Patent classifications
H01L2224/0237
Multi-die package with bridge layer
A device is provided. The device includes a bridge layer over a first substrate. A first connector electrically connecting the bridge layer to the first substrate. A first die is coupled to the bridge layer and the first substrate, and a second die is coupled to the bridge layer.
Semiconductor device and semiconductor package
A semiconductor device includes: a first semiconductor chip having a first pad and a second pad, a depression being formed in the second pad; an organic insulating film provided on the first semiconductor chip, the organic insulating film covering the depression and not covering at least a portion of the first pad; and a redistribution layer having a lower portion connected to the first pad and an upper portion disposed on the organic insulating film.
Semiconductor device
This semiconductor device is provided with: a substrate which has, on a principal surface thereof, an input unit for inputting an alternating current power from the exterior, a ground connection unit for connecting to ground formed on the exterior, an output unit for outputting a post-adjustment direct current power to the exterior, and a semiconductor layer; a first Schottky barrier diode formed in a first region of the semiconductor layer so that a cathode electrode is connected to the input unit and so that an anode electrode is connected to the ground connection unit; a second Schottky barrier diode formed in a second region of the semiconductor layer so that a cathode electrode is connected to the output unit and so that an anode electrode is connected to the input unit; and a third Schottky barrier diode formed in a third region of the semiconductor layer so that a cathode electrode is connected to the output unit and so that an anode electrode is connected to the ground connection unit.
Substrate-less package structure
A package includes a chip, a wire, a mold layer and a redistribution layer. The chip includes a conductive pad. The wire is bonded to the conductive pad of the chip. The mold layer surrounds the first chip and the wire. The redistribution layer is disposed on the mold layer and contacts an exposed portion of the wire.
Device and Method for UBM/RDL Routing
An under bump metallurgy (UBM) and redistribution layer (RDL) routing structure includes an RDL formed over a die. The RDL comprises a first conductive portion and a second conductive portion. The first conductive portion and the second conductive portion are at a same level in the RDL. The first conductive portion of the RDL is separated from the second conductive portion of the RDL by insulating material of the RDL. A UBM layer is formed over the RDL. The UBM layer includes a conductive UBM trace and a conductive UBM pad. The UBM trace electrically couples the first conductive portion of the RDL to the second conductive portion of the RDL. The UBM pad is electrically coupled to the second conductive portion of the RDL. A conductive connector is formed over and electrically coupled to the UBM pad.
Advanced INFO POP and Method of Forming Thereof
In accordance with some embodiments, a package-on-package (PoP) structure includes a first semiconductor package having a first side and a second side opposing the first side, a second semiconductor package having a first side and a second side opposing the first side, and a plurality of inter-package connector coupled between the first side of the first semiconductor package and the first side of the second semiconductor package. The PoP structure further includes a first molding material on the second side of the first semiconductor package. The second side of the second semiconductor package is substantially free of the first molding material.
INTEGRATED FAN-OUT PACKAGE AND METHOD OF FABRICATING THE SAME
An integrated fan-out package including an integrated circuit, an insulating encapsulation, a plurality of conductive through vias, and a redistribution circuit structure is provided. The integrated circuit includes a plurality of conductive terminals. The insulating encapsulation encapsulates sidewalls of the integrated circuit. The conductive through vias penetrate in the insulating encapsulation. The redistribution circuit structure is disposed on the integrated circuit, the conductive through vias and the insulating encapsulation. The redistribution conductive layer is electrically connected to the conductive terminals and the conductive through vias. A plurality of first contact surfaces of the conductive terminals and a plurality of second contact surfaces of the conductive through vias are in contact with the redistribution circuit structure, and a roughness of the first contact surfaces and the second contact surfaces ranges from 100 angstroms to 500 angstroms. Methods of fabricating the integrated fan-out package are also provided.
Wrap-around source/drain method of making contacts for backside metals
An apparatus including a circuit structure including a first side including a device layer including a plurality of devices and an opposite second side; an electrically conductive contact coupled to one of the plurality of devices on the first side; and an electrically conductive interconnect disposed on the second side of the structure and coupled to the conductive contact. A method including forming a transistor device including a channel between a source and a drain and a gate electrode on the channel defining a first side of the device; forming an electrically conductive contact to one of the source and the drain from the first side; and forming an interconnect on a second side of the device, wherein the interconnect is coupled to the contact.
Three-Layer Package-on-Package Structure and Method Forming Same
A method includes forming a first plurality of redistribution lines, forming a first metal post over and electrically connected to the first plurality of redistribution lines, and bonding a first device die to the first plurality of redistribution lines. The first metal post and the first device die are encapsulated in a first encapsulating material. The first encapsulating material is then planarized. The method further includes forming a second metal post over and electrically connected to the first metal post, attaching a second device die to the first encapsulating material through an adhesive film, encapsulating the second metal post and the second device die in a second encapsulating material, planarizing the second encapsulating material, and forming a second plurality of redistributions over and electrically coupling to the second metal post and the second device die.
Chip-on-wafer package and method of forming same
A package according to an embodiment includes a first device package and a fan-out RDL disposed over the first device package. The fan-out RDL extends past edges of the first device package. The first device package comprises a first die having a first redistribution layer (RDL) disposed on a first substrate, a second die having a second RDL disposed on a second substrate, an isolation material over the first die and extending along sidewalls of the second die, and a conductive via. The first RDL is bonded to the second RDL, and the first die and the second die comprise different lateral dimensions. At least a portion of the conductive via extends from a top surface of the isolation material to contact a first conductive element in the first RDL.