H01L21/82

LIGHT-EMITTING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND LIGHT-EMITTING APPARATUS
20220310957 · 2022-09-29 ·

A light-emitting substrate includes a base; a first material layer and a second material layer that are disposed on the base, and an etch stop layer between the first material layer and the second material layer. The first material layer is closer to the base than the second material layer. The second material layer includes a plurality of patterns, and each pattern and the first material layer have an overlapping region therebetween. The etch stop layer includes at least portions in respective overlapping regions. A portion of the etch stop layer located in each overlapping region is in contact with the first material layer and the second material layer. Energy level(s) of the portion of the etch stop layer located in each overlapping region are matched with energy levels of the first material layer and the second material layer at corresponding positions.

DIRECTED SELF-ASSEMBLY OF ELECTRONIC COMPONENTS USING DIAMAGNETIC LEVITATION
20170229330 · 2017-08-10 ·

Embodiments of the invention relate generally to directed self-assembly (DSA) and, more particularly, to the DSA of electronic components using diamagnetic levitation.

DIRECTED SELF-ASSEMBLY OF ELECTRONIC COMPONENTS USING DIAMAGNETIC LEVITATION
20170229330 · 2017-08-10 ·

Embodiments of the invention relate generally to directed self-assembly (DSA) and, more particularly, to the DSA of electronic components using diamagnetic levitation.

Semiconductor device assembly with through-package interconnect and associated systems, devices, and methods
11456286 · 2022-09-27 · ·

Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.

Semiconductor device assembly with through-package interconnect and associated systems, devices, and methods
11456286 · 2022-09-27 · ·

Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.

Hybrid wide-bandgap semiconductor bipolar switches

A hybrid semiconductor bipolar switch in which a normally-on high-voltage wide-bandgap semiconductor bipolar switch and a normally-off field effect transistor are connected in a cascode (Baliga-pair) configuration. The switch may be constructed as a stacked hybrid device where a discrete transistor is bonded on top of a bipolar switch. Power systems may use plural switches paired with anti-parallel diodes.

Semiconductor structure and manufacturing method thereof

A semiconductor structure includes a first fin, a second fin, a first gate, a second gate, at least one spacer, and an insulating structure. The first gate is present on the first fin. The second gate is present on the second fin. The spacer is present on at least one side wall of at least one of the first gate and the second gate. The insulating structure is present between the first fin and the second fin, in which the spacer is substantially absent between the insulating structure and said at least one of the first gate and the second gate.

Semiconductor device including stacked circuits

This invention provides a semiconductor device with high speed operation and reduced size. A circuit includes a circuit including a memory circuit and a circuit including a logic circuit; thus, the circuit functions as a memory device having a function of storing data and a function of performing logic operation. The circuit can output, in addition to data stored in the circuit, data corresponding to a result of logic operation performed using data stored in the circuit as an input signal. The circuit can directly obtain a result of logic operation from the circuit, and thus, the frequency of input/output of a signal performed between the circuit and the circuit can be reduced.

Semiconductor device having a fuse element

A corrosion resistant semiconductor device includes fuse elements that can be cut by laser light. An upper portion of the fuse elements is covered with a porous insulating film so that, when laser light irradiated from a rear surface of a semiconductor substrate is collected at selected fuse elements, the fuse elements generate heat, expand, and rupture. A metal lattice having a plurality of windows is disposed over the fuse elements to permit rapid expansion of the fuse elements when irradiated with the laser light. Alternatively, a metal array having a plurality of independent light-shielding portions may be disposed over the fuse elements to prevent the laser light from adversely affecting circuitry on the front surface side of the semiconductor device.

INTEGRATED CIRCUIT PACKAGE HAVING PIN UP INTERCONNECT
20170323830 · 2017-11-09 ·

An integrated circuit package and manufacturing method thereof are described. The integrated circuit package includes pin up conductive plating to form an interconnect, where an opening on a patterned fifth layer photo-resist material located at bottom portion of a base developed for etching selectively the base to form at least an internal opening and at least a positioning opening, wherein the internal opening corresponds with an inside area of a first patterned conductive layer, and the positioning opening corresponds with an outside area of the first patterned conductive layer.