Methods, systems and apparatus for memory devices with discharging circuits are provided. In one aspect, a semiconductor device includes a semiconductor substrate, one or more discharging circuits arranged on the semiconductor substrate, one or more common source line (CSL) layers conductively coupled to the one or more discharging circuits, and a memory array having a three-dimensional (3D) array of memory cells arranged in a plurality of vertical channels on the one or more CSL layers. Each of the plurality of vertical channels includes a respective string of memory cells, and each of the one or more CSL layers is conductively coupled to corresponding strings of memory cells. Each of the one or more discharging circuits includes one or more transistors that are disabled by one or more corresponding conductive lines through the memory array.

Power MOS device, in which a power MOS transistor has a drain terminal that is coupled to a power supply node, a gate terminal that is coupled to a drive node and a source terminal that is coupled to a load node. A detection MOS transistor has a drain terminal that is coupled to a detection node, a gate terminal that is coupled to the drive node and a source terminal that is coupled to the load node. A detection resistor has a first terminal coupled to the power supply node and a second terminal coupled to the detection node.

A clamping circuit comprises a first field-effect transistor (FET) having a gate, a source, and a drain, a diode, a first voltage source, and coupling circuitry configured to couple the first voltage source to the drain of the first FET and the diode to the source of the first FET.

Circuits and methods for protecting a device are provided. A first device to be protected includes a gate dielectric of a first thickness. A second device includes a gate dielectric of a second thickness that is less than the first thickness. A gate is shared by the first device and the second device.

A method for producing a 3D semiconductor device: providing a first level with a first single crystal layer; forming a plurality of first transistors in and/or on the first level with a first metal layer above; forming a second metal layer above the first metal layer; forming a third metal layer above the second metal layer; forming at least one second level on top of or above the third metal layer; performing a first etch step; performing additional processing steps to form a plurality of second transistors within the second level; forming a fourth metal layer above; forming a connection to the second metal layer which includes a via through the second level; forming a fifth metal layer above, where some second transistors include a metal gate, and the fifth metal layer thickness is at least 50% greater than the second metal layer thickness.

A display module includes a thin film transistor (TFT) substrate including a glass substrate, a TFT layer provided on the glass substrate, and a plurality of TFT electrodes provided on the TFT layer; and a plurality of light-emitting diodes (LEDs) electrically connected to the plurality of TFT electrodes, wherein the TFT layer includes a plurality of sacrificial switching elements connected to the plurality of LEDs in parallel and configured to absorb static electricity generated at the TFT layer.

Reference clock CMOS input buffer with self-calibration and improved ESD performance. In one embodiment, a reference clock input buffer of an image sensor includes a Schmitt trigger configured to generate a clock signal having a falling edge and a rising edge. The falling edge and the rising edge are separated by a hysteresis voltage. The Schmitt trigger includes a plurality of output switches and a plurality of voltage control switches that are individually coupled to individual output switches [M2-i] of the plurality of output switches. Voltage of the falling edge signal or the rising edge signal of the Schmitt trigger is adjustable by selectively switching at least one voltage control switch of the plurality of voltage control switches.

Devices and methods prevent injection of a substrate current into the substrate Sub of a CMOS circuit. The devices detect the potential of a contact of the integrated CMOS circuit, compare the value of the potential detected with a reference value and connect the contact to a leakage circuit node for discharging the current such that same does not flow to ground via the parasitic bipolar lateral structure. The leakage circuit node can be connected to the reference potential line or to another line that has a higher potential than the reference potential line. This electrical connection is activated when the value of the potential of the contact is lower than or equal to a reference value.

Various embodiments of the present disclosure are directed towards a semiconductor device. The semiconductor device comprises a source region and a drain region in a substrate and laterally spaced. A gate stack is over the substrate and between the source region and the drain region. The drain region includes two or more first doped regions having a first doping type in the substrate. The drain region further includes one or more second doped regions in the substrate. The first doped regions have a greater concentration of first doping type dopants than the second doped regions, and each of the second doped regions is disposed laterally between two neighboring first doped regions.

A 3D device includes a first level including a first single crystal layer with control circuitry, where the control circuitry includes first single crystal transistors; a first metal layer atop first single crystal layer; a second metal layer atop the first metal layer; a third metal layer atop the second metal layer; second level (includes a plurality of second transistors) atop the third metal layer; a fourth metal layer disposed above the one second level; a fifth metal layer atop the fourth metal layer, where the second level includes at least one first oxide layer overlaid by a transistor layer and then overlaid by a second oxide layer; a global power distribution grid, which includes the fifth metal layer; a local power distribution grid, which includes the second metal layer, the thickness of the fifth metal layer is at least 50% greater than the thickness of the second metal layer.