The present disclosure provides embodiments of semiconductor devices. A semiconductor device according to the present disclosure include an elongated semiconductor member surrounded by an isolation feature and extending lengthwise along a first direction, a first source/drain feature and a second source/drain feature over a top surface of the elongated semiconductor member, a vertical stack of channel members each extending lengthwise between the first source/drain feature and the second source/drain feature along the first direction, a gate structure wrapping around each of the channel members, an epitaxial layer deposited on the bottom surface of the elongated semiconductor member, a silicide layer disposed on the epitaxial layer, and a conductive layer disposed on the silicide layer.

A semiconductor device is provided in which a zener diode having a desired breakdown voltage and a capacitor in which voltage dependence of capacitance is reduced are mounted together, and various circuits are realized. The semiconductor device includes: a semiconductor layer; a first conductivity type well that is arranged in a first region of the semiconductor layer; a first conductivity type first impurity diffusion region that is arranged in the well; a first conductivity type second impurity diffusion region that is arranged in a second region of the semiconductor layer; an insulating film that is arranged on the second impurity diffusion region; an electrode that is arranged on the insulating film; and a second conductivity type third impurity diffusion region that is arranged at least on the first impurity diffusion region.

An electronic device, e.g. integrated circuit, has an n-type region and a p-type region located within a semiconductor substrate, the n-type region and the p-type region each intersecting the substrate surface. A dielectric structure is located directly on the substrate surface. The dielectric structure has first and second laterally opposed sides, with the first side located over the n-type region and the second side located over the p-type region.

A rectifier diode encapsulation structure with common electrodes, comprises an encapsulation assembly with common electrodes, the encapsulation assembly with common electrodes comprises an encapsulation with a common anode and an encapsulation with a common cathode; the encapsulation with the common anode and the encapsulation with the common cathode both comprise two rectifier diodes and a encapsulation body covering outside of the rectifier diodes, and the encapsulation body is provided with three pins, in the encapsulation with a common anode one of the pins is electrically connected to the anode of the two rectifier diodes, the other two pins are electrically connected to the cathodes of the two rectifier diodes one-to-one respectively. The disclosure reduces the volume of the encapsulation by separating the traditional rectifier components, saves materials, reduces costs and makes the application more flexible.

The independent claims of this patent signify a concise description of embodiments. Roughly described, a physically unclonable function (PUF) device includes a crystalline substrate and a stack of crystalline layers on top. The stack is grown epitaxially such that lattice mismatch causes threading dislocations from the substrate to the top surface of the stack. Diodes are formed on the top surface by forming anode material on the top surface of the stack, thereby forming a diode junction with a cathode region below. A diode which includes a threading dislocation has a higher leakage current than one that does not. Circuitry connected to the diodes interrogates the array and outputs binary values indicating, for each of the diodes, whether the diode includes a threading dislocation. Such binary values can be used as the PUF of the chip. This Abstract is not intended to limit the scope of the claims.

A semiconductor device includes “n” pairs of pn-junction structures, wherein the i-th pair includes two pn-junction structures of the i-th type, wherein the two pn-junction structures of the i-th type are anti-serially connected, wherein the pn-junction structure of the i-th type has an i-th junction grading coefficient m.sub.i. A first pair of the n pairs of pn-junction structures has a first junction grading coefficient m.sub.1 and a second pair of the n pairs of pn-junction structures has a second junction grading coefficient m.sub.2. The junction grading coefficients m.sub.1, m.sub.2 are adjusted to result in generation of a spurious third harmonic signal of the semiconductor device with a signal power level, which is at least 10 dB lower than a reference signal power level of the spurious third harmonic signal obtained for a reference case in which the first and second junction grading coefficients m.sub.1, m.sub.2 are 0.25.

A TVS circuit having a first diode with a cathode coupled to a first terminal and an anode coupled to a first node. A second diode has an anode coupled to a second node and a cathode coupled to a third node. A third diode is coupled between the first node and second node. A fourth diode is coupled between the first node and third node. A fifth diode is coupled between the second node and a second terminal. A sixth diode is coupled between the second terminal and the third node. A seventh diode can be coupled between the second terminal and an intermediate node between the fifth diode and sixth diode. The first diode is disposed on a first semiconductor die, while the second diode is disposed on a second semiconductor die. Alternatively, the first diode and second diode are disposed on a single semiconductor die.

A semiconductor device includes “n” pairs of pn-junction structures, wherein the i-th pair includes two pn-junction structures of the i-th type, wherein the two pn-junction structures of the i-th type are anti-serially connected, wherein the pn-junction structure of the i-th type has an i-th junction grading coefficient m.sub.i. A first pair of the n pairs of pn-junction structures has a first junction grading coefficient m.sub.1 and a second pair of the n pairs of pn-junction structures has a second junction grading coefficient m.sub.2. The junction grading coefficients m.sub.1, m.sub.2 are adjusted to result in generation of a spurious third harmonic signal of the semiconductor device with a signal power level, which is at least 10 dB lower than a reference signal power level of the spurious third harmonic signal obtained for a reference case in which the first and second junction grading coefficients m.sub.1, m.sub.2 are 0.25.

A device includes a substrate having a top surface and a bottom surface. A first doping well having a first part and a second part is located in the substrate. An undoped moat is in the substrate between the first doping well and a second doping well. A diode includes an anode with an increased first doping concentration region in the first doping well and a cathode with an increased second doping concentration region in the second doping well. An isolation region is in the first doping well having a first portion proximate the top surface and a second portion distal to the top surface. A gap made of an undoped region is in the first doping well between the first part and the second part. The gap is located between the distal portion of the isolation region and the bottom surface of the substrate.

An eighth semiconductor portion is provided between the first semiconductor portion and the third semiconductor portion. The eighth semiconductor portion is of the second conductivity type, contacting the first semiconductor portion, and having a lower second-conductivity-type impurity concentration than the second semiconductor portion.