H01L2224/82101

Image sensor package and imaging apparatus
11094722 · 2021-08-17 · ·

An image sensor package according to an embodiment of the present technology includes: a solid-state image sensor; a transparent substrate; and a package substrate. The solid-state image sensor has a light-receiving surface including a light-reception unit and a first terminal unit, and a rear surface opposite to the light-receiving surface. The transparent substrate faces the light-receiving surface. The package substrate includes a frame portion, a second terminal unit, and a supporting body. The frame portion has a joint surface to be joined to the transparent substrate and includes a housing portion housing the solid-state image sensor. The second terminal unit is to be wire-bonded to the first terminal unit, the second terminal unit being provided in the frame portion. The supporting body is provided in a peripheral portion of the light-receiving surface or at a center portion of the rear surface and partially supports the light-receiving surface or the rear surface.

Metal frame, dummy wafer, semiconductor device, electronic device, and method of manufacturing semiconductor device
11069654 · 2021-07-20 · ·

A metal frame that is used in a dummy wafer in which chip-like semiconductor elements and a rewiring layer are integrated. A plurality of openings in which the chip-like semiconductor elements are disposed are formed in the metal plate, and a lattice structure is formed with the frames that are the portions between adjacent openings of the plurality of openings. Of the frames forming the lattice structure, the frames located in dicing areas of the dummy wafer are arranged in a discontinuous manner.

Metal frame, dummy wafer, semiconductor device, electronic device, and method of manufacturing semiconductor device
11069654 · 2021-07-20 · ·

A metal frame that is used in a dummy wafer in which chip-like semiconductor elements and a rewiring layer are integrated. A plurality of openings in which the chip-like semiconductor elements are disposed are formed in the metal plate, and a lattice structure is formed with the frames that are the portions between adjacent openings of the plurality of openings. Of the frames forming the lattice structure, the frames located in dicing areas of the dummy wafer are arranged in a discontinuous manner.

Processes for Reducing Leakage and Improving Adhesion
20210242083 · 2021-08-05 ·

A method includes forming a metal seed layer on a dielectric layer, and forming a patterned mask over the metal seed layer. An opening in the patterned mask is over a first portion of the dielectric layer, and the patterned mask overlaps a second portion of the dielectric layer. The method further includes plating a metal region in the opening, removing the patterned mask to expose portions of the metal seed layer, etching the exposed portions of the metal seed layer, performing a plasma treatment on a surface of the second portion of the dielectric layer, and performing an etching process on the surface of the second portion of the dielectric layer.

Processes for Reducing Leakage and Improving Adhesion
20210242083 · 2021-08-05 ·

A method includes forming a metal seed layer on a dielectric layer, and forming a patterned mask over the metal seed layer. An opening in the patterned mask is over a first portion of the dielectric layer, and the patterned mask overlaps a second portion of the dielectric layer. The method further includes plating a metal region in the opening, removing the patterned mask to expose portions of the metal seed layer, etching the exposed portions of the metal seed layer, performing a plasma treatment on a surface of the second portion of the dielectric layer, and performing an etching process on the surface of the second portion of the dielectric layer.

METHODS AND SYSTEM OF IMPROVING CONNECTIVITY OF INTEGRATED COMPONENTS EMBEDDED IN A HOST STRUCTURE
20210249316 · 2021-08-12 ·

The disclosure relates to systems, and methods for improving connectivity of embedded components. Specifically, the disclosure relates to systems and methods for using additive manufacturing to improve connectivity of embedded components with the host structure and/or other embedded components by selectably bridging the gap naturally formed due to manufacturing variation and built in tolerances, between the embedded components or devices and the host structure, and between one embedded component and a plurality of other embedded components.

Integrated fan-out packages and methods of forming the same

Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes two dies, an encapsulant, a first metal line and a plurality of dummy vias. The encapsulant is disposed between the two dies. The first metal line is disposed over the two dies and the encapsulant, and electrically connected to the two dies. The plurality of dummy vias is disposed over the encapsulant and aside the first metal line.

Integrated fan-out packages and methods of forming the same

Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes two dies, an encapsulant, a first metal line and a plurality of dummy vias. The encapsulant is disposed between the two dies. The first metal line is disposed over the two dies and the encapsulant, and electrically connected to the two dies. The plurality of dummy vias is disposed over the encapsulant and aside the first metal line.

Additive Manufacturing of a Frontside or Backside Interconnect of a Semiconductor Die

A method for fabricating a semiconductor die package includes: providing a semiconductor transistor die, the semiconductor transistor die having a first contact pad on a first lower main face and/or a second contact pad on an upper main face; fabricating a frontside electrical conductor onto the second contact pad and a backside electrical conductor onto the first contact pad; and applying an encapsulant covering the semiconductor die and at least a portion of the electrical conductor, wherein the frontside electrical conductor and/or the backside electrical conductor is fabricated by laser-assisted structuring of a metallic structure.

Stack of electrical components and method of producing the same

A stack of electrical components has a first electrical component having a first surface, a second surface that is opposite to the first surface and a side surface that is located between the first surface and the second surface; a second electrical component having a third surface on which the first electrical component is mounted, the third surface facing the second surface and forming a corner portion between the third surface and the side surface; an adhesive layer that bonds the first electrical component to the second electrical component, wherein the adhesive layer has a first portion that is located between the second surface and the third surface and a curved second portion that fills the corner portion; and a conductive layer that extends on a side of the side surface, curves along the second portion and extends to the third surface.