H01S3/109

SOLID-STATE LASER SYSTEM, PHASE MATCHING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
20230178957 · 2023-06-08 · ·

A solid-state laser system according to an aspect of the present disclosure includes a first non-linear crystal that generates first wavelength-converted light based on a first laser beam, a first adjustment unit configured to perform phase matching of the first wavelength-converted light in the first non-linear crystal, a second non-linear crystal that generates second wavelength-converted light based on a second laser beam and the first wavelength-converted light, a second adjustment unit configured to perform phase matching of the second wavelength-converted light in the second non-linear crystal, a light detection unit configured to detect light having a selected wavelength, and a processor configured to control the first adjustment unit based on intensity of at least one of the first wavelength-converted light and the first laser beam and to control the second adjustment unit based on intensity of at least one of the second wavelength-converted light and the first wavelength-converted light.

SOLID-STATE LASER SYSTEM, PHASE MATCHING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
20230178957 · 2023-06-08 · ·

A solid-state laser system according to an aspect of the present disclosure includes a first non-linear crystal that generates first wavelength-converted light based on a first laser beam, a first adjustment unit configured to perform phase matching of the first wavelength-converted light in the first non-linear crystal, a second non-linear crystal that generates second wavelength-converted light based on a second laser beam and the first wavelength-converted light, a second adjustment unit configured to perform phase matching of the second wavelength-converted light in the second non-linear crystal, a light detection unit configured to detect light having a selected wavelength, and a processor configured to control the first adjustment unit based on intensity of at least one of the first wavelength-converted light and the first laser beam and to control the second adjustment unit based on intensity of at least one of the second wavelength-converted light and the first wavelength-converted light.

Chip-scale power scalable ultraviolet optical source

A chip scale ultra violet laser source includes a plurality of laser elements on a substrate each including a back cavity mirror, a tapered gain medium, an outcoupler, a nonlinear crystal coupled to the outcoupler with a front facet that has a first coating that is anti-reflectivity (AR) to a fundamental wavelength of the laser element and high reflectivity (HR) to ultra violet wavelengths, and has an exit facet that has a second coating that has HR to a fundamental wavelength of the laser element and AR to the ultra violet wavelengths, a photodetector coupled to the outcoupler, a phase modulator coupled to the photodetector and coupled to the back cavity mirror, and a master laser diode on the substrate coupled to the phase modulator of each laser element. Each laser element emits an ultra violet beamlet and is frequency and phase locked to the master laser diode.

HIGHLY EFFICIENT, SINGLE-PASS, HARMONIC GENERATOR WITH ROUND OUTPUT BEAM

An extra cavity harmonic generator system may produce a round, non-astigmatic third harmonic output beam from a nominally round, non-astigmatic, diffraction limited input fundamental beam. The system may include a second harmonic generation crystal. An input fundamental beam size is expanded in a non-walkoff direction for the SHG crystal at the SHG crystal input face. A higher harmonic generation crystal has an output face oriented at an oblique angle of incidence in a non-walkoff direction for the HHG crystal such that an output higher harmonic beam size is contracted in this direction. Expansion of the input fundamental beam at the SHG crystal input face exceeds reduction of third harmonic beam at the HHG crystal output face.

Chirped Bragg grating elements

Apparatus and methods for altering one or more spectral, spatial, or temporal characteristics of a light-emitting device are disclosed. Generally, such apparatus may include a volume Bragg grating (VBG) element that receives input light generated by a light-emitting device, conditions one or more characteristics of the input light, and causes the light-emitting device to generate light having the one or more characteristics of the conditioned light.

PULSED LASER WITH INTRACAVITY FREQUENCY CONVERSION AIDED BY EXTRA-CAVITY FREQUENCY CONVERSION
20220052504 · 2022-02-17 · ·

A pulsed third-harmonic laser system includes a pulsed laser, an extra-cavity nonlinear crystal, and an intracavity nonlinear crystal. The pulsed laser generates fundamental laser pulses and couples out a portion of each fundamental laser pulse out of the laser resonator to undergo second-harmonic-generation in the extra-cavity nonlinear crystal. Resulting second-harmonic laser pulses are directed back into the laser resonator and mixes with the fundamental laser pulses in the intracavity nonlinear crystal to generate third-harmonic laser pulses. The pulsed third-harmonic laser system thus maintains a non-zero output coupling efficiency regardless of the efficiency of the second-harmonic-generation stage, while the third-harmonic-generation stage benefits from the intracavity power of the fundamental laser pulses.

PULSED LASER WITH INTRACAVITY FREQUENCY CONVERSION AIDED BY EXTRA-CAVITY FREQUENCY CONVERSION
20220052504 · 2022-02-17 · ·

A pulsed third-harmonic laser system includes a pulsed laser, an extra-cavity nonlinear crystal, and an intracavity nonlinear crystal. The pulsed laser generates fundamental laser pulses and couples out a portion of each fundamental laser pulse out of the laser resonator to undergo second-harmonic-generation in the extra-cavity nonlinear crystal. Resulting second-harmonic laser pulses are directed back into the laser resonator and mixes with the fundamental laser pulses in the intracavity nonlinear crystal to generate third-harmonic laser pulses. The pulsed third-harmonic laser system thus maintains a non-zero output coupling efficiency regardless of the efficiency of the second-harmonic-generation stage, while the third-harmonic-generation stage benefits from the intracavity power of the fundamental laser pulses.

SOLID-STATE LASER SYSTEM
20170279241 · 2017-09-28 · ·

A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.

SOLID-STATE LASER SYSTEM
20170279241 · 2017-09-28 · ·

A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.

183NM laser and inspection system

A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.