling on the conveyance passage, the automated conveying vehicle including a workpiece storage member, travelling mechanisms, and a receiver, a stock unit including a storage member holding base and a receiver, and a storage member conveying unit for conveying the workpiece storage member between a region of the conveyance passage above the stock unit and the storage member holding base or between a region of the conveyance passage above the processing apparatus and the inside of the processing apparatus.

A substrate processing system is disclosed which includes a processing chamber comprising a susceptor having a first surface and a second surface opposite to the first surface, a groove formed in the first surface adjacent to a perimeter thereof, and a substrate support structure including a plurality of carrier lift pins, each of the plurality of carrier lift pins movably disposed in an opening formed from the second surface to the first surface, wherein the opening is recessed from the groove.

A substrate supporting apparatus (300) for cleaning a back side of a substrate (107) is provided. The substrate supporting apparatus (300) has a hollow shaft (319) and a rotary spindle (303). The rotary spindle (303) is set in the hollow shaft (319) and a spacing is formed between an outer wall of the rotary spindle (303) and an inner wall of the hollow shaft (319). The outer wall of the rotary spindle (303) defines a blocking wall (322) and a recess (324) to prevent particles in the spacing from entering a gas groove (325) which is formed on the hollow shaft (319) and supplies gas to a front side of the substrate (107), avoiding the particles contaminating the front side of the substrate (107), which improves the quality of semiconductor devices.

There is provided a substrate holding apparatus including a base provided with a gap and a reflection member disposed in the gap and configured to reflect light that has transmitted the substrate to the substrate side, and an exposure apparatus including the substrate holding apparatus.

A semiconductor manufacturing apparatus, including a chip supply module used for providing a plurality of chips; a load plate supply module including a load plate and a load-plate motion platform used for holding the load plate; a chip transfer-loading module including a chip transfer-loading platform used for suctioning chips. The chip transfer-loading platform is used at a first position for transferring chips from the chip supply module. The chip transfer-loading platform carries the chips to a second position to bond the chips onto a load plate to form a bonding sheet. A packaging module is used for packaging the bonding plate on the load-plate motion platform to form a packaged chip.

Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. In one embodiment, a major axis of the processing volume is oriented vertically and a minor axis of the processing volume is oriented horizontally. One or more electrodes may be disposed adjacent the processing volume and at least partially define the processing volume. Process fluid is provided to the processing volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A plurality of seals maintains the fluid containment integrity of the processing volume during processing. A post process chamber for rinsing, developing, and drying a substrate is also provided.

A substrate processing system is disclosed which includes a substrate input/output chamber coupled to a transfer chamber, and one or more processing chambers coupled to the transfer chamber, wherein the substrate input/output chamber includes a plurality of stacked carrier holders, and a platen, wherein the platen includes a plurality of alignment pads and a plurality of openings formed in a recessed flange along a peripheral edge of the platen.

There is provided a conveyance system that conveys a workpiece to each of plural processing apparatuses. The conveyance system includes a conveyance passage, an automated workpiece conveying vehicle that travels on the conveyance passage, a stock unit, and a control unit. The conveyance passage is set in a space directly above the processing apparatus across the plural processing apparatuses. The stock unit includes a workpiece conveying part that conveys the workpiece between a workpiece stocker that houses the workpiece supplied to the processing apparatus and the automated workpiece conveying vehicle.

A transport system includes an overhead transport vehicle that travels on a first track and is capable of delivering and receiving an article to and from a load port of a processing tool; a storage rack having a plurality of shelves that store the articles arranged in a vertical direction; a crane that travels on a second track parallel with the first track and is capable of delivering and receiving the article to and from the load port and the storage rack, respectively; and a first buffer arranged at a position where the crane that has stopped traveling at a position to deliver or receive the article to or from the load port is able to deliver or receive the article.