An electronic device has a fuse circuit including a semiconductor die and first and second bond wires, the semiconductor die having a bond pad and a fuse, the fuse having first and second portions, the bond pad coupled to the first portion of the fuse, and the second portion of the fuse coupled to a protected circuit, the first bond wire having a first end coupled to the bond pad and a second end coupled to a conductive terminal, and the second bond wire having a first end coupled to the second end of the first bond wire and a second end coupled to the conductive terminal.

Multi-layer integrated circuits having isolation cells for layer testing and related methods are disclosed. According to an aspect, an integrated circuit includes first and second layers that each have one or more electronic components. One or more electronic components of each layer can be electrically connected by a first via and a second via. The integrated circuit also includes an isolation cell operatively connected between the first via and the second via. The isolation cell is configured to controllably break electrical connection between the first via and the second via subsequent to testing of the at least one electronic component of the second layer. Example isolation cells include, but are not limited to, electronic fuses and tri-state flip-flops.

A three-dimensional (3D) inductor structure comprising: a first semiconductor die including: a first conductive pattern; and a second conductive pattern spaced apart from the first conductive pattern; a second semiconductor die stacked on the first semiconductor die, the second semiconductor die including: a third conductive pattern; a fourth conductive pattern spaced apart from the third conductive pattern; a first through-substrate via (TSV) penetrating the second semiconductor die and electrically connecting the first conductive pattern with the third conductive pattern; and a second TSV penetrating the second semiconductor die and electrically connecting the second conductive pattern with the fourth conductive pattern, and a first conductive connection pattern included in the first semiconductor die and electrically connecting a first end of the first conductive pattern with a first end of the second conductive pattern, or included in the second semiconductor die and electrically connecting a first end of the third conductive pattern with a first end of the fourth conductive pattern.

A semiconductor structure includes a resistance tunable fuse stack structure. A fabrication method for forming the same includes forming on a substrate layer a first fuse conductive layer, directly on, and contacting a top surface of, the substrate layer, followed by forming a first inter-layer dielectric (ILD) layer, directly on, and contacting a top surface of, the first fuse conductive layer. The method forms a second fuse conductive layer, directly on, and contacting a top surface of, the first ILD layer, followed by forming a second ILD layer, directly on, and contacting a top surface of, the second fuse conductive layer, the layers are interleaved in a stack forming a fuse stack structure. First and second fuse contacts are formed in the fuse stack structure vertically extending through the layers and contacting the first and second fuse conductive layers. Selection of various attributes of the fuse stack structure tunes a resistance of a fuse formed between the first and second fuse contacts in the fuse stack structure.

Disclosed is a method of designing and fabricating a semiconductor chip including a fuse cell. The method may include preparing a semiconductor chip layout, the semiconductor chip layout including a main chip layout and a scribe lane layout enclosing the main chip layout; disposing a fuse layout in the scribe lane layout; setting the main chip layout as a first data preparation region; setting the scribe lane layout and the fuse layout as a second data preparation region; obtaining a first resulting structure and a second resulting structure, respectively, by performing a data preparation process on the first and second data preparation regions; merging the first and second resulting structures to generate mask data; manufacturing a photomask, based on the mask data; and forming semiconductor chips on a wafer using the photomask.

The present disclosure provides a method for manufacturing a fuse component having a three-dimensional (3D) structure. The method includes providing an active region, forming a first recess region and a second recess region in the active region, disposing a fuse dielectric material in the first recess region and the second recess region, and filling the first recess region and the second recess region with a gate metal material.

A semiconductor structure includes a first electrode; a second electrode; a dielectric material between the first electrode and the second electrode, the dielectric material having at least one wall extending from the first electrode to the second electrode to define a void within the dielectric material and between the first electrode and the second electrode; and a layer of phase change material on the at least one wall of the dielectric material and in contact with the first electrode and the second electrode.

A fuse component and a semiconductor device and a semiconductor device having the fuse component are provided. The fuse component includes an active region having a surface, a first fuse dielectric layer extending from the surface of the active region into the active region, a first gate metal layer surrounded by the first fuse dielectric layer, a second fuse dielectric layer extending from the surface of the active region into the active region, and a second gate metal layer surrounded by the second fuse dielectric layer. The first gate metal layer is electrically connected with the second gate metal layer.

A method for producing semiconductor devices including an electrical fuse (e-fuse) and the resulting device are provided. Embodiments include forming a gate electrode (PC); forming at least one gate contact (CB) over the PC; forming at least one source/drain contact (CA); and forming an e-fuse including a resistor metal (RM) between at least one CB and an equal number of CAs to dissipate heat generated by the PC.

An integrated circuit includes a first terminal that is connected to a first end of a first capacitor, the first capacitor being included in a resonant circuit, a second terminal that is connected to a second end of the first capacitor, a plurality of second capacitors connected in parallel between the first and second terminals, and a control circuit which, in operation, changes a capacitance of each of the second capacitors. An electronic pen includes the integrated circuit and a first capacitor having a capacitance that varies based on pressure applied to a nib of the electronic pen.