The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first resistive random access memory (RRAM) element over a substrate. The first RRAM element has a first terminal and a second terminal. A second RRAM element is arranged over the substrate and has a third terminal and a fourth terminal. The third terminal is electrically coupled to the first terminal of the first RRAM element. A reading circuit is coupled to the second terminal and the fourth terminal. The reading circuit is configured to read a single data state from both a first non-zero read current received from the first RRAM element and a second non-zero read current received from the second RRAM element.

Embodiments of three-dimensional (3D) memory devices having multiple memory stacks and methods for forming the 3D memory devices are disclosed. In an example, a 3D memory device includes a first device chip, a second device chip, and a bonding interface. The first device chip includes a peripheral device and a first interconnect layer. The second device chip includes a substrate, two memory stacks disposed on opposite sides of the substrate, two memory strings each extending vertically through one of the two memory stacks, and a second interconnect layer. The bonding interface is formed vertically between the first interconnect layer of the first device chip and the second interconnect layer of the second device chip.

Embodiments disclosed herein may relate to electrically conductive vias in cross-point memory array devices. In an embodiment, the vias may be formed using a lithographic operation also utilized to form electrically conductive lines in a first electrode layer of the cross-point memory array device.

A semiconductor device package is described that includes a power consuming device (such as an SOC device). The power consuming device may include one or more current consuming elements. A passive device may be coupled to the power consuming device. The passive device may include a plurality of passive elements formed on a semiconductor substrate. The passive elements may be arranged in an array of structures on the semiconductor substrate. The power consuming device and the passive device may be coupled using one or more terminals. The passive device and power consuming device coupling may be configured in such a way that the power consuming device determines functionally the way the passive device elements will be used.

A method of forming an array of cross point memory cells comprises using two, and only two, masking steps to collectively pattern within the array spaced lower first lines, spaced upper second lines which cross the first lines, and individual programmable devices between the first lines and the second lines where such cross that have an upwardly open generally U-shape vertical cross-section of programmable material laterally between immediately adjacent of the first lines beneath individual of the upper second lines. Arrays of cross point memory cells independent of method of manufacture are disclosed.

In the present invention, lower electrodes (101, 102) are disposed at a period d1 in an X direction and at a period d2 in a Y direction. Upper electrodes (102) are disposed so as to be shifted by half the length of the period (d1) in the X direction with respect to the lower electrodes (101), and are disposed so as to be shifted by half the length of the period (d2) in the Y direction with respect to the lower electrodes (101). Each pair of a lower electrode (101) and an upper electrode (102), which face each other and capacitively couple with each other, form a capacitor cell (C). Cell terminals (103, 104) are disposed at the period (d1) in the X direction, disposed at the period (d2) in the Y direction, and respectively electrically connected to the lower electrodes (101) and the upper electrodes (102). The cell terminals (104) are disposed so as to be shifted by half the length of the period (d1) in the X direction with respect to the cell terminals (103), and are disposed so as to be shifted by half the length of the period (d2) in the Y direction with respect to the cell terminals (103).

A method includes: providing a modulation circuit, determined an operation mode of a memory array, providing a first voltage corresponding to a positive temperature coefficient in response to a read operation of the memory array, and providing a second voltage corresponding to a negative temperature coefficient in response to a write operation of the memory array. The modulation circuit is configured to generate a temperature-dependent voltage and provide the same to the memory array.

A method for manufacturing a high-profile capacitor with high capacity includes providing a substrate, forming a first mold layer, a first supporter layer, a second mold layer, and a second supporter layer on the substrate, where at least one of the first mold layer and the second mold layer are made of a dielectric material having a low or super low dielectric constant, defining at least one contact hole, where the now-surrounding first and second supporter layers reinforce the at least one contact hole and form first and second supporter patterns respectively, forming a lower electrode on an inner surface of the at least one contact hole, and removing the first mold layer and/or the second mold layer being made of the dielectric material by ashing.

A capacitive element of an integrated circuit includes first and second electrodes. The first electrode is formed by a first electrically conductive layer located above a semiconductor well doped with a first conductivity type. The second electrode is formed by a second electrically conductive layer located above the first electrically conductive layer of the semiconductor well. The second electrode is further formed by a doped surface region within the semiconductor well that is heavily doped with a second conductivity type opposite the first conductivity type, wherein the doped surface region is located under the first electrically conductive layer. An inter-electrode dielectric area electrically separates the first electrode and the second electrode.

A semiconductor device includes a lower electrode structure, an upper electrode structure, and a dielectric layer between the lower and upper electrode structures and on side surfaces and an upper surface of the lower electrode structure. The lower electrode structure includes a first lower electrode pattern having a cylindrical shape, a barrier layer on the first lower electrode pattern, and a second lower electrode pattern in a space defined by the barrier layer.