Transistor structures including a non-planar body that has an active portion comprising a semiconductor material of a first height that is variable, and an inactive portion comprising an oxide of the semiconductor material of a second variable height, complementary to the first height. Gate electrodes and source/drain terminals may be coupled through a transistor channel having any width that varies according to the first height. Oxidation of a semiconductor material may be selectively catalyzed to convert a desired portion of a non-planar body into the oxide of the semiconductor material. Oxidation may be enhanced through the application of a catalyst, such as one comprising metal and oxygen, for example.

To provide a semiconductor device with less variations in characteristics. The semiconductor device includes a first circuit region and a second circuit region over a substrate, where the first circuit region includes a plurality of first transistors and a first insulator over the plurality of first transistors; the second circuit region includes a plurality of second transistors and a second insulator over the plurality of second transistors; the second insulator includes an opening portion; the first transistors and the second transistors each include an oxide semiconductor; a third insulator is positioned over and in contact with the first insulator and the second insulator; the first insulator, the second insulator, and the third insulator inhibit oxygen diffusion; and the density of the plurality of first transistors arranged in the first circuit region is higher than the density of the plurality of second transistors arranged in the second circuit region.

A microelectronic device comprises a first control logic region comprising first control logic devices and a memory array region vertically overlying the first control logic region. The memory array region comprises capacitors, access devices laterally neighboring and in electrical communication with the capacitors, conductive lines operatively associated with the access devices and extending in a lateral direction, and first conductive pillars operatively associated with the access devices and vertically extending through the memory array region. The microelectronic device further comprises a second control logic region comprising second control logic devices vertically overlying the memory array region. Related microelectronic devices, memory devices, electronic systems, and methods are also described.

A semiconductor device with a novel structure is provided. The semiconductor device includes a memory circuit including a first transistor and a second transistor. The first transistor is formed on a silicon substrate. The second transistor is formed in a layer above a layer where the first transistor is provided. The first transistor includes a first gate electrode and a first back gate electrode with a first channel formation region interposed therebetween. The first gate electrode is electrically connected to one of a source and a drain of the second transistor. The first back gate electrode is formed using a region where an impurity element imparting a conductivity type is selectively introduced in the silicon substrate. The second transistor includes a second channel formation region. The second channel formation region includes a metal oxide.

A method of fabricating an integrated circuit (IC) includes forming a dielectric layer on a substrate having a plurality of the IC. A thin-film resistor (TFR) layer is deposited on the dielectric layer, and an underlayer (UL) including carbon is formed on the TFR layer. A hard mask layer including silicon is formed on the UL. Masked etching of the hard mask layer transfers a pattern of a photoresist layer onto the hard mask layer to form a hard mask layer pattern. Masked etching of the UL transfers the hard mask layer pattern onto the UL to form a UL pattern. Masked etching of the TFR layer transfers the UL pattern onto the TFR layer to form a TFR layer pattern including a matched pair of TFRs. The matched pair of TFRs are generally included in circuitry configured together for implementing at least one function.

A semiconductor device having a novel structure is provided. The semiconductor device includes a p-channel transistor and an n-channel transistor provided over a silicon substrate. One of a source and a drain of the p-channel transistor is electrically connected to a first power supply line, one of a source and a drain of the n-channel transistor is electrically connected to a second power supply line, and the other of the source and the drain of the p-channel transistor is connected to the other of the source and the drain of the n-channel transistor. The p-channel transistor includes a first gate electrode and a first back gate electrode provided to face the first gate electrode with a first channel formation region therebetween. The first back gate electrode is formed using a region where an impurity element imparting conductivity is selectively introduced to the silicon substrate. The n-channel transistor is provided above a layer including the p-channel transistor.

In some embodiments of the present disclosure, a method for forming a semiconductor device is described. A semiconductor layer is formed and a dielectric layer is formed. A pressurized treatment is performed to transform the semiconductor layer into a low-doping semiconductor layer and transform the dielectric layer into a crystalline ferroelectric layer. A gate layer is formed. An insulating layer is formed over the gate layer, the crystalline ferroelectric layer and the low-doping semiconductor layer. Contact openings are formed in the insulating layer exposing portions of the low-doping semiconductor layer. Source and drain terminals are formed on the low-doping semiconductor layer.

A semiconductor device that can perform product-sum operation with low power is provided. The semiconductor device includes a switching circuit. The switching circuit includes first to fourth terminals. The switching circuit has a function of selecting one of the third terminal and the fourth terminal as electrical connection destination of the first terminal, and selecting the other of the third terminal and the fourth terminal as electrical connection destination of the second terminal, on the basis of first data. The switching circuit includes a first transistor and a second transistor each having a back gate. The switching circuit has a function of determining a signal-transmission speed between the first terminal and one of the third terminal and the fourth terminal and a signal-transmission speed between the second terminal and the other of the third terminal and the fourth terminal on the basis of potentials of the back gates. The potentials are determined by second data. When signals are input to the first terminal and the second terminal, a time lag between the signals output from the third terminal and the fourth terminal is determined by the first data and the second data.

A MOSFET structure including stacked vertically isolated MOSFETs and a method for forming the same are disclosed. In an embodiment, the method may include depositing a first buffer layer over a substrate; depositing a first channel layer over the first buffer layer; depositing a second buffer layer over the first channel layer; depositing a second channel layer over the second buffer layer; depositing a third buffer layer over the second channel layer; etching the first buffer layer, the first channel layer, the second buffer layer, the second channel layer, and the third buffer layer to form a fin structure; etching the first buffer layer, the second buffer layer, and the third buffer layer to form a first plurality of openings; forming a first gate stack in the first opening disposed in the first buffer layer, a second gate stack in the first opening disposed in the second buffer layer, and a third gate stack in the first opening disposed in the third buffer layer; and replacing the second buffer layer and a portion of the second gate stack with an isolation structure.

A semiconductor device that inhibits signal delay and can perform parallel product-sum operations is provided. The semiconductor device includes first to fourth registers, an adder, a multiplier, a selector, and a first memory unit. An output terminal of the first register is electrically connected to an input terminal of the second register, and an output terminal of the second register is electrically connected to a first input terminal of the multiplier. An output terminal of the multiplier is electrically connected to a first input terminal of the adder, and an output terminal of the adder is electrically connected to an input terminal of the third register. An output terminal of the third register is electrically connected to a first input terminal of the selector, and an output terminal of the selector is electrically connected to an input terminal of the fourth register, and the first memory unit is electrically connected to a second input terminal of the multiplier. The first memory unit has a function reading out first data corresponding to a context signal input to the first memory unit and inputting the first data to the second input terminal of the multiplier.