A direct current to direct current (DC-DC) converter can include a chip embedded integrated circuit (IC), one or more switches, and an inductor. The IC can be embedded in a PCB. The IC can include driver, switches, and PWM controller. The IC and/or switches can include eGaN. The inductor can be stacked above the IC and/or switches, reducing an overall footprint. One or more capacitors can also be stacked above the IC and/or switches. Vias can couple the inductor and/or capacitors to the IC (e.g., to the switches). The DC-DC converter can offer better transient performance, have lower ripples, or use fewer capacitors. Parasitic effects that prevent efficient, higher switching speeds are reduced. The inductor size and overall footprint can be reduced. Multiple inductor arrangements can improve performance. Various feedback systems can be used, such as a ripple generator in a constant on or off time modulation circuit.

A direct current to direct current (DC-DC) converter can include a chip embedded integrated circuit (IC), one or more switches, and an inductor. The IC can be embedded in a PCB. The IC can include driver, switches, and PWM controller. The IC and/or switches can include eGaN. The inductor can be stacked above the IC and/or switches, reducing an overall footprint. One or more capacitors can also be stacked above the IC and/or switches. Vias can couple the inductor and/or capacitors to the IC (e.g., to the switches). The DC-DC converter can offer better transient performance, have lower ripples, or use fewer capacitors. Parasitic effects that prevent efficient, higher switching speeds are reduced. The inductor size and overall footprint can be reduced. Multiple inductor arrangements can improve performance. Various feedback systems can be used, such as a ripple generator in a constant on or off time modulation circuit.

A transistor comprises a semiconductor substrate and a barrier metal layer forming a Schottky barrier. One or more insulated gates may be positioned adjacent to an edge of the Schottky barrier. By applying a reverse bias voltage between the semiconductor substrate and the barrier metal, and applying a gate voltage between the one or more insulated gates and the barrier metal, a reverse bias current may be increased to a reverse bias conducting state. When the gate voltage is sufficient, the transistor may conduct current between the semiconductor substrate and the barrier metal. For example, voltages may be applied to an n-type substrate and an insulated gate (both relative to the barrier metal), and a current may flow from the semiconductor substrate to the barrier metal. The transistor may operate as a switch, a filter, a rectifier, an oscillator, or an amplifier.

A network device includes one or more circuit components. The one or more circuit components include a semiconductor substrate, a first device terminal and a second device terminal, a drift region, and a mobility modulator. Both device terminals are coupled to the semiconductor substrate, the second device terminal being spatially separated from the first device terminal. The drift region is disposed on the semiconductor substrate between the first device terminal and the second device terminal, the drift region being configured to allow a flow of charge-carriers between the first device terminal and the second device terminal. The mobility modulator is coupled to the drift region, the mobility modulator being configured to selectively apply a field across the drift region responsive to one or more modulation signals, so as to modulate a mobility of charge-carriers as a function of longitudinal position along the drift region.

Integrated circuit (IC) structures including asymmetric, recessed source and drain regions and methods for forming are provided. In an example, the IC structure includes a substrate, a gate structure over the substrate, first and second spacers contacting respective, opposite sidewalls of the gate structure, and source and drain regions on opposite sides of the gate structure. In one configuration, the source region includes an upper source portion having a first lateral width, and a lower source portion having a second lateral width greater than the first lateral width, and the drain region includes an upper drain portion having a third lateral width, and a lower drain portion having a fourth lateral width that is substantially the same as the third lateral width.

Disclosed herein are stacked transistors with different gate lengths in different device strata, as well as related methods and devices. In some embodiments, an integrated circuit structure may include stacked strata of transistors, with two different device strata having different gate lengths.

A distributed inductance integrated field effect transistor (FET) structure, comprising a plurality of FETs. Each FET comprises a plurality of source regions, a gate region having a plurality of gate fingers extending from a gate bus bar, a drain region having a plurality of drain finger extending from a drain bus bar between the plurality of gate fingers, wherein the gate region controls current flow in a conductive channel between the drain region and source region. A first distributed inductor connects the gate regions of adjacent ones of the plurality of FETs; and a second distributed inductor connects the drain regions of adjacent ones of the plurality of FETs.

A power amplifier comprises a first transistor, a second transistor, a first emitter follower, a first bias resistor, and coupling circuitry configured to couple the first bias resistor to a base of the first transistor, the first bias resistor, the second bias resistor, and an emitter of the first emitter follower at a first node, and a base of the first emitter follower to the second transistor.

A power amplifier comprises a first transistor, a second transistor, a first emitter follower, a first bias resistor, and coupling circuitry configured to couple the first bias resistor to a base of the first transistor, the first bias resistor, the second bias resistor, and an emitter of the first emitter follower at a first node, and a base of the first emitter follower to the second transistor.

Transistor cell architectures including both front-side and back-side structures. A transistor may include one or more semiconductor fins with a gate stack disposed along a sidewall of a channel portion of the fin. One or more source/drain regions of the fin are etched to form recesses with a depth below the channel region. The recesses may extend through the entire fin height. Source/drain semiconductor is then deposited within the recess, coupling the channel region to a deep source/drain. A back-side of the transistor is processed to reveal the deep source/drain semiconductor material. One or more back-side interconnect metallization levels may couple to the deep source/drain of the transistor.