H01L23/296

CURABLE SILICONE COMPOSITION AND OPTICAL SEMICONDUCTOR DEVICE
20200385579 · 2020-12-10 ·

A curable silicone composition is disclosed. The composition comprises: (A) an organopolysiloxane having at least two alkenyl groups in a molecule; (B) an organopolysiloxane having at least two silicon atom-bonded hydrogen atoms in a molecule; (C) a polyether-modified silicone comprising repeating units represented by a general formula herein and having a number average molecular weight of 1,000 to 100,000; and (D) a hydrosilylation catalyst. The composition can be used to form an optical semiconductor device having minimal contamination of a case during manufacturing of the optical semiconductor device, good efficiency of light extraction from a light emitting element, and minimal color unevenness or chromaticity deviation. The optical semiconductor device notable in that a light emitting element is sealed or covered by a cured material of the composition, in addition to having minimal contamination of a case, good efficiency of light extraction, and minimal color unevenness or chromaticity deviation.

THERMOSETTING COMPOSITION FOR USE AS UNDERFILL MATERIAL, AND SEMICONDUCTOR DEVICE

A thermosetting composition for use as an underfill material contains: a mono- or bifunctional acrylic compound; a thermo-radical polymerization initiator; silica; and an elastomer including a 1,2-vinyl group. The thermosetting composition is liquid and has a property of turning, when cured thermally, into a cured product having a relative dielectric constant of 3.2 or less at 25 C. and a dielectric loss tangent of 0.013 or less at 25 C.

BLOCK COPOLYMER AND METHOD OF PRODUCING SAME, EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF, AND SEMICONDUCTOR ENCAPSULATING MATERIAL

A polysiloxane-polyalkylene glycol block copolymer is obtained by reacting a polysiloxane (A) having any functional group selected from a carboxylic anhydride group, a hydroxyl group, an epoxy group, a carboxyl group, and an amino group with a polyalkylene glycol (B) having any functional group selected from a carboxylic anhydride group, a hydroxyl group, a carboxyl group, an amino group, an epoxy group, a thiol group, and an isocyanate group, wherein a content of a structure derived from the polysiloxane (A) is 20% by mass or more and 90% by mass or less with respect to 100% by mass of the polysiloxane-polyalkylene glycol block copolymer.

Semiconductor-encapsulating epoxy resin composition and semiconductor device

An epoxy resin composition comprising an epoxy resin, a curing agent, (A) a carboxyl-containing benzotriazole derivative, and (B) an alkoxysilyl-containing aminoalkylsilane derivative is suited for encapsulating semiconductor devices. The sum of (A)+(B) is 0.5-5.0 pbw per 100 pbw of the sum of the epoxy resin and the curing agent, and a molar ratio (A)/(B) is 0.5-1.5. The composition is free of sulfur and highly adhesive to metal substrates.

BONDING WIRE FOR SEMICONDUCTOR DEVICE
20200373226 · 2020-11-26 ·

Provided is a Pd coated Cu bonding wire for a semiconductor device capable of sufficiently obtaining bonding reliability of a ball bonded portion in a high temperature environment of 175 C. or more, even when the content of sulfur in the mold resin used in the semiconductor device package increases.

The bonding wire for a semiconductor device comprises a Cu alloy core material; and a Pd coating layer formed on a surface of the Cu alloy core material; and contains 0.03 to 2% by mass in total of one or more elements selected from Ni, Rh, Ir and Pd in the bonding wire and further 0.002 to 3% by mass in total of one or more elements selected from Li, Sb, Fe, Cr, Co, Zn, Ca, Mg, Pt, Sc and Y. The bonding wire can be sufficiently obtained bonding reliability of a ball bonded portion in a high temperature environment of 175 C. or more, even when the content of sulfur in the mold resin used in the semiconductor device package increases by being used.

MANUFACTURING METHOD OF MOUNTING STRUCTURE, AND SHEET THEREFOR

A manufacturing method of a mounting structure, the method including: a step of preparing a mounting member including a first circuit member and a plurality of second circuit members placed on the first circuit member via bumps, the mounting member having a space between the first circuit member and the second circuit member; a step of preparing a sheet having a space maintaining layer; a disposing step of disposing the sheet on the mounting member such that the space maintaining layer faces the second circuit members; and a sealing step of pressing the sheet against the first circuit member and heating the sheet, to seal the second circuit members so as to maintain the space, and to cure the sheet. The bumps are solder bumps. The space maintaining layer after curing has a glass transition temperature of higher than 125 C., and a coefficient of thermal expansion at 125 C. or lower of 20 ppm/K or less.

SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING SEMICONDUCTOR PROCESSING MATERIAL, AND SEMICONDUCTOR DEVICE

Provided is a composition for forming a film for semiconductor devices, including: a compound (A) including a SiO bond and a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom; a crosslinking agent (B) which includes three or more C(O)OX groups (X is a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms) in the molecule, in which from one to six of three or more C(O)OX groups are C(O)OH groups, and which has a weight average molecular weight of from 200 to 600; and a polar solvent (D).

A CURABLE ORGANOPOLYSILOXANE COMPOSITION AND A PROTECTANT OR ADHESIVE COMPOSITION OF ELECTRIC/ELECTRONIC PARTS
20200347229 · 2020-11-05 ·

Provided is a curable organopolysiloxane composition which has a particularly excellent effect of improving initial adhesiveness in small amounts and a thin layer with respect to various base materials, in addition to being able to achieve particularly excellent adhesive durability and high adhesive strength after curing. The curable organopolysiloxane composition comprises: (A) an organopolysiloxane having at least two alkenyl groups per one molecule; (B) a trialcoxysilyl containing siloxane having one silicon atom-bonded hydrogen atom and at least one trialcoxysilyl group per one molecule; (C) a chain or cyclic organopolysiloxane having at least two silicon atom-bonded hydrogen atoms per one molecule; (D) a chain organopolysiloxane having at least three silicon atom-bonded hydrogen atoms per one molecule; (E) a catalyst for a hydrosilylation reaction; (F) a catalyst for a condensation reaction; and (G) an adhesion promoter.

CURABLE POLYORGANOSILOXANE COMPOSITION, CURED BODY OBTAINED BY CURING SAID COMPOSITIONS, AND ELECTRONIC DEVICE COMPRISING THE SAME
20200347230 · 2020-11-05 ·

The present disclosure relates to a light curable, light-heat or light-moisture dually curable, or light-heat-moisture multiple curable polyorganosiloxane composition, which has ease of synthesis, low volatile content, rapid curability, excellent toughness and/or superior optical/physical stability in a variety of fields such as coating materials, encapsulants, sealants and adhesives, a cured body obtained by curing said compositions, and an electronic device comprising the same.

Semiconductor package system and related methods

Implementations of a semiconductor package may include: a substrate, a case coupled to the substrate, and a plurality of press-fit pins. The plurality of press-fit pins may be fixedly coupled with the case. The plurality of press-fit pins may have at least one locking portion that extends from a side of the plurality of press-fit pins into the case and the plurality of press-fit pins may be electrically and mechanically coupled to the substrate.